硅片行业术语大全中英文对照I-Z

硅片行业术语大全中英文对照I-Z
硅片行业术语大全中英文对照I-Z

硅片行业术语大全(中英文对照 I-Z)

Ingot - A cylindrical solid made of polycrystalline or single crystal silicon from which wafer s are cut.

晶锭 - 由多晶或单晶形成的圆柱体,晶圆片由此切割而成。

Laser Light-Scattering Event - A signal pulse that locates surface imperfections on a wafer.

激光散射 - 由晶圆片表面缺陷引起的脉冲信号。

Lay - The main direction of surface texture on a wafer.

层 - 晶圆片表面结构的主要方向。

Light Point Defect (LPD) (Not preferred; see localized light-scatterer) 光点缺陷(LPD) (不推荐使用,参见“局部光散射”)

Lithography - The process used to transfer patterns onto wafer s.

光刻 - 从掩膜到圆片转移的过程。

Localized Light-Scatterer - One feature on the surface of a wafer, such as a pit or a scratch that scatters light. It is also called a light point defect.

局部光散射 - 晶圆片表面特征,例如小坑或擦伤导致光线散射,也称为光点缺陷。

Lot - Wafer s of similar sizes and characteristics placed together in a shipment.

批次 - 具有相似尺寸和特性的晶圆片一并放置在一个载片器内。

Majority Carrier - A carrier, either a hole or an electron that is dominant in a specific region, such as electrons in an N-Type area.

多数载流子 - 一种载流子,在半导体材料中起支配作用的空穴或电子,例如在

N型中是电子。

Mechanical Test Wafer - A silicon wafer used for testing purposes.

机械测试晶圆片 - 用于测试的晶圆片。

Microroughness - Surface roughness with spacing between the impurities with a measurement of less than 100 μm.

微粗糙 - 小于100微米的表面粗糙部分。

Miller Indices, of a Crystallographic Plane - A system that utilizes three numbers to identify plan orientation in a crystal.

Miller索指数 - 三个整数,用于确定某个并行面。这些整数是来自相同系统的基本向量。

Minimal Conditions or Dimensions - The allowable conditions for determining whether or not a wafer is considered acceptable.

最小条件或方向 - 确定晶圆片是否合格的允许条件。

Minority Carrier - A carrier, either a hole or an electron that is not dominant in a specific region, such as electrons in a P-Type area.

少数载流子 - 在半导体材料中不起支配作用的移动电荷,在P型中是电子,在

N型中是空穴。

Mound - A raised defect on the surface of a wafer measuring more than 0.25 mm.

堆垛 - 晶圆片表面超过0.25毫米的缺陷。

Notch - An indent on the edge of a wafer used for orientation purposes. 凹槽 - 晶圆片边缘上用于晶向定位的小凹槽。

Orange Peel - A roughened surface that is visible to the unaided eye. 桔皮 - 可以用肉眼看到的粗糙表面

Orthogonal Misorientation -

直角定向误差 -

Particle - A small piece of material found on a wafer that is not connected with it.

颗粒 - 晶圆片上的细小物质。

Particle Counting - Wafer s that are used to test tools for particle contamination.

颗粒计算 - 用来测试晶圆片颗粒污染的测试工具。

Particulate Contamination - Particles found on the surface of a wafer. They appear as bright points when a collineated light is shined on the wafer.

颗粒污染 - 晶圆片表面的颗粒。

Pit - A non-removable imperfection found on the surface of a wafer. 深坑 - 一种晶圆片表面无法消除的缺陷。

Point Defect - A crystal defect that is an impurity, such as a lattice vacancy or an interstitial atom.

点缺陷 - 不纯净的晶缺陷,例如格子空缺或原子空隙。

Preferential Etch -

优先蚀刻 -

Premium Wafer- A wafer that can be used for particle counting, measuring pattern resolution in the photolithography process, and metal contamination monitoring. This wafer has very strict specifications for a specific usage, but looser specifications than the prime wafer.

测试晶圆片 - 影印过程中用于颗粒计算、测量溶解度和检测金属污染的晶圆片。对于具体应用该晶圆片有严格的要求,但是要比主晶圆片要求宽松些。

Primary Orientation Flat - The longest flat found on the wafer.

主定位边 - 晶圆片上最长的定位边。

Process Test Wafer - A wafer that can be used for processes as well as area cleanliness.

加工测试晶圆片 - 用于区域清洁过程中的晶圆片。

Profilometer - A tool that is used for measuring surface topography. 表面形貌剂 - 一种用来测量晶圆片表面形貌的工具。

Resistivity (Electrical) - The amount of difficulty that charged carriers have in moving throughout material.

电阻率(电学方面) - 材料反抗或对抗电荷在其中通过的一种物理特性。Required - The minimum specifications needed by the customer when ordering wafer s.

必需 - 订购晶圆片时客户必须达到的最小规格。

Roughness - The texture found on the surface of the wafer that is spaced very closely together.

粗糙度 - 晶圆片表面间隙很小的纹理。

Saw Marks - Surface irregularities

锯痕 - 表面不规则。

Scan Direction - In the flatness calculation, the direction of the subsites.

扫描方向 - 平整度测量中,局部平面的方向。

Scanner Site Flatness -

局部平整度扫描仪 -

Scratch - A mark that is found on the wafer surface.

擦伤 - 晶圆片表面的痕迹。

Secondary Flat - A flat that is smaller than the primary orientation flat. The position of this flat determines what type the wafer is, and also the orientation of the wafer.

第二定位边 - 比主定位边小的定位边,它的位置决定了晶圆片的类型和晶向。Shape -

形状 -

Site - An area on the front surface of the wafer that has sides parallel and perpendicular to the primary orientation flat. (This area is rectangular in shape)

局部表面 - 晶圆片前面上平行或垂直于主定位边方向的区域。

Site Array - a neighboring set of sites

局部表面系列 - 一系列的相关局部表面。

Site Flatness -

局部平整 -

Slip - A defect pattern of small ridges found on the surface of the wafer. 划伤 - 晶圆片表面上的小皱造成的缺陷。

Smudge - A defect or contamination found on the wafer caused by fingerprints.

污迹 - 晶圆片上指纹造成的缺陷或污染。

Sori -

Striation - Defects or contaminations found in the shape of a helix. 条痕 - 螺纹上的缺陷或污染。

Subsite, of a Site - An area found within the site, also rectangular. The center of the subsite must be located within the original site.

局部子表面 - 局部表面内的区域,也是矩形的。子站中心必须位于原始站点内部。

Surface Texture - Variations found on the real surface of the wafer that deviate from the reference surface.

表面纹理 - 晶圆片实际面与参考面的差异情况。

Test Wafer- A silicon wafer that is used in manufacturing for monitoring and testing purposes.

