英译中

Abstract: A novel conjugated polynitrile thin film, plasma-polymerized 3- quinolinecarbonitrile (PP3QCN) thin film was prepared by plasma polymerization of

3-quinolinecarbonitrile. Fourier transform infrared (FT-IR), Ultraviolet-visible spectroscopy (UV-Vis), and X-ray photoelectron spectroscopy (XPS) studies revealed that extensively conjugated C=N double bonds were formed in the

deposited plasma film and the plasma polymerization of 3-quinolinecarbonitrile took

place mainly through the opening of the bonds of C N functional group under our experimental conditions. Plasma-polymerized 3-quinolinecarbonitrile thin film

shows a blue emission with relatively high photoluminescence (PL) intensity at about 475 nm wavelength. The fabricated devices with PP3QCN as electroluminescent layer sandwiched between Indium Tin Oxides (ITO) and aluminium (Al) were also found to show a blue emission.

Key words: 3-quinolinecarbonitrile, plasma polymerization, photoluminescence

摘要：一种新型共轭polynitrile薄膜，等离子体聚合3 -

quinolinecarbonitrile（PP3QCN）薄膜制备等离子体聚合

3 quinolinecarbonitrile。傅里叶变换红外（FT - IR），紫外- 可见

光谱（紫外- 可见），和X射线光电子能谱（XPS）研究

透露，在形成广泛的共轭C = N双键

血浆膜沉积和等离子体聚合的3 quinolinecarbonitrile了

通过开放CN的功能组的债券，主要是根据我们的地方

实验条件。等离子体聚合3 quinolinecarbonitrile薄膜

显示了一个相对高的光致发光（PL）强度的蓝光发射

波长约475纳米。与PP3QCN编造设备

电致发光层之间的铟锡氧化物（ITO）和夹

铝（Al）中也发现，显示出蓝色发光。

关键词：3 quinolinecarbonitrile，等离子体聚合，光致发光。

Introduction

It has been shown that –conjugated polymer thin films have great potential in optoelectronic applications [1-3]. Development of new –conjugated polymers with high conjugation lengths and degree of inter-chain order are a possible strategy to

attain better materials for light emitting diode (LED) and photodiode applications [4]. Generally, ultrathin polymer films can be formed in two ways: one is the wet process, including the Langmuir-Blodgett method, spin-coating, dip coating and solution casting; the other is the dry process, such as physical vapor deposition and chemical

vapor deposition (CVD). Among these methods, plasma polymerization is gaining recognition as a good technique to obtain dense, uniform and stable thin films [5, 6].

简介

它已被证明，共轭聚合物薄膜具有巨大潜力

光电应用[1-3]。发展新型共轭聚合物

高共轭长度和链间秩序的程度，是一个可行的策略

达到更好的材料，发光二极管（LED）和光电二极管应用[4]。

一般来说，超薄聚合物薄膜可以形成两种方式：一种是湿法工艺，

包括LB膜法，旋涂，浸涂和解决方案

铸造;另一种是干的过程中，如物理气相沉积和化学，

气相沉积（CVD）。在这些方法中，等离子体聚合是获得

承认作为一个很好的技术，以获得致密，均匀，稳定的薄膜[5，6]。

The interesting optical properties of plasma polymerized thin films critically depend

on the conformation of the -conjugated chains in both the ground and the excited states and on the inter-chain orientation. Several recent reports demonstrate that chain structures exert a considerable effect on the nature and radiative properties of excited states in -conjugated polymers [7]. Controllability and reproducibility of the surface composition of plasma deposition thin film are utmost important to achieve superlative performance. Also, it is well known that several plasma reaction parameters like power input, monomer flow rate and substrate temperature influence the structure and the composition of plasma thin films [8, 9]. And it is now recognized that under low discharge power input conditions, a plasma-deposited polymer is created that retains more of the aromatic ring structures of the starting monomer and resembles a more conventional polymer [10-12].

