Multiple Hydrogen Bonding for Reversible Polymer Surface Adhesion

Multiple Hydrogen Bonding for Reversible Polymer Surface Adhesion Kalpana Viswanathan,Hayriye Ozhalici,Casey L.Elkins,Cheryl Heisey,

Thomas C.Ward,*and Timothy E.Long

Department of Chemistry,Macromolecules and Interfaces Institute,Virginia Polytechnic Institute and

State Uni V ersity,Blacksburg Virginia24061

Recei V ed August18,2005.In Final Form:No V ember9,2005

Specific and reversible adhesion of a terminal thymine-functionalized polystyrene(PS-thymine)was demonstrated for a silicon surface with complementary adenine recognition sites.A novel adenine-containing triethoxysilane(ADPTES), which was suitable for covalent attachment to silanol containing surfaces,was synthesized in one step from adenine and3-isocyanatopropyl triethoxysilane(IPTES).1H and13C NMR spectroscopy and fast atom bombardment mass spectroscopy confirmed the chemical structure,and29Si NMR spectroscopy indicated the absence of any premature hydrolysis of the alkoxysilane derivative.X-ray photoelectron spectroscopy(XPS)and water contact angle measurements indicated the attachment of PS-thymine to silicon surfaces that were modified with a mixture of ADPTES and 3-mercaptopropyl triethoxysilane(MPTES).PS-thymine attachment to surfaces that were modified with only MPTES was not observed.The exclusive attachment of PS-thymine to an ADPTES/MPTES-modified surface confirmed hydrogen bonding-mediated adenine-thymine association to silicon surfaces containing a sufficiently low concentration of adenine recognition sites.Although PS-thymine attachment to the ADPTES/MPTES-modified surfaces was insensitive to THF rinsing,the PS-thymine was completely removed from the surface upon DMSO rinsing because of the disruption of adenine-thymine hydrogen bonding with a more polar aprotic solvent.PS-thymine was successfully reattached to the ADPTES/MPTES-modified surface following the DMSO rinse,demonstrating the solvato-reversible nature of the adenine-thymine association.

Introduction

Molecular recognition,which is defined as the specific interaction between multiple molecules without the involvement of covalent bonding,forms the basis of supramolecular orga-nization in biological systems.1Noncovalent interactions such as electrostatic,hydrogen bonding,host-guest,andπ-πstacking are often of central importance in molecular recognition.2-4 Although relatively weak,these directional,multivalent interac-tions lead to the self-assembly of molecules into complex hierarchies with well-defined functional superstructures.Lehn and co-workers first developed self-assembly strategies based on molecular recognition to construct synthetic materials with unique physical properties.5The use of such molecular recognition sites on surfaces provides a platform for tuning the chemical as well as physical properties of a surface in a reversible and“on-demand”fashion.Also,molecular recognition sites on surfaces enables the preparation of functional surfaces for a myriad of applications ranging from electronics and optics to sensors and catalysis.6-10Moreover,the utility of functionalized thiols and alkoxy-or chlorosilanes will lead to surfaces modified with the desired molecular recognition groups.11-14

Previous efforts have employed molecular recognition groups on surfaces including selective inclusional complexation and ionic/hydrogen bonding interactions.15Several groups have used cyclodextrin(CD)-based host-guest interactions16,17as model membrane receptors and chemical sensors.8Kitano et https://www.360docs.net/doc/0311228457.html,ed cyclic voltammetry to study the association constants(K a)for the complexation of R-and -CD SAMs on gold surfaces with a variety of guest molecules such as bisphenols,azo compounds, and phthalic acid esters.8,9,15,18Several groups have demonstrated the capability of CD-modified gold surfaces in electrochemically induced reversible sensing of ferrocene molecules for potential applications in electronics and sensors.19-21The reversible ferrocene-CD interactions were also used in the self-assembly of nanoparticles.22,23

Electrostatic interactions between amines and carboxylic acids have also found use in the immobilization of nanoparticles and nanorods on gold surfaces.Sastry et al.24and Murphy et al.25 demonstrated the deposition of carboxylic acid-functionalized

*Corresponding author.E-mail:tward@https://www.360docs.net/doc/0311228457.html,.