测试晶圆片 - 用于生产中监测和测试的晶圆片。

Thickness of Top Silicon Film - The distance found between the face of the top silicon film and the surface of the oxide layer.

顶部硅膜厚度 - 顶部硅层表面和氧化层表面间的距离。

Top Silicon Film - The layer of silicon on which semiconductor devices are placed. This is located on top of the insulating layer.

顶部硅膜 - 生产半导体电路的硅层,位于绝缘层顶部。

Total Indicator Reading (TIR) - The smallest distance between planes on the surface of the wafer.

总计指示剂数(TIR) - 晶圆片表面位面间的最短距离。

Virgin Test Wafer - A wafer that has not been used in manufacturing or other processes.

原始测试晶圆片 - 还没有用于生产或其他流程中的晶圆片。

Void - The lack of any sort of bond (particularly a chemical bond) at the site of bonding.

无效 - 在应该绑定的地方没有绑定(特别是化学绑定)。

Waves - Curves and contours found on the surface of the wafer that can be seen by the naked eye.

波浪 - 晶圆片表面通过肉眼能发现的弯曲和曲线。

Waviness - Widely spaced imperfections on the surface of a wafer.

波纹 - 晶圆片表面经常出现的缺陷。

?Acceptor- An element, such as boron, indium, and gallium used to create a fr ee hole in a semiconductor. The acceptor atoms are required to have one less vale nce electron than the semiconductor.

?受主- 一种用来在半导体中形成空穴的元素,比如硼、铟和镓。受主原子必须比半导体元素少一价电子

?Alignment Precision- Displacement of patterns that occurs during the photolit hography process.

?套准精度- 在光刻工艺中转移图形的精度。

?Anisotropic- A process of etching that has very little or no undercutting

?各向异性- 在蚀刻过程中,只做少量或不做侧向凹刻。

?Area Contamination- Any foreign particles or material that are found on the surface of a wafer. This is viewed as discolored or smudged, and it is the result of stains, fingerprints, water spots, etc.

?沾污区域- 任何在晶圆片表面的外来粒子或物质。由沾污、手印和水滴产生的污染。

?Azimuth, in Ellipsometry- The angle measured between the plane of incidenc e and the major axis of the ellipse.

?椭圆方位角- 测量入射面和主晶轴之间的角度。

?Backside- The bottom surface of a silicon wafer. (Note: This term is not prefe rred; instead, use ‘back surface’.)

?背面- 晶圆片的底部表面。(注:不推荐该术语,建议使用“背部表面”)

?Base Silicon Layer- The silicon wafer that is located underneath the insulator layer, which supports the silicon film on top of the wafer.

?底部硅层- 在绝缘层下部的晶圆片,是顶部硅层的基础。

?Bipolar- Transistors that are able to use both holes and electrons as charge ca rriers.

?双极晶体管- 能够采用空穴和电子传导电荷的晶体管。

?Bonded Wafers- Two silicon wafers that have been bonded together by silicon dioxide, which acts as an insulating layer.

?绑定晶圆片- 两个晶圆片通过二氧化硅层结合到一起,作为绝缘层。

?Bonding Interface- The area where the bonding of two wafers occurs.

?绑定面- 两个晶圆片结合的接触区。

?Buried Layer- A path of low resistance for a current moving in a device. Man y of these dopants are antimony and arsenic.

?埋层- 为了电路电流流动而形成的低电阻路径,搀杂剂是锑和砷。

?Buried Oxide Layer (BOX)- The layer that insulates between the two wafers.

?氧化埋层(BOX)- 在两个晶圆片间的绝缘层。

?Carrier- Valence holes and conduction electrons that are capable of carrying a charge through a solid surface in a silicon wafer.

?载流子- 晶圆片中用来传导电流的空穴或电子。

?Chemical-Mechanical Polish (CMP)- A process of flattening and polishing wa fers that utilizes both chemical removal and mechanical buffing. It is used during th e fabrication process.

?化学-机械抛光(CMP)- 平整和抛光晶圆片的工艺,采用化学移除和机械抛光两种方式。此工艺在前道工艺中使用。

?Chuck Mark- A mark found on either surface of a wafer, caused by either a r obotic end effector, a chuck, or a wand.

?卡盘痕迹- 在晶圆片任意表面发现的由机械手、卡盘或托盘造成的痕迹。

?Cleavage Plane- A fracture plane that is preferred.

?解理面- 破裂面

?Crack- A mark found on a wafer that is greater than 0.25 mm in length.

?裂纹- 长度大于0.25毫米的晶圆片表面微痕。

?Crater- Visible under diffused illumination, a surface imperfection on a wafer th at can be distinguished individually.

?微坑- 在扩散照明下可见的,晶圆片表面可区分的缺陷。

?Conductivity (electrical)- A measurement of how easily charge carriers can fl ow throughout a material.

?传导性(电学方面)- 一种关于载流子通过物质难易度的测量指标。

?Conductivity Type- The type of charge carriers in a wafer, such as “N-type” and “P-type”.

?导电类型- 晶圆片中载流子的类型,N型和P型。

?Contaminant, Particulate(see light point defect)

?污染微粒(参见光点缺陷)

?Contamination Area- An area that contains particles that can negatively affect the characteristics of a silicon wafer.

?沾污区域- 部分晶圆片区域被颗粒沾污,造成不利特性影响。

?Contamination Particulate- Particles found on the surface of a silicon wafer. ?沾污颗粒- 晶圆片表面上的颗粒。

?Crystal Defect- Parts of the crystal that contain vacancies and dislocations tha t can have an impact on a circuit’s electrical performance.

?晶体缺陷- 部分晶体包含的、会影响电路性能的空隙和层错。

?Crystal Indices(see Miller indices)

?晶体指数(参见米勒指数)

?Depletion Layer- A region on a wafer that contains an electrical field that sw eeps out charge carriers.

?耗尽层- 晶圆片上的电场区域,此区域排除载流子。

?Dimple- A concave depression found on the surface of a wafer that is visible t o the eye under the correct lighting conditions.

?表面起伏- 在合适的光线下通过肉眼可以发现的晶圆片表面凹陷。

?Donor- A contaminate that has donated extra “free” electrons, thus making a wafer “N-Type”.

?施主- 可提供“自由”电子的搀杂物,使晶圆片呈现为N型。

?Dopant- An element that contributes an electron or a hole to the conduction p rocess, thus altering the conductivity. Dopants for silicon wafers are found in Group s III and V of the Periodic Table of the Elements.

?搀杂剂- 可以为传导过程提供电子或空穴的元素,此元素可以改变传导特性。晶圆片搀杂剂可以在元素周期表的III 和V族元素中发现。

?Doping- The process of the donation of an electron or hole to the conduction process by a dopant.