有趣的等离子体聚合薄膜的光学性质，关键取决于

同时在地面的共轭链的构象和激发

国家和链间的方向。最近的一些报告显示，

链结构施加的性质和辐射特性的一个相当大的影响

激发态的共轭聚合物[7]。的可控性和可重复性

等离子体沉积薄膜表面成分是极为重要的实现

最高级的性能。此外，它是众所周知的几个血浆反应

参数，如输入功率，单体流速和衬底温度的影响

的结构和血浆薄膜的组成[8，9]。它是目前公认

低放电功率输入条件下，等离子体沉积聚合物

保留的芳香环结构开始单体和创建

类似于一个更传统的聚合物[10-12]。

To our knowledge no report has yet been appeared in the literature on the structural and optical behavior of poly(3-quinolinecarbonitrile). In the present work, the technique of plasma polymerization was used in the preparation of plasma- polymerized conjugated poly(3-quinolinecarbonitrile) thin film (see Table 1). The body of this paper will focus on preparation and analysis of structural and photoluminescence property of plasma-polymerized 3-quinolinecarbonitrile thin film.

据我们所知，没有报告尚未出现在文学上的结构

聚（3 quinolinecarbonitrile）光学行为。在目前的工作，

等离子体聚合技术被用于在等离子体制备

聚合共轭聚合物（3 quinolinecarbonitrile）的薄膜（见表1）。身体

本文将集中的制备和结构分析

3 quinolinecarbonitrile薄膜的光致发光性能等离子体聚合。

Tab. 1. Plasma polymerization conditions and film thickness.

标签。1。等离子体聚合条件和薄膜厚度。

Plasma discharge power pressure deposition film thickness

等离子体放电功率的压力沉积膜厚度

Results and discussion

The FT-IR spectrum of the PP3QCN thin film deposited at 10 W is illustrated in Fig. 1

as curve b. The absorption spectrum of monomer 3QCN is also shown as curve in Figure 1 for comparison. Clearly, there is a very strong absorption band at 2250 cm-1

for monomer 3QCN, which is ascribable to the C N stretching vibration.

结果与讨论

在10交存PP3QCN薄膜的红外光谱，W是图。1

曲线B. 3QCN单体的吸收光谱曲线也显示

图1进行比较。显然，在2250 cm - 1处有一个很强的吸收带

为单体3QCN，这是归咎于CN的伸缩振动。

However, this absorption band no longer existed for the plasma PP3QCN thin film. Instead, there appeared a broader and considerably stronger absorption band at 1663 cm-1 for the plasma PP3QCN film, attributed to the conjugated C=N stretching

vibration, which indicated that extensively conjugated C=N double bonds were

formed during the plasma polymerization of 3-quinolinecarbonitrile through the

opening of C N triple bonds. Moreover, it is also clear that the characteristic

absorption bands at 3020 and 3053 cm-1

for the aromatic C-H stretching vibration

have been preserved to a large extent in the PP3QCN thin film. This suggests that most of the aromatic ring structures of starting monomers are preserved for deposition carried out at the power of 10 W, which is also confirmed by the prominent characteristic absorption bands at 1604, 1555, 1501, and 1410 cm-1

of the aromatic

ring backbone stretching vibrations. It has been reported that [13] C-CN bonds are scarcely prone to electron attack, the high stability of C-CN bonds is in favor of

plasma polymerization of nitrile monomers without fragmentation. Yasuda [14] also

observed that the rate of the plasma polymerization for monomers with a C N triple

bond is greater than that for saturated monomers, which suggests that the C N triple

bonds in the monomers are very reactive in the plasma process and are much more

subject to cleavage than those without cyano groups. Thus, the FT-IR results reveal

that the plasma polymerization of 3-quinolinecarbonitrile has proceeded mainly via

the opening of -bond of the C N functional groups under the discharge power of 10

W. 但是，这种吸收带血浆PP3QCN薄膜不再存在。

相反，有一个更广泛和相当强的吸收带，出现在1663年cm - 1处

等离子体PP3QCN薄膜，由于共轭C = N伸缩

表示，广泛的共轭C = N双键的振动，

3- quinolinecarbonitrile通过等离子体聚合过程中形成

C N三键开幕。此外，它也很清楚，特点

在3020和3053 cm - 1处的吸收带

芳香C- H伸缩振动

已保存在很大程度上PP3QCN薄膜。这表明，

最开始单体芳香环结构保存

沉积进行了10瓦的功率，这也证实突出

特征吸收带在1604，1555，1501和1410 cm - 1处

芳香

环骨干的伸缩振动。据报道，[13]的C - CN债券

几乎容易发生电子攻击，C - CN债券的高稳定性是赞成

等离子体聚合丁腈单体无碎片。安田[14]