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Tailored hydrogen bonding as a molecular recognition motif has gained attention in recent years.28,29Multiple hydrogen bonding,which is a directional interaction between a proton donor and proton acceptor,offers synthetic versatility.2In addition to their inherent directionality,these hydrogen bonding interac-tions also exhibit thermal and solvent reversibility.28,29Many research groups have utilized hydrogen bonding sites to obtain supramolecular assemblies in solution and on surfaces as well as functionalized polymers with desirable physical properties.30-41 Hydrogen bonding systems that range from single to quadruple hydrogen bonds have been well studied.29Compared to single hydrogen bonding groups,the incorporation of multiple acceptor and donor units in a molecule significantly enhances the strength of hydrogen bonding interactions and thus has received wide-spread attention in recent years.34,36,38,41Multiple hydrogen bonding groups are typically classified into two families.Self-complementary multiple hydrogen bonding(SCMHB)involves identical hydrogen bonding units,and complementary multiple hydrogen bonding(CMHB)involves dissimilar acceptor and donor units.Research efforts in our laboratories have also focused on the incorporation of multiple hydrogen bonding groups in both nonpolar and polar synthetic macromolecules,giving rise to materials with both low-temperature mechanical strength and high-temperature processability.42-45

Surface studies involving hydrogen bonding association have mostly involved low-molar-mass molecules.46,47Crooks et al. investigated carboxylic acid SAMs on gold as sensors for vapors of organic acids as well as bases.46The extent of vapor adsorption was dependent on the alkyl length of the organic acid,the pH of the organic base,and the chemical structure of the acid SAM. In the case of interaction between the acid SAMs and organic base vapors,the vapor-phase molecules readily desorbed upon N2purging,which indicated a relatively weak interaction between the sensor and probe molecules.47Kaifer et al.reported the assembly of crown ether fullerenes onto gold surfaces that were coated with ammonium-terminated SAMs.48Rogers et https://www.360docs.net/doc/0311228457.html,ed tetrapyridylporphyrins that were capable of forming multiple hydrogen bonds with carboxyl-terminated SAMs to obtain stable porphyrin-functionalized gold surfaces.49The deposition of individual nanometer-sized hydrogen-bonded assemblies of barbituric/cyanuric acid on calix[4]arene dimelamine monolayers on gold via hydrogen bonding interactions was also reported.50 Rotello et al.demonstrated recognition between gold surfaces that were patterned with diacyl-2,6-diaminopyridine(DAP)and an electroactive ferrocene-terminated uracil in solution using scanning tunneling microscopy(STM).51Competitive adsorption between ferrocene and alkyl uracil led to the reversible tuning of the electroactivity of the surface.Vansco et al.recently reported solvent and temperature effects for the dimerization of quadruple hydrogen bonding trifluromethyl/ferrocenyl-pyrimidone deriva-tives from solution to pyrimidonedisulfide SAMs on a gold surface.52It is important to note that surface immobilization enhanced the apparent association constant because the surface-confined dimers were stable for more than20h in CHCl3in contrast to only170ms for neat pyrimidinone dimers.However, the interaction on the surface was destroyed upon washing with DMSO and hot CHCl3.

Polymers that exhibit such reversible interactions with a solid surface hold considerable potential as releasable coatings and smart adhesives.In addition,the capability of reversibly attaching polymers to solid surfaces enables tunable surface energetics. Polymers that were functionalized with hydrogen bonding groups were assembled onto complementary surfaces to direct nano-particle assembly and tune surface characteristics.53-57Rotello and co-workers used nanoparticles and polymers functionalized with complementary hydrogen bonding groups such as thymine and triazine to form extended nanoparticle aggregates.53,54The nature and degree of substitution of the hydrogen bonding groups controlled the morphology of the nanoparticle aggregates.Rotello and co-workers also demonstrated hydrogen bond-mediated

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1100Langmuir,Vol.22,No.3,2006Viswanathan et al.