?掺杂- 把搀杂剂掺入半导体,通常通过扩散或离子注入工艺实现。

?Edge Chip and Indent- An edge imperfection that is greater than 0.25 mm. ?芯片边缘和缩进- 晶片中不完整的边缘部分超过0.25毫米。

?Edge Exclusion Area- The area located between the fixed quality area and th e periphery of a wafer. (This varies according to the dimensions of the wafer.)

?边缘排除区域- 位于质量保证区和晶圆片外围之间的区域。(根据晶圆片的尺寸不同而有所不同。)

?Edge Exclusion, Nominal (EE)- The distance between the fixed quality area and the periphery of a wafer.

?名义上边缘排除(EE)- 质量保证区和晶圆片外围之间的距离。

?Edge Profile- The edges of two bonded wafers that have been shaped either chemically or mechanically.

?边缘轮廓- 通过化学或机械方法连接起来的两个晶圆片边缘。

?Etch- A process of chemical reactions or physical removal to rid the wafer of e xcess materials.

?蚀刻- 通过化学反应或物理方法去除晶圆片的多余物质。

?Fixed Quality Area (FQA)- The area that is most central on a wafer surface.

?质量保证区(FQA)- 晶圆片表面中央的大部分。

?Flat- A section of the perimeter of a wafer that has been removed for wafer o rientation purposes.

?平边- 晶圆片圆周上的一个小平面,作为晶向定位的依据。

?Flat Diameter- The measurement from the center of the flat through the cent er of the wafer to the opposite edge of the wafer. (Perpendicular to the flat)

?平口直径- 由小平面的中心通过晶圆片中心到对面边缘的直线距离。

?Four-Point Probe- Test equipment used to test resistivity of wafers.

?四探针- 测量半导体晶片表面电阻的设备。

?Furnace and Thermal Processes- Equipment with a temperature gauge used for processing wafers. A constant temperature is required for the process.

?炉管和热处理- 温度测量的工艺设备,具有恒定的处理温度。

?Front Side- The top side of a silicon wafer. (This term is not preferred; use fr ont surface instead.)

?正面- 晶圆片的顶部表面(此术语不推荐,建议使用“前部表面”)。

?Goniometer- An instrument used in measuring angles.

?角度计- 用来测量角度的设备。

?Gradient, Resistivity(not preferred; see resistivity variation)

?电阻梯度(不推荐使用,参见“电阻变化”)

?Groove- A scratch that was not completely polished out.

?凹槽- 没有被完全清除的擦伤。

?Hand Scribe Mark- A marking that is hand scratched onto the back surface o f a wafer for identification purposes.

?手工印记- 为区分不同的晶圆片而手工在背面做出的标记。

?Haze- A mass concentration of surface imperfections, often giving a hazy appe arance to the wafer.

?雾度- 晶圆片表面大量的缺陷,常常表现为晶圆片表面呈雾状。

?Hole- Similar to a positive charge, this is caused by the absence of a valence electron.

?空穴- 和正电荷类似,是由缺少价电子引起的。

?Ingot- A cylindrical solid made of polycrystalline or single crystal silicon from w hich wafers are cut.

?晶锭- 由多晶或单晶形成的圆柱体,晶圆片由此切割而成。

?Laser Light-Scattering Event- A signal pulse that locates surface imperfection s on a wafer.

?激光散射- 由晶圆片表面缺陷引起的脉冲信号。

?Lay- The main direction of surface texture on a wafer.

?层- 晶圆片表面结构的主要方向。

?Light Point Defect (LPD)(Not preferred; see localized light-scatterer)

?光点缺陷(LPD)(不推荐使用,参见“局部光散射”)

?Lithography- The process used to transfer patterns onto wafers.

?光刻- 从掩膜到圆片转移的过程。

?Localized Light-Scatterer- One feature on the surface of a wafer, such as a pit or a scratch that scatters light. It is also called a light point defect.

?局部光散射- 晶圆片表面特征,例如小坑或擦伤导致光线散射,也称为光点缺陷。

?Lot- Wafers of similar sizes and characteristics placed together in a shipment.

?批次- 具有相似尺寸和特性的晶圆片一并放置在一个载片器内。

?Majority Carrier- A carrier, either a hole or an electron that is dominant in a specific region, such as electrons in an N-Type area.

?多数载流子- 一种载流子,在半导体材料中起支配作用的空穴或电子,例如在N型中是电子。

?Mechanical Test Wafer- A silicon wafer used for testing purposes.

?机械测试晶圆片- 用于测试的晶圆片。

?Microroughness- Surface roughness with spacing between the impurities with a measurement of less than 100 μm.

?微粗糙- 小于100微米的表面粗糙部分。

?Miller Indices, of a Crystallographic Plane- A system that utilizes three nu mbers to identify plan orientation in a crystal.

?Miller索指数- 三个整数,用于确定某个并行面。这些整数是来自相同系统的基本向量。?Minimal Conditions or Dimensions- The allowable conditions for determining whether or not a wafer is considered acceptable.

?最小条件或方向- 确定晶圆片是否合格的允许条件。

?Minority Carrier- A carrier, either a hole or an electron that is not dominant i n a specific region, such as electrons in a P-Type area.

?少数载流子- 在半导体材料中不起支配作用的移动电荷,在P型中是电子,在N型中是空穴。

?Mound- A raised defect on the surface of a wafer measuring more than 0.25 mm.

?堆垛- 晶圆片表面超过0.25毫米的缺陷。

?Notch- An indent on the edge of a wafer used for orientation purposes.

?凹槽- 晶圆片边缘上用于晶向定位的小凹槽。

?Orange Peel- A roughened surface that is visible to the unaided eye.

?桔皮- 可以用肉眼看到的粗糙表面

?Orthogonal Misorientation-

?直角定向误差-

?Particle- A small piece of material found on a wafer that is not connected wit h it.

?颗粒- 晶圆片上的细小物质。

?Particle Counting- Wafers that are used to test tools for particle contaminatio n.

?颗粒计算- 用来测试晶圆片颗粒污染的测试工具。

?Particulate Contamination- Particles found on the surface of a wafer. They a ppear as bright points when a collineated light is shined on the wafer.

?颗粒污染- 晶圆片表面的颗粒。

?Pit- A non-removable imperfection found on the surface of a wafer.

?深坑- 一种晶圆片表面无法消除的缺陷。

?Point Defect- A crystal defect that is an impurity, such as a lattice vacancy or an interstitial atom.

?点缺陷- 不纯净的晶缺陷,例如格子空缺或原子空隙。

?Preferential Etch-

?优先蚀刻-

?Premium Wafer- A wafer that can be used for particle counting, measuring p attern resolution in the photolithography process, and metal contamination monitorin g. This wafer has very strict specifications for a specific usage, but looser specificati ons than the prime wafer.

?测试晶圆片- 影印过程中用于颗粒计算、测量溶解度和检测金属污染的晶圆片。对于具体应用该晶圆片有严格的要求,但是要比主晶圆片要求宽松些。

?Primary Orientation Flat- The longest flat found on the wafer.