观察与CN三重单体等离子体聚合率

债券大于饱和单体，这表明了CN三重

在单体的债券都非常血浆过程中的反应和更

比那些没有氰基组裂解。因此，红外光谱结果表明

等离子体聚合的3 quinolinecarbonitrile进展，主要是通过

功能组别债券的CN下的放电功率10开幕

W。

The UV-vis absorption spectra of PP3QCN thin film and its monomer 3- quinolinecarbonitrile are shown in Fig. 2. It can be seen that the pure 3- quinolinecarbonitrile shows a maximum absorption band at about 235 nm, which can

be attributed to the - * transition of the aromatic 3-quinolinecarbonitrile ring.

紫外- 可见吸收光谱PP3QCN薄膜及其单体3 -

quinolinecarbonitrile见图。2。由此可以看出，纯3 -

quinolinecarbonitrile显示在约235 nm的最大吸收带，它可以

- 芳香的3 quinolinecarbonitrile环的过渡。

In comparison with the monomer absorption band, the maximum absorption

wavelength ( max) of PP3QCN thin film shows an obvious red shift, the maximum ofred shift of more than 20 nm (257 nm vs. 235 nm) is observed. Moreover, the width of

absorption band for PP3QCN thin film was also found to increase obviously as

compared with that of monomer. It is well known that increasing the length of the conjugated -system generally moves the absorption maximum to longer

wavelengths [15]. Appearance of a red shift and wider peak width indicate that a

larger conjugated -system has been formed in PP3QCN thin film during the plasma polymerization of 3-quinolinecarbonitrile. In other words, the plasma polymerization of

3-quinolinecarbonitrile took place mainly through the opening of the bonds of C N functional group at a plasma discharge power of 10 W, which agrees well with the

FT-IR results. 在与单体的吸收峰，最大吸收比较

波长（最大值）的PP3QCN薄膜显示了明显的红移，最大的超过20海里（257纳米与235纳米）观察ofred转变。此外，宽度

PP3QCN薄膜的吸收带也发现明显增加作为

与单体相比。这是众所周知的，增加的长度

共轭系统的一般动作最大吸收波长较长

波长[15]。红移的外观和更广泛的峰宽表明，

在血浆中，已经形成较大的共轭系统在PP3QCN薄膜

3，quinolinecarbonitrile聚合。换句话说，等离子聚合

3 quinolinecarbonitrile主要是通过开放的CN债券

在一个10瓦的等离子体放电的功率，同意与功能组

红外光谱的结果。

In order to get the detailed surface stoichiometry of plasma conjugated polynitrile thin

films, the high-resolution C1s spectra of PP3QCN film were evaluated and the corresponding results are shown in Fig. 3. 为了获得详细的表面化学计量的血浆共轭polynitrile薄

电影，高分辨率C1s的PP3QCN薄膜的光谱进行了评估和

相应结果显示在图中。3。The C 1s spectra were analyzed by fitting Gaussian peaks with a 20% Lorentzian

contribution. It has been reported that the full width at half maximum (FWHW) for plasma polymers is expected to be relatively large, about 2 eV due to their irregular molecular structure [16, 17]. Thus, the C 1s spectra for PP3QCN film were curve- fitted using 2 eV as the full width at half maximum (see Table 2). It should be noted

that some fitting peaks significantly overlap due to the small difference in the binding energies associated with these peaks. The C 1s spectra of PP3QCN film can be deconvoluted into five component peaks as indicated in Fig. 3. The binding energy

for aromatic C=N (285.97 eV) and C=C (285.47 eV) was assigned in accordance with

the results in the literature [18] and the peak positions for both aromatic components were fixed during the fit procedure. The other three chemically distinct C atoms are assigned as follows: the peak at 284.90 eV represents saturated hydrocarbon CH; the peak at 286.75 eV represents the C-O group; and the peak at 288.04 eV represents C=O. In addition, a broad high binding energy peak centered at 292.88

eV, which assigned to the - * shake-up satellite arising from the aromatic rings is observed for PP3QCN thin film, indicating that the PP3QCN film contains an extended -electron system. In other words, a higher retention of the aromatic ring structure in the PP3QCN film is obtained during the plasma polymerization of 3- quinolinecarbonitrile. The detailed surface composition of PP3QCN film is shown in