attachment of polyhedral oligomeric silesesquioxanes(POSS) that were derivatized with DAP to thymine-functionalized gold surfaces.57In a similar study,the adsorption of a diblock PS-b-P(S-r-CH2ODAP)copolymer onto thymine-functionalized gold substrates was studied,and it was reported that the polymer adsorption decreased as the length of the DAP-containing block increased.56The same research group also reported the reversible adsorption/desorption of DAP-containing monoblock and di-block copolymers onto thymine-functionalized gold surfaces.55 Although complementary triple hydrogen bonding thymine-DAP as well as self-complementary UPy-based quadruple hydrogen bonding interactions were studied earlier,hydrogen bonding interactions on surfaces using DNA base pairs have not received significant attention.In addition to exhibiting high

specificity,these interactions also have reasonable thermal stability.Several groups have studied the influence of DNA base pairs on the properties of polymers functionalized with these groups.43,58A limited number of earlier studies have employed adenine-thymine interactions on surfaces.59A relevant manu-script described the assembly of zeolites that were functionalized with thymine groups to adenine-functionalized glass surfaces.59 This article will describe an investigation of the stability and reversibility of DNA-base-pair-mediated association between a polymer and silicon surface.In the current study,silicon surfaces were modified with adenine using a novel adenine-derivatized triethoxysilane.To our knowledge,this is the first report on the modification of silicon surfaces with alkoxysilanes that are functionalized with multiple hydrogen bonding groups.PS containing a single,terminal,complementary thymine group was obtained via a sec-butyllithium(sec-BuLi)-initiated living anionic polymerization of styrene and subsequent termination with ethylene oxide.60,61Thymine was subsequently introduced at the PS chain end using a two-step Michael addition-based synthetic strategy.43Reversible attachment of the PS-thymine to the adenine-functionalized silicon surface was probed using XPS and water contact angle measurements.

Experimental Section

Materials.3-Isocyanatopropyl triethoxysilane(IPTES,95%, Aldrich)was vacuum distilled in the absence of purification reagents (0.1mmHg,30°C).Styrene(Aldrich)was stirred over CaH2for3 to4days,distilled under vacuum(0.1mmHg,10°C)after repeated degassing and freeze-thaw cycles,and stored at-25°C.Styrene was vacuum distilled from dibutylmagnesium(DBM)under similar conditions immediately prior to polymerization.DBM(25%solution in heptane,FMC Corporation Lithium Division),sec-BuLi(1.4M in cyclohexane,Aldrich),ethylene oxide(99%,Aldrich),anhydrous DMSO(Aldrich),potassium tert-butoxide(Aldrich),methanol(EMD Chemicals),dichloromethane(EMD Chemicals),concentrated H2SO4(VWR International),NH4OH(VWR International),H2O2 (30%,EMD Chemicals),and3-mercaptopropyl triethoxysilane (MPTES,95%,Gelest,Inc.)were used as received.Cyclohexane (EMD Chemicals)was distilled from sodium immediately prior to use.Adenine and thymine(Aldrich)were dried overnight in a vacuum oven at60°https://www.360docs.net/doc/0311228457.html,lipore milli-Q water was used for surface cleaning. Silicon wafers were a generous gift from the Hewlett-Packard Company.

Synthesis of Adenine-Functionalized Triethoxysilane (ADPTES).The synthesis of ADPTES involved the reaction of adenine with IPTES in anhydrous DMSO as shown in Scheme1.

All glassware was rigorously cleaned and flame dried.Dry adenine

(2g,14.8mmol)was dissolved in anhydrous DMSO(30mL)at145

°C under nitrogen.IPTES(4mL,16.2mmol,1.1equiv)was dissolved in anhydrous DMSO(10mL)in a100mL round-bottomed flask.

The adenine solution was slowly added to a room-temperature

solution of IPTES using a double-tipped needle(cannula)over30

min.The mixture was allowed to stir for an additional2h to ensure

complete reaction.DMSO was removed under vacuum,and the

solid product was dissolved in CHCl3and passed through Celite.