?主定位边- 晶圆片上最长的定位边。

?Process Test Wafer- A wafer that can be used for processes as well as area cleanliness.

?加工测试晶圆片- 用于区域清洁过程中的晶圆片。

?Profilometer- A tool that is used for measuring surface topography.

?表面形貌剂- 一种用来测量晶圆片表面形貌的工具。

?Resistivity (Electrical)- The amount of difficulty that charged carriers have in moving throughout material.

?电阻率(电学方面)- 材料反抗或对抗电荷在其中通过的一种物理特性。

?Required- The minimum specifications needed by the customer when ordering wafers.

?必需- 订购晶圆片时客户必须达到的最小规格。

?Roughness- The texture found on the surface of the wafer that is spaced very closely together.

?粗糙度- 晶圆片表面间隙很小的纹理。

?Saw Marks- Surface irregularities

?锯痕- 表面不规则。

?Scan Direction- In the flatness calculation, the direction of the subsites.

?扫描方向- 平整度测量中,局部平面的方向。

?Scanner Site Flatness-

?局部平整度扫描仪-

?Scratch- A mark that is found on the wafer surface.

?擦伤- 晶圆片表面的痕迹。

?Secondary Flat- A flat that is smaller than the primary orientation flat. The po sition of this flat determines what type the wafer is, and also the orientation of the wafer.

?第二定位边- 比主定位边小的定位边,它的位置决定了晶圆片的类型和晶向。

?Shape-

?形状-

?Site- An area on the front surface of the wafer that has sides parallel and per pendicular to the primary orientation flat. (This area is rectangular in shape)

?局部表面- 晶圆片前面上平行或垂直于主定位边方向的区域。

?Site Array- a neighboring set of sites

?局部表面系列- 一系列的相关局部表面。

?Site Flatness-

?局部平整-

?Slip- A defect pattern of small ridges found on the surface of the wafer.

?划伤- 晶圆片表面上的小皱造成的缺陷。

?Smudge- A defect or contamination found on the wafer caused by fingerprints.

?污迹- 晶圆片上指纹造成的缺陷或污染。

?Sori-

?Striation- Defects or contaminations found in the shape of a helix.

?条痕- 螺纹上的缺陷或污染。

?Subsite, of a Site- An area found within the site, also rectangular. The center of the subsite must be located within the original site.

?局部子表面- 局部表面内的区域,也是矩形的。子站中心必须位于原始站点内部。

?Surface Texture- Variations found on the real surface of the wafer that deviat e from the reference surface.

?表面纹理- 晶圆片实际面与参考面的差异情况。

?Test Wafer- A silicon wafer that is used in manufacturing for monitoring and t esting purposes.

?测试晶圆片- 用于生产中监测和测试的晶圆片。

?Thickness of Top Silicon Film- The distance found between the face of the top silicon film and the surface of the oxide layer.

?顶部硅膜厚度- 顶部硅层表面和氧化层表面间的距离。

?Top Silicon Film- The layer of silicon on which semiconductor devices are plac ed. This is located on top of the insulating layer.

?顶部硅膜- 生产半导体电路的硅层,位于绝缘层顶部。

?Total Indicator Reading (TIR)- The smallest distance between planes on the surface of the wafer.

?总计指示剂数(TIR)- 晶圆片表面位面间的最短距离。

?Virgin Test Wafer- A wafer that has not been used in manufacturing or other processes.

?原始测试晶圆片- 还没有用于生产或其他流程中的晶圆片。

?Void- The lack of any sort of bond (particularly a chemical bond) at the site of bonding.

?无效- 在应该绑定的地方没有绑定(特别是化学绑定)。

?Waves- Curves and contours found on the surface of the wafer that can be se en by the naked eye.

?波浪- 晶圆片表面通过肉眼能发现的弯曲和曲线。

?Waviness- Widely spaced imperfections on the surface of a wafer.

?波纹- 晶圆片表面经常出现的缺陷。

财务专业术语中英文对照表

财务专业术语中英文对照表 英文中文说明 Account Accounting system 会计系统 American Accounting Association 美国会计协会 American Institute of CPAs 美国注册会计师协会 Audit 审计 Balance sheet 资产负债表 Bookkeepking 簿记 Cash flow prospects 现金流量预测 Certificate in Internal Auditing 部审计证书 Certificate in Management Accounting 管理会计证书 Certificate Public Accountant注册会计师 Cost accounting 成本会计 External users 外部使用者 Financial accounting 财务会计 Financial Accounting Standards Board 财务会计准则委员会 Financial forecast 财务预测 Generally accepted accounting principles 公认会计原则 General-purpose information 通用目的信息 Government Accounting Office 政府会计办公室 Income statement 损益表 Institute of Internal Auditors 部审计师协会 Institute of Management Accountants 管理会计师协会 Integrity 整合性 Internal auditing 部审计 Internal control structure 部控制结构 Internal Revenue Service 国收入署 Internal users部使用者 Management accounting 管理会计 Return of investment 投资回报 Return on investment 投资报酬 Securities and Exchange Commission 证券交易委员会

统计学术语中英对照

population 母体 sample 样本 census 普查 sampling 抽样 quantitative 量的 qualitative/categorical质的 discrete 离散的 continuous 连续的 population parameters 母体参数 sample statistics 样本统计量 descriptive statistics 叙述统计学 inferential/inductive statistics 推论 ... 抽样调查(sampliing survey 单纯随机抽样(simple random sampling 系统抽样(systematic sampling 分层抽样(stratified sampling 整群抽样(cluster sampling 多级抽样(multistage sampling 常态分配(Parametric Statistics) 无母数统计学(Nonparametric Statistics) 实验设计(Design of Experiment) 参数(Parameter) Data analysis 资料分析 Statistical table 统计表 Statistical chart 统计图 Pie chart 圆饼图 Stem-and-leaf display 茎叶图 Box plot 盒须图Histogram 直图 Bar Chart 长条图 Polygon 次数多边图 Ogive 肩形图 Descriptive statistics 叙述统计学 Expectation 期望值 Mode 众数 Mean 平均数 Variance 变异数 Standard deviation 标准差 Standard error 标准误 Covariance matrix 共变异数矩阵 Inferential statistics 推论统计学 Point estimation 点估计 Interval estimation 区间估计 Confidence interval 信赖区间 Confidence coefficient 信赖系数 Testing statistical hypothesis 统计假设检定 Regression analysis 回归分析 Analysis of variance 变异数分析 Correlation coefficient 相关系数 Sampling survey 抽样调查 Census 普查 Sampling 抽样 Reliability 信度 Validity 效度 Sampling error 抽样误差 Non-sampling error 非抽样误差 Random sampling 随机抽样 Simple random sampling 简单随机抽样法 Stratified sampling 分层抽样法 Cluster sampling 群集抽样法 Systematic sampling 系统抽样法 Two-stage random sampling 两段随机抽样法 Convenience sampling 便利抽样 Quota sampling 配额抽样 Snowball sampling 雪球抽样 Nonparametric statistics 无母数统计 The sign test 等级检定 Wilcoxon signed rank tests 克森讯号等级检定 Wilcoxon rank sum tests 克森等级和检定 Run test 连检定法 Discrete uniform densities 离散的均匀密度 Binomial densities 二项密度 Hypergeometric densities 超几密度 Poisson densities 卜松密度 Geometric densities 几密度 Negative binomial densities 负二项密度 Continuous uniform densities 连续均匀密度 Normal densities 常态密度 Exponential densities 指数密度 Gamma densities 伽玛密度 Beta densities 贝他密度 Multivariate analysis 多变量分析 Principal components 主因子分析 Discrimination analysis 区别分析 Word 资料