Table 2. The theoretical ratio of the group C=N to C=C in PP3QCN film is 1:2 if plasma polymerization occurred exclusively through the C N triple bond. For the

PP3QCN film deposited at 10 W, this ratio is 1:2.25. 20％的Lorentzian拟合高斯峰的C 1s 光谱进行了分析

贡献。据报道，在全宽半高（FWHW）

等离子聚合物预计将比较大，由于其不规则的约2 EV

分子结构[16，17]。因此，PP3QCN薄膜的C 1s光谱曲线

安装使用半高全宽2 EV（见表2）。应该指出

一些装修峰显著重叠由于在绑定的微小差别

这些山峰的能量。PP3QCN薄膜的C 1s谱

卷积到五个组件的峰图表示。3。结合能

芳香C= N（285.97 EV）和C = C（285.47 eV）的分配按照

在文献[18]的结果，并为芳香成分的峰位

在拟合过程中是固定的。其他三个化学性质不同的碳原子分配如下：在284.90 eV的峰代表饱和烃CH;

在286.75 eV的峰代表CO组;和288.04 eV的峰值

代表C = O。此外，广泛的高结合能峰中心在292.88

EV，其中分配给- 换血卫星所产生的芳香环

观察PP3QCN薄膜，表明PP3QCN电影包含

延长电子系统。换句话说，保留较高的芳香环

在PP3QCN影片的结构是获得等离子体聚合在3 -

quinolinecarbonitrile。PP3QCN电影详细的表面成分所示

表2。组的理论比C= N到C= C的PP3QCN电影是1:2，如果

等离子体聚合专门通过CN三键发生。对于

PP3QCN电影存放在10瓦，这个比例是1:2.25。

To check a possibility of as-grown PP3QCN film as optical device application, photoluminescence (PL) measurements were also carried out and the PL spectrum is shown in Fig. 4. It can be seen from the spectrum that the as-grown plasma PP3QCN thin film show a blue emission with a narrow peak at approximately 475 nm and there appeared a relatively high intensity of PL peak. Clarson et al. [19] reported the preparation and optical property of plasma-polymerized benzene and furan films and found that photoluminescence spectra of these films show a blue emission with a

broad peak at 460 nm for the plasma-polymerized benzene films and 445 nm for the plasma-polymerized furan films, which are different from our results with a narrow emission peak. This discrepancy is probably due to difference in structures of plasma polymer thin films studied. Generally speaking, the optical property of organic materials was influenced by the nature of the lowest electronic excited states. Due to

the strong electron–phonon coupling, the optical property of highly conjugated plasma polymer thin films was influenced by both the ground and excited state equilibrium conformation of the resulting molecules. It has been reported [20] that the emission with a narrow transition and a high PL intensity mainly arises from the crystalline parts. In this research, therefore, the narrow blue emission with a high intensity of PL peak might mainly originate from the crystalline structures formed in conjugated PP3QCN film during plasma polymerization. Indeed, it was found by Boo

[21] through study on the optical behaviors of plasma-polymerized thiophene that there was an existence of some crystalline structures in plasma-polymerized

thiophene films. Furthermore, Since the PP3QCN films were found to show a blue emission, it can be assumed that if these plasma polynitrile films show efficient EL spectra, then they will also be in blue region as that of PL spectra. The EL spectra of

the ITO/PP3QCN/Al devices with different PP3QCN layer thickness are illustrated in Fig. 5 as curves a, b, c, d and e. It is clear that all the EL spectra shapes are similar

to each other and they show a blue emission as its PL spectra. Furthermore, the full width at half maximum (FWHM) for all the EL spectra as a whole is about 95 nm. 要检查作为土生土长的PP3QCN电影光学器件中的应用的可能性，