The solid was then recrystallized from cold toluene.The product

was isolated in about20%yield.1H NMR(400MHz,25°C in

CDCl3):δ0.77(-CH2CH2C H2Si-:2H,t);1.27(-Si-(OCH2-

C H3)3:9H,t);1.85(-CH2C H2CH2Si-:2H,m);3.54(-C H2N-:

2H,q);3.87(-Si-(OC H2CH3)3:6H,q);5.64(-N H CON H-:2H,

s);8.41(-N d C H-NH-:1H,s);8.57(-N-C H d N-:1H,s);

8.97(-N d CH-N H-:1H,s).13C NMR(100MHz,25°C in

CDCl3):δ7.28,17.9,22.6,42.2,58.1,119.6,138.8,147.8,148.6,

152.7,155.5.m/z)382.18(theoretical:382.5)

Synthesis of Acrylated-and Thymine-Functionalized Poly-

styrene.Hydroxy-terminated polystyrene(PS-OH)was synthesized

via anionic polymerization of styrene initiated with sec-BuLi in

cyclohexane at40°C.The living anions were end-capped with

ethylene oxide.60,61Acrylation of PS-OH and subsequent reaction

with thymine was performed according to a literature procedure.43

The PS-thymine product was characterized using1H NMR

spectroscopy.PS-OH:M n)1700g/mol,M w/M n)1.08;PS-

thymine:M n)2000g/mol,M w/M n)1.05. Characterization.Size-exclusion chromatography(SEC)data was obtained using a717Autosampler system equipped with three in-line5μm PLgel MIXED-C columns,a Waters2410refractive index detector operating at880nm,a Wyatt Technology miniDawn multiple-angle laser-light scattering(MALLS)detector operating at 690nm and calibrated with polystyrene standards,and a Viscotek model270differential/light-scattering dual detector.The refractive index increment(dn/d c)was calculated online.1H,13C,and29Si NMR spectroscopy were performed on a Varian UNITY spectrometer at400,100,and79.5MHz,respectively,with CDCl3as the solvent. Fast atom bombardment mass spectrometry(FAB-MS)was carried out using a Fissons Instruments VG Quattro.

Substrate Treatment.Silicon wafers were cut into1cm2samples

and sonicated for5min in dichloromethane and5min in methanol.

The wafers were blown with N2and cleaned with freshly prepared

Piranha solution(concentrated H2SO4/H2O2;v/v:70/30)at90°C

for1h,rinsed with milli-Q water,and cleaned with NH3/H2O2/H2O

(v/v/v:1/1/5)at60°C for15min.The wafers were then rinsed with

milli-Q water several times,blown dry with N2,and immediately

immersed in the alkoxysilane solution and allowed to stir for a given

time.(Caution:Piranha solution reacts V iolently with many organic

materials and should be handled with care.)

Covalent Modification of Silicon Surfaces.Freshly cleaned

silicon wafers were modified with a5mM solution of(25/75;mol/

mol)ADPTES/MPTES in CHCl3for6h and subsequently sonicated

three times in CHCl3to remove any physisorbed material.Surface

modification exclusively with MPTES and ADPTES was carried

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the Secondary

Amine

Hydrogen Bonding for Re V ersible Polymer Adhesion Langmuir,Vol.22,No.3,20061101

out under similar conditions.Wafers were characterized after each modification step using XPS and water contact angle measurements.PS -Thymine/PS -OH Treatment.The alkoxysilane-modified surfaces were immersed in a 5mM solution of PS -thymine or PS -OH in CHCl 3for 24h and exhaustively rinsed with both CHCl 3and THF.

Surface Characterization.The modified silicon surfaces were sonicated in a Branson 1200ultrasonic generator for 1h.Static water contact angles were measured in sessile drop mode using an FTA-200contact angle goniometer with a syringe-driven droplet.The values were measured 30s after dispensing the drop to obtain equilibrium values.Contact angles were measured at four to five different spots on each surface.XPS was obtained on a Perkin-Elmer model 5400instrument fitted with a Mg K R X-ray source (1253.8eV)at a takeoff angle of 30°.The anode was operated at 250W.The 285eV photoelectron peak of C 1s electrons was used as an internal XPS standard.