集装箱专用词汇中英文对照表1

集装箱专用词汇中英文对照表 (内部参考) 版本号:200001 日期:Tuesday, May 23, 2000 南通中集顺达集装箱有限公司

目录 一、生产制造---------------------------------2 二、门端、后端-------------------------------2 三、锁杆装置---------------------------------3 四、铰链-------------------------------------4 五、紧固件-----------------------------------4 六、前端-------------------------------------4 七、侧墙-------------------------------------5 八、顶部-------------------------------------6 九、底部-------------------------------------6 十、焊接-------------------------------------7 十一、打砂-------------------------------------7 十二、油漆-------------------------------------8 十三、地板-------------------------------------9 十四、密封胶-----------------------------------9 十五、门封-------------------------------------9 十六、材料、部件-------------------------------10 十七、机器设备、工具---------------------------10 十八、试验-------------------------------------11 十九、标贴-------------------------------------12 二十、缺陷及维修-------------------------------13 其他-------------------------------------15二十 一、 二十罐箱-------------------------------------18

(完整版)放疗专业术语中英文对照表

Chemntherapeutic agents 化学疗法 thus xue fiao fa) Chemothcrjipy 化学疔,Z (hija xue Aaa fa) hns the goal of killing or stopping rhe development nf rapidly dividing cells. Examples are Cisplatin, Carboplat in, Bkomycin I 博来霉嗪1 (ftd l3f Sg S-fltinrncjrao 5 氟尿瞪喘(ft/ HiAO m dfinfl), mrthotrExate 甲員媒时{Jia 的 did /ioffk Vincristine fifr chun xJTj/a^, Vinblastine 衣祚碱 (chang chun ;ian}. Taxol and Tawiuvirtn .木戟题(SSfi ben 阳ng 钠* Since the sanK nicchanism (hat kilh malignant cdl or blocks de vela pment of a malignant cell cm have similar effects on a nnrnuil, rap idly dividing celt any of LhcNt agents ciin hax r c btid side clfccts. Some terms of cancer ircitLcd with chemcthera 卩、may cjus,e ihe cancer (o "disappear

暖通专业术语中英文对照词汇表

1. 热力学thermodynamics 2. 热源heat source 3. 热力学平衡状态thermodynamic equilibrium state 4. 稳态steady state 5. 非稳态unsteady state 6. 可逆过程reversible process 7. 不可逆过程irreversible process 8. 热力学第一定律first law of thermodynamics 9. 热力学第二定律second law of thermodynamics 10. 热力学第三定律third law of thermodynamics 11. 内能internal energy 12. 焓enthalpy 13. 熵entropy 14. 热量heat 15. 理想气体ideal gas 16. 相变change of phase 17. 汽化vaporization 18. 蒸发evaporation 19. 沸腾boiling 20. 沸点boiling point 21. 凝结condensation 22. 饱和状态saturation state

23. 饱和温度saturation temperature 24. 饱和压力saturation pressure 25. 饱和液体saturation liquid 26. 饱和蒸汽saturation vapor 27. 过饱和supersaturation 28. 湿蒸汽wet vapor 29. 过热superheat 30. 过热蒸汽superheated vapor 31. 过热度degree of superheat 32. 过冷subcooling 33. 过冷液体subcooled liquid 34. 气-液混合物liquid-vapor mixture 35. 干度quality 36. 冷凝点condensation point 37. 冷凝液condensate 38. 共沸混合物azeotropic mixture 39. 共沸性azeotropy 40. 共沸点azeotropic point 41. 凝固solidification 42. 熔化fusion 43. 熔点melting point 44. 升华sublimation

采矿工程专业英语(部分重要文章翻译)

P1 二、复合难句: 1、Mining may well have been the second of humankind's earliest endeavors--granted that agriculture was the first. The two industries ranked together as the primary or basic industries of early civilization 如果说农业是人类最早的产业(文明)的话,那么采矿就理所当然地排在第二。这两种产业作为人类早期文明最原始或最基本的产业联系在了一起。 2、If we consider fishing and lumbering as part of agriculture and oil and gas production as part of mining , then agriculture and mining continue to supply all the basic resources used by modern civilization 如果我们把捕鱼业和伐木业作为农业的一部分,而石油和天然气产业作为采矿的一部分,那么农业和采矿业至今仍是现代文明所使用的基础资源的支柱 3、Here the term mining is used in its broadest context as encompassing the extraction of any naturally occurring mineral substances-solid , liquid , and gas-from the earth or other heavenly bodies for utilitarian purposes. 这里所说的采矿是指广义上的,因为它包括为实利目的而从地球或其他天体岩石中获取任何天然形成的固态、液态和气态矿物的开采 4、Mine:An excavation made in the earth to extract minerals 采矿:为了开采矿物而在地球上进行的一种挖掘 5、Mining: the activity , occupation , and industry concerned with the extraction of minerals 采矿业:一种与开采矿物有关的活动、职业和产业 6、Mining engineering: the practice of applying engineering principles to the development , planning , operation , closure and reclamation of mines. 采矿工程:运用工程原理生产、规划、运作和关闭(充填)以及对矿山再利用(复垦)的一种实践 7、Mineral:A naturally occurring inorganic element or compound having an orderly internal structure and a characteristic chemical composition , crystal form , and physical properties. 矿物:一种天然形成的无机元素或化合物(无机物),它有着有序的内部构造、特有的化学成分、结晶形式和物理性质。 8、Rock:Any naturally formed aggregate of one or more types of mineral particles