光致发光（PL）也进行了测量和PL谱

如图。4。从频谱可以看出，作为土生土长的等离子PP3QCN

薄膜在约475 nm的蓝光发射一个窄峰有

出现了一个相对高强度的PL峰。Clarson等人。[19]报道了

等离子体聚合苯和呋喃薄膜的制备及光学性质和

发现这些薄膜的光致发光光谱显示具有蓝色发光

等离子体聚合苯薄膜和445纳米的宽峰在460 nm处

等离子体聚合呋喃电影，这是从我们的结果与窄不同

发射峰。这种差异可能是由于在血浆中的结构差异

聚合物薄膜的研究。一般来说，有机光学特性

材料是最低的电子激发态的性质的影响。由于

强的电子- 声子耦合，高度共轭光学性质

等离子体聚合物薄膜是由地面和激发态的影响

所产生的分子的平衡构象。据报道[20]，

一个狭窄的过渡和高发光强度的排放主要来自

结晶部分。因此，在这项研究中，狭窄的蓝色发光高

PL峰的强度可能主要来自形成的晶体结构

在等离子体聚合共轭PP3QCN电影。事实上，这是由驸

[21]通过对等离子体聚合噻吩在等离子体聚合的存在，有一些晶体结构的光学行为的研究

噻吩薄膜。此外，由于PP3QCN薄膜显示蓝色

排放量，我们可以假设，如果这些血浆polynitrile薄膜高效的EL

光谱，那么他们也将在蓝色区域的PL谱。EL光谱

不同PP3QCN层的厚度ITO/PP3QCN/Al设备说明

图作为曲线，B，C，D和E.很显然，所有的EL光谱形状类似

彼此和他们显示了其PL谱的蓝色发光。此外，完整的

作为一个整体的EL光谱半高（FWHM），宽度为95纳米左右。

The EL spectra of the ITO/PP3QCN/Al devices fabricated with different

PP3QCN layer thicknesses: (a) 305.2 nm; (b) 183.8 nm; (c) 108.2 nm; (d) 425.1 nm;

and (e) 505 nm. EL光谱与不同制造ITO/PP3QCN/Al设备

PP3QCN层厚度：（一）305.2 nm的;（二）183.8纳米（C）108.2纳米（D）425.1 nm处; 及（e）505 nm处。Sun et al. [22] reported the preparation and EL property of plasma-polymerized

naphthalene (PPN) and found that the FWHM of PPN EL device is 100 nm, which is

similar to our results. Seoul et al. [23] also investigated the EL property of polymer

light-emitting devices based on plasma-polymerized naphthalene, and the FWHM of

EL spectrum of PPN device was found to be 180 nm, they believe that the difference

in FWHM comes from the structural differences, resulting from the plasma polymerization apparatus and conditions. Sun等。[22]报道等离子体聚合制备和EL属性萘（PPN）和PPN的电致发光器件的半高宽为100纳米，这是我们的研究结果相似。汉城等。[23]还考察了聚合物EL属性

发光器件基于等离子体聚合萘，和半高宽

EL PPN的设备频谱被认为是180纳米，他们认为差异

在半高宽的结构性差异，从血浆

聚合设备和条件。Conclusions

To develop a new –conjugated polymer thin film for optoelectronic applications, the plasma-polymerized 3-quinolinecarbonitrile thin film was prepared by plasma polymerization technique. FT-IR, UV-Vis, and XPS studies revealed that a higher

retention of the aromatic ring structure in the deposited plasma films is obtained and

the plasma polymerization of 3-quinolinecarbonitrile took place mainly through the opening of the bonds of C N functional group under our experimental conditions. Moreover, the as-grown conjugated polynitrile thin film shows a blue emission with a relatively high PL intensity at about 475 nm wavelength. The conjugated polynitrile thin film obtained from 3-quinolinecarbonitrile precursor might be a promising material

for application in LED and photodiode device.

结论

为了发展光电应用的一个新的共轭聚合物薄膜，

等离子体聚合的3 quinolinecarbonitrile薄膜制备等离子体

聚合技术。FT - IR，UV - VIS，XPS研究表明，较高的

获得和保留芳香环结构中存放的血浆电影

主要是通过等离子体聚合的3 quinolinecarbonitrile

我们的实验条件下开放CN的功能组债券。

此外，作为生长的共轭polynitrile薄膜显示了一个蓝色发光

在约475 nm波长的发光强度相对较高。共轭polynitrile

从3 quinolinecarbonitrile易制毒化学获得的薄膜可能是一个有前途的材料

在LED和光电二极管器件的应用程序。

Experimental Part

The substrates used were heavily doped, p-type, (100) silicon wafers, quartz glass