Results and Discussion

A novel adenine-containing alkoxysilane was synthesized in a single step via the reaction of adenine with IPTES (Scheme 1).1H and 13C NMR spectroscopy and FAB-MS confirmed the chemical structure of the isolated product.Characteristic 1H NMR resonances associated with the adenine groups were observed at 5.64ppm (-N H CON H -),8.41ppm (-N d C H -NH -),8.57ppm (-N -C H d N -),and 8.97ppm (-N d CH -N H -)in addition to resonances associated with triethoxysilane,which confirmed successful derivatization (Figure 1).29Si NMR spectra for both IPTES and ADPTES exhibited a single alkoxysilane Si resonance and confirmed the absence of any alkoxysilane hydrolysis (Figure 2)because any hydrolysis or condensation of the ethoxysilane group would have resulted in a pronounced

shift in the Si resonance to lower or higher field,respectively.62A three-step synthetic procedure for the synthesis of PS -thymine was adopted from our earlier literature,43and 1H NMR spectroscopy confirmed successful functionalization.

Freshly cleaned silicon surfaces were modified with a mixture of ADPTES/MPTES at a molar ratio of 1:3from a CHCl 3solution.Anhydrous CHCl 3was used to eliminate both premature hydrolysis of the ethoxysilane groups and multilayer formation.63A solution concentration of 5mM was used.MPTES was used as a diluent to lower the concentration of adenine groups on the silicon surface.Dilution of the adenine groups was considered because earlier literature has shown that the exclusive presence of molecular recognition groups on solid surfaces hinders the recognition phenomenon.1,64

The XPS elemental compositions of MPTES-and ADPTES/MPTES-coated silicon surfaces are shown in Table 1.It was not possible to quantify the mercapto groups on the surface because of the susceptibility of -SH groups to oxidation under ambient conditions.65Also,it was not possible to avoid oxidation of the mercapto groups despite performing reactions and storing the samples in the absence of light.The sulfur region in the XPS spectrum showed two peaks centered at 163.4and 168.3eV

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25.

Figure 1.1H NMR spectrum of ADPTES in CDCl 3(2wt %

solution).

Figure 2.29Si NMR spectra in 16wt %CDCl 3containing 0.06M Cr(acac)3of (a)IPTES and (b)ADPTES.

Table 1.XPS Elemental Composition of the MPTES and ADPTES/MPTES-Modified Silicon Surface before and after

PS -Thymine Treatment

atomic composition (%)

MPTES modified b ADPTES/MPTES

modified c XPS photoeletcron

peak a

binding energy (eV)before after d before after d

C 1s 285.029272033O 1s 532.3

35373630Si 2p 102.7;99.031313528N 1s 399.9

45S 2p

163.4;168.3

5

5

5

4

a

XPS conditions:Mg anode,takeoff angle )30°.b Surface modification with MPTES:5mM MPTES in CHCl 3,6h,extracted with CHCl 3.c Surface modification with the ADPTES/MPTES mix-ture:5mM ADPTES/MPTES (1:3molar ratio)in CHCl 3,6h,extracted with CHCl 3.d Surface modification with PS:5mM PS -thymine in CHCl 3,24h,extracted with CHCl 3/THF.

1102Langmuir,Vol.22,No.3,2006Viswanathan et al.