肉类词汇中英文名称对照表

肉类词汇中英文名称对照表 Back Ribs 背小排 Backstraps /Paddywack 板筋 Bnls Shortribs 去骨牛小排 Bone-in Breast 火鸡带骨胸肉 Boneless Chuck Shortribs 肩胛牛小排Breast 火鸡胸肉 Brisket Bone 胸骨 Chuck BBQ Ribs 肩胛肋排 and etc. Chuck Roll 肩胛肉卷 /上脑 Drumettes 火鸡翅根 Drumsticks 琵琶腿 Ears Flaps 耳片 Finger Meat 牛肋条 Flexor Tendon 前蹄筋 Fry 火鸡睾丸 Full Neck Bone 颈骨 Gizzards 鸡胗 Ground Turkey 火鸡绞肉 Hearts 火鸡心 Hind Tendons 后蹄筋 Honeycomb Tripes 金钱肚 Japan Soft Bone 日式软骨/小排 and etc. Kidney 猪腰 Large Intestine 大肠 Livers 火鸡肝 MDT and etc. Mountain Chains 牛肚梁 Omasum 牛百叶 Oxlips 牛唇 Oxtails 牛尾 Paws 凤爪 Pouch Stoamchs 整肚 Regular Front Feet 猪手

Ribeye/Cube Roll 眼肉 Ribs 带骨肋脊肉 Scalded Aorta 牛心管 Short Cut Front Feet 短切猪手 Short Plate/Brisket Navel End /Navel 胸腹肥牛Shortloin 带骨前腰脊肉 Shortribs 带骨牛小排 Small Intestine 小肠 Snout 猪脸 Split Stomachs 片肚 Striploin 西冷 Super Pastrimi 精修胸腹肥牛 Tails 火鸡尾 Tenderloin 牛柳 Tip-on Tongues 猪舌 Tom / Hen / Regular Drums 公 /母 /常规火鸡琵琶腿Tom / Hen 2-Joint Wings 公 /母火鸡两节翅 Tom / Hen Necks 公 /母火鸡颈 Tom / Hen Thigh 公 /母火鸡大腿 Tom / Hen Wings 公 /母火鸡全翅 Tom/Hen Gizzards 公/母火鸡胗 Tom/Hen Whole Turkey Birds 公 /母整火鸡 Tongues 牛舌 Top Blade Muscle/ Digital Muscle 板腱 Tripe Pieces 肚片 Tripes 牛肚 Tunic Tissue/ Diaphragm Membrane 横隔筋 Un-washed Whole Hearts 未洗整猪心 Whole Wings 整翅 Wing Middle Joint 翅中 Wing Tips 翅尖

专业术语中英文对照表

语文课程与教学论 名词术语中英文对照表 the Chinese Course and Teaching and Learning Theory in Chinese and English Teaching materials editing teaching materials /Chinese Teaching Materials /edit teaching materials /Uniformed Chinese Teaching Materials /Experimental Teaching Materials /Mother Tongue Teaching Materials /Teaching Materials of the New Course *textbook *reading book *teaching reference book *exercises book *studying plan Technology /Educational Technology /Modern Educational Technology /Educational Technology in Chinese Teaching /multi-media technology /net technology /cloud serving technology *white board *net meeting *chat room *blog Teaching Basic Theory of the Teaching teaching aim teaching task teaching objective teaching model teaching tactics teaching principle teaching program teaching reform teaching case Courseware teaching resources teaching experiment /mother tongue teaching A Term List of 1. 教材( JC ) 教材编写 /语文教材 /编写教材 / 统编教材 /实验教材 /母语教材 /新课程教材 * 课本 * 读本 * 教学参考书(教参) * 练习册 *学案 2. 技术( JS ) / 教育技术 /现代 教育技术 /语文 教育技术 /多媒 体技术 / 网络 技术 /云服务技 术 * 白板 *网 络会议 *聊天室 * 博克 3. 教学 (JX ) 教学基本理论 教学目的 教学 任务 教学目标 教学模式 教学 策略 教学原则 教学大纲 教学 改革 教学案例 教学课件 教学 资源 教学实验 /母语教学

环境资源词汇(中英文对照)

大气ATMOSPHERE 大气组成 Atmospheric composition 空气质量 Air quality 大气化学 Atmospheric chemistry 大气成分 Atmospheric components 大气颗粒物 Atmospheric particulates 二氧化碳 Carbon dioxide 温室气体 Greenhouse gases 氧气 Oxygen 臭氧层 Ozone layer 大气过程 Atmospheric processes 空气-水相互作用 Air-water interaction 大气环流 Atmospheric circulation 大气降水 Atmospheric precipitation 碳循环 Carbon cycle 蒸发作用 Evaporation 降水增加 Precipitation enhancement 降雨 Rainfall 太阳辐射 Solar radiation 蒸腾作用 Transpiration 风 Winds 空气污染 Air pollution 酸雨 Acid rain

空气污染物 Air pollutants 氯氟碳 Chlorofluorocarbons 沉降的颗粒物 Deposited particulate matter 飞灰 Fly ash 雾 Fog 薄烟 Haze 空内空气污染 Indoor air pollution 烟雾 Smog 气候问题 Climatic issues 农业气象学 Agrometeorology 气候 Climate 气候变化 Climatic change 气候带 Climatic zones 干旱 Drought 全球变暖 Global warming 温室效应 Greenhouse effect 湿度 Humidity 微气候影响 Microclimate effects 海平面上升 Sea level rise 人工影响天气 Weather modification 岩石圈 LITHOSPHERE 固态地球 Solid Earth

世界手表专业词汇中英文对照

Accuracy (准确度) 钟与表是最古老的,也是最需讲究准确度的机械装置。 一天(86,400秒)中偏离(快或慢)正确时间30秒的机芯(movement),在数学上,误差是0.035%。换句话说,准确度是99.965%。 官方认证的天文台表(chronometers)必须误差低於0.005%的需求,18世纪的怀表,即使经精细的调校,一天的误差仍在半小时左右。 Adjustment (调校) 调校的项目有温度(temperature)、位置(position)与等时性( Isochronism)。高级钟表通常有冷、热、5方位与等时共8项调校手续。温度调校一般是指4℃、20℃与38℃。 Alarm Watch (闹铃表) 在预设的时间到时会自动发出声响的怀表与腕表。 闹铃表是人类所设计的机械时计中最早期的复杂表之一,16世纪就已出现。当今要找到一苹有闹表装置的古怀表很不易。至於现代的腕表不论是石英的、电子的、手上链或自动上链的很普遍。下列厂牌都有闹铃表∶万宝龙(MONTBLANC)、梭曼(REVUE THOMMEN)、IKEPOD(seaslug alarm)、积家与VULCAIN等。

Analogue,Analog indications (指针式时间显示) 此术语用来表示∶「表的面盘以指针(hands)而非数字(digital)来显示时间」。「指针绕著面盘移动是传统显示时间的方式。近代腕表也有视窗数字型显示月份、星期与日期的,但是时与分仍保留指针式,电子表则大多是数字(digital)指示的。 Annual calandar (年历表或日、月、星三历表) 每逢小月(30天)和二月(是否闰年?)都必须动手调校日期的表。例如百达翡丽的Ref. 5035。 Aperture (孔径、视窗) 在表的面盘上所开的孔或称为视窗。例如雅典(Ulysse Nardin)所生产的 Ludwig式万年历腕表,就有年份、月、星期与日期小视窗。 Arbor (轴、心轴) 机芯运转构造的轮轴(axle),就是arbor(轴、心轴),不过为区分别起见,在平衡轮(bal ance)上的称为staff(轴杆),而在lever(马仔)上称为arbor(心轴)。

各种专业名称英语词汇中英文对照表

各种专业名称英语词汇中英文对照表

————————————————————————————————作者: ————————————————————————————————日期: ?