attributed to -SH groups and oxidized byproduct species,respectively.65However,the latter peak at 168.3eV was predominant,which indicated that most mercapto groups were oxidized under the experimental conditions.The S 2p photo-electron peak also indicated some residual sulfuric acid that was used in the cleaning procedure;this led to further difficulty in estimating the actual concentration of the mercapto sites on the surface.Although N was not observed on silicon surfaces that were coated with MPTES,XPS analysis of the silicon surface detected N after treatment with the ADPTES/MPTES mixture,as shown in Figure 3,which indicated successful adenine functionalization.The principal N 1s core-level peak exhibited a binding energy of 399.9eV,which was similar to literature values.66The C/N ratio was calculated on the basis of the atomic compositions given in Table 1for the surface modified with the mixture before polymer deposition and were higher than expected on the basis of the chemical composition of ADPTES,which further indicated co-deposition of MPTES on the surface.However,it was not possible to determine the actual ratio of N/S on the surface because of the above-mentioned reasons.Diluent systems with distinct XPS photoelectron peaks are currently under investigation in an attempt to determine the relative ratios of diluent/adenine on the surface.However,on the basis of a C/N ratio of 3.7and the chemical composition of the alkoxysilanes,it was estimated that there was 1ADPTES for every 4.4MPTES on the surface.This ratio is higher than the theoretical ratio based on solution composition,which would ideally give a C/N ratio of 3:1,assuming complete hydrolysis of the ethoxy groups.

Preferential chemisorption of the mercapto compound 67on the surface was disregarded on the basis of the following justification.For the MPTES-coated surface,the C/S ratio that was calculated from XPS was 6,which is higher than the expected ratio of 3calculated from the chemical composition of MPTES.Such a high ratio for C/S was observed for surfaces coated with mercaptopropyl trimethoxysilane and MPTES and was attributed to the presence of carbon impurities.65,68A similar trend was observed for surfaces coated with ADPTES,where the surfaces showed a C/N ratio of 2.8compared to the expected value of 1.5.Thus,the higher than expected C/N ratio from the relative concentrations of the two silanes in solution in the case of ADPTES and the mixture was attributed to the presence of carbon contamination.

The atomic compositions of the MPTES-and ADPTES/MPTES-coated surfaces following PS -thymine treatment and solvent rinse are also listed in Table 1.The atomic %C on silicon surfaces that were modified with the ADPTES/MPTES mixture increased following exposure to the PS -thymine solution,whereas the MPTES-modified surface showed no change.The %O and %Si on the ADPTES/MPTES-modified surface also decreased upon exposure to PS -thymine solution,which further confirmed the hydrogen bond-mediated attachment of PS -thymine to the ADPTES/MPTES-modified surface illustrated in Figure 4.When the surface was modified only with ADPTES,XPS atomic %C did not reveal polymer attachment as shown in Table 2,which suggested the role of steric hindrance in molecular recognition in a fashion similar to the earlier literature.1,64

Water contact angle measurements further supported XPS data.Static water contact angle results for MPTES-,ADPTES-,and ADPTES/MPTES-modified surfaces before and after PS -thymine treatment are summarized in Table 3.

(66)Herne,T.M.;Tarlov,M.J.J.Am.Chem.Soc.1997,119,8916.

(67)Heise,A.;Stamm,M.;Rauscher,M.;Duschner,H.;Menzel,H.Thin Solid Films 1998,327-329,199.

(68)Hu,M.;Noda,S.;Okubo,T.;Yamaguchi,Y.;Komiyama,H.Appl.Surf.Sci.2001,181,

307.

Figure 3.XPS survey spectra of silicon surfaces modified with (a)MPTES and (b)

ADPTES/MPTES.

Figure 4.Depiction of proposed molecular recognition between an ADPTES/MPTES-modified silicon surface and a thymine-func-tionalized polymer.

Table 2.XPS Elemental Composition of the ADPTES-Modified Silicon Surface before and after PS -Thymine Treatment atomic composition (%)XPS

photoelectron peak a

before b after c C 1s 2827O 1s 3233Si 2p 3131N 1s

9

9

a

XPS conditions:Mg anode,takeoff angle )30°.b Surface modification with ADPTES:5mM ADPTES in CHCl 3,6h,extracted with CHCl 3.c Surface modification with PS:5mM PS -thymine in CHCl 3,24h,extracted with CHCl 3/THF.

Hydrogen Bonding for Re V ersible Polymer Adhesion Langmuir,Vol.22,No.3,20061103

The water contact angle on a freshly cleaned silicon wafer was nearly 0°as the water drop spread to wet the silicon surface completely,and upon modification with MPTES,the contact angle increased to 35°.Earlier studies have shown that surfaces with a uniform layer of MPTES show a water contact angle of 60°;however,upon oxidation,the contact angle decreased to approximately 20°.57,65The water contact angle on the MPTES-coated surfaces in our study was intermediate between the two contact angle values reported above,which suggested partial oxidation of the surface mercapto groups in a consistent fashion with the XPS observation.When the surfaces were modified with the ADPTES/MPTES mixture,the surfaces showed a water contact angle of 40°,whereas the surface modified with neat ADPTES alone had a water contact angle of approximately 47°.This suggested that the former surface had a higher concentration of MPTES groups because the water contact angle was closer to values for an MPTES-coated surface.Following exposure of the ADPTES/MPTES-modified silicon surface to the PS -thymine solution,the water contact angle increased to 54°,which indicated successful PS -thymine attachment,whereas the MPTES-coated surface showed an insignificant change.Similarly,modification of ADPTES/MPTES-coated surfaces with PS -OH (M n )4200,M w /M n )1.05),which contained weaker hydrogen bonding hydroxyl groups,showed insignificant polymer attachment following the THF rinse as shown in Figure 5.This further confirmed the absence of any nonspecific polymer adsorption on adenine-coated surfaces.Studies with polymers containing noncomplementary bases such as cytosine were not attempted because of the limited solubility of cytosine under reaction conditions for thymine-functionalized PS.It should be noted that any oxidation of the residual mercapto groups on surfaces that were modified with neat MPTES or ADPTES/MPTES and subjected to polymer modification was negligible and insignificantly contributed to any error in the measurements.The 15°increase in water contact angle that was observed on ADPTES/MPTES following PS -thymine treatment is similar to earlier reports on the attachment of POSS -DAP to thymine-modified gold surfaces through a DAP -thymine interaction.42In comparison,neat PS films on solid surfaces have a higher water contact angle of 90°.69The lower 54°contact angle of the

PS -thymine treated surface was attributed to the attachment of PS -thymine to adenine groups randomly dispersed on the surface,which gives rise to heterogeneous polymer coverage.Thus,future efforts will involve the synthesis of random copolymers containing multiple hydrogen bonding units in an attempt to improve surface uniformity;however,the random nature of the copolymers versus well-defined terminal hydrogen bonding in this study is expected to complicate the assembly process.Despite nonuniform coverage,the PS coatings remained amenable to reversibility because of the hydrogen bonding attachment points.Attempts to investigate the influence of M n were not successful because of less efficient chain-end functionalization at molecular weights higher than 10000g/mol.

Elevated temperatures and moderate/strong polar solvents are known to disrupt adenine -thymine hydrogen bonding in solution.43,58Linear PS with DNA base pairs at a single chain end was found to undergo dissociation at 95°C in toluene.43Overberger and co-workers have prepared grafted and branched poly(ethyleneimine)molecules that were functionalized with DNA base pairs,and the influence of solution pH,polymer structure and flexibility,and relative position of the hydrogen bonding groups on the dissociation of adenine -thymine/adenine -uracil interactions was studied.58All of these factors were found to influence the temperature of dissociation,which was found to be between 45and 90°C.Park et al.suggested that the onset of adenine -thymine dissociation occurred on surfaces at 55°C.59In our study,the stability of hydrogen bonding-directed polymer association on a surface toward solvents was evaluated.The PS -thymine hydrogen bonds with the surface adenine groups remained despite multiple rinses with THF,which is a moderately polar solvent.Similarly enhanced stability toward CHCl 3was reported for surface-anchored pyrimidinone dimers relative to pyrimidinone dimers in solution.52However,as shown in Figure 6,a decreased %C and lower water contact angle were observed following rinses with the more polar DMSO (sample 3),which indicated the disruption of the adenine -thymine hydrogen bonds and the loss of PS -thymine from the silicon surface.