各种专业名称英语词汇中英文对照表 哲学Philosophy 马克思主义哲学Philosophy of Marxism 中国哲学ChinesePhilosophy 外国哲学ForeignPhilosophies ?逻辑学Logic?伦理学Ethics 美学Aesthetics 宗教学Science of Religion?科学技术哲学Philosophy of Science andTechnology?经济学Economics?理论经济学Theoretical Economics ?政治经济学PoliticalEconomy ?经济思想史History ofEconomic Thought ?经济史History of Economic 西方经济学WesternEconomics?世界经济World Economics ?人口、资源与环境经济学Population,Resources andEnvironmentalEconomics 应用经济学Applied Economics 国民经济学National Economics?区域经济学Regional Economics ?财政学(含税收学)Public Finance (includingTaxation) 金融学(含保险学) Finance (including Insurance)?产业经济学Industrial Economics ?国际贸易学International Trade 劳动经济学Labor Economics ?统计学Statistics ?数量经济学Quantita tive Economics ?中文学科、专业名称英文学科、专业名称 国防经济学National Defense Economics?法学Law 法学Science of Law ?法学理论Jurisprudence?法律史Legal History ?宪法学与行政法学Constitutional Law and Administrative Law 刑法学Criminal Jurisprudence 民商法学(含劳动法学、社会保障法学)Civil Law and Commercial Law (i ncluding Science of LabourLawand Science ofSocial Sec urityLaw)?诉讼法学Science of ProcedureLaws ?经济法学Sc ience ofEconomic Law ?环境与资源保护法学Science ofEnvironment andNatural Resources Protection Law 国际法学(含国际公法学、国际私法学、国际经济法学、)Internationallaw (including International Public law, International PrivateLaw a

采矿术语英语

02 采矿 序码汉文名英文名注解02、001 采矿工艺mining technology 02、002 有用矿物valuable mineral 02、003 冶金矿产原料metallurgical mineral raw materials 02、004 矿床mineral deposit 02、005 特殊采矿specialized mining 02、006 海洋采矿oceanic mining,marine mining 02、007 硬岩采矿hard rock mining 02、008 矿田mine field 02、009 矿山mine 02、010 露天矿山surface mine, open-pit mine 02、011 地下矿山underground mine 02、012 井田shaft area 02、013 矿井shaft 02、014 矿床勘探mineral deposit exploration 02、015 矿山场地布置mine yard layout 02、016 矿山可行性研究mine feasibility study 02、017 矿山生产能力mine production capacity 02、018 矿山规模mine capacity 02、019 矿山年产量annual mine output 02、020 清洁开采clean mining 02、021 无废开采waste-less mining 02、022 数字矿山digital mine 02、023 绿色矿山green mine 02、024 采矿方法mining method 02、025 矿山环境评价mine environment assessment 02、026 矿块Ore block 02、027 矿山安全评价mine safety assessment 02、028 采矿权mining right 02、029 分期开采phased mining 02、031 矿区mine area 02、032 富矿rich ore 02、033 贫矿lean ore

各种专业名称英语词汇中英文对照表

各种专业名称英语词汇中英文对照表 哲学Philosophy 马克思主义哲学Philosophy of Marxism 中国哲学Chinese Philosophy 外国哲学Foreign Philosophies 逻辑学Logic 伦理学Ethics 美学Aesthetics 宗教学Science of Religion 科学技术哲学Philosophy of Science and Technology 经济学Economics 理论经济学Theoretical Economics 政治经济学Political Economy 经济思想史History of Economic Thought 经济史History of Economic 西方经济学Western Economics 世界经济World Economics 人口、资源与环境经济学Population, Resources and Environmental Economics 应用经济学Applied Economics 国民经济学National Economics 区域经济学Regional Economics 财政学(含税收学)Public Finance (including Taxation) 金融学(含保险学)Finance (including Insurance) 产业经济学Industrial Economics 国际贸易学International Trade 劳动经济学Labor Economics 统计学Statistics 数量经济学Quantitative Economics 中文学科、专业名称英文学科、专业名称 国防经济学National Defense Economics 法学Law

仓库专业术语参考中英文对照

仓库专业术语参考中英 文对照 Company Document number:WTUT-WT88Y-W8BBGB-BWYTT-19998

收发存专用的英语大全; 收货组ReceivingTeam; 收货区ReceivingArea; 散装区BulkStorage; 货架区RackStorage; 入库Entry; 入库单"Warehouseentry;"; 收货单ReceivingNote; 收货产品ReceivingProduct; 物品接收时间GoodsReceiveDate;物品数仓库收发存专用的英语大全 收货组ReceivingTeam 收货区ReceivingArea 散装区BulkStorage 货架区RackStorage 入库Entry 入库单"Warehouseentry"

收货单ReceivingNote 收货产品ReceivingProduct 物品接收时间GoodsReceiveDate 物品数量总计GoodsTotalMaterialQuantity重量weight 毛重GrossWeight 净重NetWeight 最大重量MaximumWeight 最小重量MiximumWeight 总计容量TotalCapacity 出库单DeliveryList 拣货PickingGoods 拣货区PickingArea 转储单TransferOrder 检验报告单InspectionDocument 物料清单BillofMaterial 料号PartNumber 电子单据ElectronicsNote

码盘Pallet-Sorting 分拣Picking/Sorting 采购订单PurchaseOrder(PO)手写单HandNote 到货通知ArrivalNotice 报关到货ImportingGoods 检验单InspectionNote 入库扫描EntryScanning 扫描Scan 存货InStock 冻结的BlockedStock 库存Inventory/Stock 库存清单StockList 发货区ShippingArea 发货单Deliverysheet 盘点Count 日盘DailyCount

采矿名词中英文解释(比较全)

采矿名词中英文解释(比较全) 房柱式采煤法 每隔一定距离先采煤房直至边界,再后退采出煤房之间煤柱的采煤方法。 掩护支架采煤法 在急斜煤层中,沿走向布置采煤工作面,用掩护支架将采空区和工作空间隔开、向俯斜推进的采煤方法。 伪倾斜柔性掩护支架采煤法flexibleshieldmininginthefalsedip 在急煤层中,沿伪倾斜布置采煤工作面,用柔性掩护支架将采空区和工作空间隔开,沿走向推进的采煤方法。 倒台阶采煤法 在急斜煤层中,布置成下部超前的台阶形的工作面,并沿走向推进的采煤方法。 正台阶采煤法 又称“斜台阶采煤法”。在急斜煤层中,沿伪倾斜方向布置成上部超前的台阶形工作面,并沿走向推进的采煤方法。 水平分层采煤法 急斜厚煤层沿水平面划分分层的采煤方法。 斜切分层采煤法 急斜厚煤层沿与水平面成25-30°角的斜面划分分层的采煤方法。

仓储采煤法 急斜煤层中将采落的煤暂留于已采空间中,待仓房内的煤体采完后,再依次放出存煤的采煤方法。 伪斜长壁采煤法 在急斜煤层中布置俯伪斜长壁工作面,用密集支柱隔开已采空间,并沿走向推进的采煤方法。 长壁放顶煤采煤法 开采6m以上缓斜厚煤层时,先采出煤层底部长壁工作面的煤,随即放采上部顶煤的采煤方法。 水平分段放顶煤采煤法 在急斜煤层中,按一定高度分成若干个分段。在分段内先采出底部工作面的煤,随即放出上部顶煤的采煤方法。 放煤步距 用放顶煤采煤法时,沿工作面推进方向前后两次放煤的间距。 放煤顺序 放顶煤时,各放煤口放煤方式和次序。 放采比 用放顶煤采煤法时,上部放顶煤高度与下部工作面采高之比。 自重充填 曾称“自溜充填”。利用自重将充填材料送入采空区的充填方法。机械充填

常见营养词汇中英文对照表

中英文名词对照 A 烟曲霉A.fumigatus 构巢曲霉A.nidulans 模式曲霉A.nominus 赭曲霉A.ochraceus 寄生曲霉A.parasiticus 杂色曲霉A.versicolor 吸收剂量absorbed dose 每日允许摄入量acceptable daily intake,ADI 乙酰磺胺酸钾acesuffate potassium 乙酰CoA acetyl CoA 酸价acid value,AV 酸度调节剂acidulating agent 苯乙烯-丙烯腈-丁二烯共聚物acrylonitrile butadiene styrene,ABS 苯乙烯与丙烯腈的共聚物acrylonitrile styrene,AS 活性系数activity coefficient,AC 急性暴发性脚气病acute beriberi 生热作用adaptive thermogenesis 腺苷酸环化酶adenylate cyclase 适宜摄入量adequate intake,AI 脂联素adiponectin 青春发育期adolescence 黄曲霉毒素B l Aflatoxin B l,AFB l 丙氨酸alanine(Ala) 白蛋白albumin 尿黑酸尿症alcaptonuria 酒精滥用alcohol abuse 酒精依赖alcohol dependence,alcoholism 糊粉层aleurone layer 白细胞缺乏症alimentary toxic aleukia,A TA 阿力甜alitame 蒜素allicin 蒜苷alliin 蒜氨酸酶allinase 全反式视黄醛all-trans retinal α-胡萝卜素alpha-carotene 交链孢霉属Alternaria 苋菜红amaranth 美国糖尿病协会American Diabetes Association,ADA 氨基酸amino acid 氨基酸模式amino acid pattern 氨基酸池amino acid pool 氨基酸评分amino acid score,AAS

制药行业术语中英文对照

术语表 Acceptance Criteria–接受标准:接受测试结果的数字限度、范围或其他合适的量度标准。Active Pharmaceutical Ingredient(API)(or Drug Substance)-活性要用成分(原料药)旨在用于药品制造中的任何一种物质或物质的混合物,而且在用于制药时,成为药品的一种活性成分。此种物质在疾病的诊断,治疗,症状缓解,处理或疾病的预防中有药理活性或其他直接作用,或者能影响机体的功能和结构。 API Starting Material–原料药的起始物料:用在原料药生产中的,以主要结构单元被并入该原料药的原料、中间体或原料药。原料药的起始物料可能是在市场上有售,能够根据合同或商业协议从一个或多个供应商处购得,或者自己生产。原料药的起始物料通常有特定的化学特性和结构。 Batch(or Lot)-批:有一个或一系列工艺过程生产的一定数量的物料,因此在规定的限度内是均一的。在连续生产中,一批可能对应与生产的某以特定部分。其批量可规定为一个固定数量,或在固定时间间隔内生产的数量。 Batch Number(or Lot Number)-批号用于标识一批的一个数字、字母和/或符号的唯一组合,从中可确定生产和销售的历史。 Bioburden–生物负载:可能存在与原料、原料药的起始物料、中间体或原料药中的微生物的水平和种类(例如,治病的或不治病的)。生物负载不应当当作污染,除非含量超标,或者测得治病生物。 Calibration–校验:证明某个仪器或装置在一适当的量程范围内测得的结果与一参照物,或可追溯的标准相比在规定限度内。 Computer System–计算机系统:设计安装用于执行某一项或一组功能的一组硬件元件和关联的软件。 Computerized System–计算机化系统与计算机系统整合的一个工艺或操作。Contamination–污染:在生产、取样、包装或重新包装、贮存或运输过程中,具化学或微生物性质的杂质或外来物质进入或沾染原料、中间体或原料药。 Contract Manufacturer–协议制造商:代表原制造商进行部分制造的制造商。 Critical–决定性的:用来描述为了确保原料药符合规格标准,必须控制在预定范围内的工艺步骤、工艺条件、测试要求或其他有关参数或项目。 Cross-Contamination–交叉污染:一种物料或产品对另一种物料或产品的污染。 Deviation–偏差:对批准的指令或规定的标准的偏离。 Drug(Medicinal)Product–药品:经最后包装准备销售的制剂(参见Q1A) Drug Substance–药物见原料药 Expiry Date(or Expiration Date)-有效期:原料药容器/标签上注明的日期,在此规定时间内,该原料药在规定条件下贮存时,仍符合规格标准,超过这以期限则不应当使用。 Impurity–杂质:存在与中间体或原料药中,任何不希望得到的成分。 Impurity Profile–杂质概况:对存在于一种原料药中的已知和未知杂质的描述。 In-Process Control(or Process Control)-中间控制:生产过程中为监测,在必要时调节工艺和/或保证中间体或原料药符合其规格而进行的检查。 Intermediate–中间体:原料药工艺步骤中生产的、必须经过进一步分子变化或精制才能成为原料药的一种物料。中间体可以分离或不分离。 Manufacture–制造:物料的接收、原料药的生产、包装、重新包装、贴签、重新贴签、质量控制、放行、贮存和分发以及相关控制的所有操作。 Material–物料:原料(起始物料,试剂,溶剂),工艺辅助用品,中间体,原料药和包装及贴签材料的统称。

相关文档
最新文档