As observed earlier for solutions,the adenine -thymine associations were completely reversible on a surface,and it was possible to reattach PS -thymine to the surface adenine groups following the DMSO wash.This is shown in Figure 6,where a surface that was modified with a 1:3mixture of ADPTES/MPTES was subjected to a second PS -thymine treatment following the DMSO rinse (sample 4)and,as expected,PS -thymine reattached to the surface-bound adenine groups.The water contact angle increased from 39to 51°upon association of the PS -thymine to surface-bound adenine (Figure 6).A second DMSO rinse (sample 5)disrupted the adenine -thymine hydrogen bonding,which resulted in the removal of PS -thymine and a decrease in the water contact angle to 38°.A similar trend in XPS %Si,as shown in the bottom right corner of Figure 6,further confirmed the solvent-dependent reversible association between PS -thymine and surface adenine groups.The DNA-base-pair-mediated reversible association between the polymer and surface therefore demonstrates the utility of molecular recognition groups to reversibly switch the chemical properties and wetting characteristics of a silicon surface without any detectable hysteresis.Triblock copolymers were previously used in a covalent modification strategy to obtain surfaces with reversible wetting properties,where the anchored blocks dictated the surface energetics.70The noncovalent interaction between PS -thymine and the surface adenine groups in the current study allows for

(69)Boyes,S.G.;Brittain,W.J.;weng,X.;Cheng,S.Z.D.Macromolecules 2002,35,4960.

(70)Wang,J.L.;Kara,S.;Long,T.E.;Ward,T.C.J.Polym.Sci.,Part A:Polym.Chem.2000,38,

3742.

Figure 5.Variation in XPS %C (bars)and water contact angle (solid squares)on silicon surfaces modified with ADPTES/MPTES (1)before and (2)after PS -OH treatment.

Table 3.Water Contact Angle on MPTES,ADPTES,and ADPTES/MPTES Surfaces before and after PS -Thymine

Treatment

water contact angle (deg)before

after MPTES-modified surface 35(440(3ADPTES-modified surface

47(345(4ADPTES/MPTES-modified surface

40(5

54(6

1104Langmuir,Vol.22,No.3,2006Viswanathan et al.

surface modification with polymers of varied chemical composi-tion and topology for design flexibility and performance optimization.

Conclusions

A novel adenine-derivatized triethoxysilane (ADPTES)was successfully used to modify a silicon surface with adenine groups,and a thymine-functionalized PS was applied to adenine-modified surfaces from solution to investigate the capability of surface adenine groups to recognize and bind to thymine end-capped PS.Exclusive ADPTES modification of the surface resulted in very poor recognition of the complementary PS -thymine presumably because of steric hindrance and self-association on the surface.Silicon surfaces treated with a mixture of ADPTES and a mercaptopropyl triethoxysilane (MPTES)diluent,however,exhibited a high affinity for the PS -thymine,whereas neat MPTES modification did not lead to any recognition.The absence of nonspecific polymer adsorption on ADPTES/MPTES-coated

surfaces was further confirmed using a weakly hydrogen bonding PS -OH,which showed insignificant attachment to surfaces that were modified with the mixture.The hydrogen bonding between the complementary adenine and thymine groups were stable in THF but disrupted in DMSO.Water contact angle measurements and XPS analysis demonstrated reversible association between the PS -thymine and the surface adenine groups based on the solvent wash.

Acknowledgment.This material is based upon work sup-ported by the U.S.Army Research Laboratory and the U.S.Army Research Office under grant number DAAD19-02-1-0275Macromolecular Architecture for Performance (MAP)MURI.We also thank the FMC Lithium Division for the donation of alkyllithium and dibutylmagnesium reagents,Hewlett-Packard for silicon wafers,Tom Glass for 29Si NMR analysis,and Ann Campbell for FAB-MS.

LA052253H

Figure 6.XPS atomic %C and water contact angles (top)and atomic %Si (bottom)on silicon surface after ADPTES/MPTES modification (1),a PS -thymine treatment/THF rinse (2),the first DMSO rinse (3),the second PS -thymine treatment/THF rinse (4),and the second DMSO rinse (5).

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