and freshly pressed FTIR-grade potassium bromide (KBr). The argon used in the

plasma system was high-purified grade. The monomer, 3-quinolinecarbonitrile

(>98%) was purchased from Aldrich Chemical Company and was used without any

further purification. The nitrogen and argon used in the plasma system was high-

purified grade.实验部分

使用的基板是重掺杂，p型（100）硅片，石英玻璃

鲜榨红外光谱级溴化钾（KBr压片）。在氩

等离子系统是高纯化级。单体，3 quinolinecarbonitrile

（> 98％）购自Aldrich公司，并没有任何

进一步净化。氮气和氩气等离子系统中使用了高

纯化的档次。Plasma polymerization of 3-quinolinecarbonitrile was carried out using a radiofrequency (13.56MHz) capacitive coupled glow discharge system. A cylinder- shaped stainless steel plasma polymerization reactor was fitted with parallel plate electrodes. The substrates were centered on the bottom electrode, after evacuation

and purging with high purity nitrogen three times, the RF system was adjusted to powers selected and a glow discharge was allowed to occur for fixed times. The flow

rate of the precursor is 30 sccm. The pressure of the reaction chamber was maintained at about 0.06 mbar during the glow discharge. After the plasma was extinguished, the high purity nitrogen was induced to the chamber until the pressure

of reactor became more than 2.67 mbar, after which the reactor was brought to atmospheric pressure with air. The plasma thin films deposited directly onto quartz substrate were used for the characterization of UV-Vis, PL, XPS and the measurements of film thickness, while the plasma thin films deposited onto

potassium bromide (KBr) pellet was used only for FT-IR analysis. 使用进行了等离子体聚合的3- quinolinecarbonitrile

射频（13.56MHz频率）电容耦合辉光放电系统。一个圆筒

形不锈钢等离子体聚合釜装有平行板

电极。集中于底部电极的基板，后疏散

高纯度氮气三次清洗，射频系统的调整

选择的权力，并产生辉光放电，允许出现固定的时间。流

易制毒化学率是30 SCCM。反应室的压力

辉光放电过程中保持在约0.06毫巴。后血浆

熄灭，诱导高纯度氮气室，直到压力

反应堆成为超过2.67毫巴，之后，反应堆被带到

大气压力的空气。等离子薄膜直接存入到石英

用于基板的UV - Vis，PL和XPS表征

薄膜厚度的测量，而等离子体薄膜沉积到

溴化钾（KBr压片）颗粒仅用于FT - IR分析。The FT-IR spectra were measured on a Perkin-Elmer System 2000 FT-IR

spectrometer. The UV-Vis absorption spectra were recorded using a UV-Vis recording spectrophotometer (Shimadzu, Model UV-2501PC). The film thickness was measured using a surface profiler (Alpha-Step 500). An X-ray photoelectron spectrometer (Kratos, Axis ULTRA) was used for XPS measurements with an Al K

X-ray source. The film thickness was measured using a surface profiler (Alpha-Step 500). Fluorescence measurements were conducted on a Shimadzu RF5000 spectrofluorophotometer. 在Perkin - Elmer系统2000年的FT - IR，FT - IR光谱测定

光谱仪。使用紫外可见紫外吸收光谱记录

录音分光光度计（日本岛津，型号UV- 2501PC）。薄膜厚度

使用一个表面轮廓仪（α-500）测量。一个X-射线光电子

XPS的测量光谱仪（奎托斯，轴超）是用于与铝K

X射线源。使用表面轮廓测量薄膜厚度（α-步骤

500）。岛津RF5000荧光测量进行

分光光度计。Acknowledgements

The project was sponsored by Natural Science Foundation of Hebei Province

(B2007000613). The Project was also sponsored by Department of Education of Hebei Province, and the Scientific Research Key Foundation for Returned Overseas Chinese Scholars, Ministry of Personnel of the People’s Republic of China.

致谢

该项目是由河北省自然科学基金赞助

（B2007000613）。该项目还赞助了由教育厅

河北省和科研的重要基础归国华侨

中国的学者，中国人民共和国人事部部。

References

[1] Granstorm, M.; Berggren, M.; Inganas, O. Science 1995, 267, 1479.

[2] Brown, A. R.; Pomp, A.; Hart, C. M.; de Leeuw, D. M. Science 1995, 270, 972.

[3] Dyreklev, P.; Berggren, M.; Inganas, O.; Andersson, M. R.; Wennerstorm, O.; Hjertberg, T. Advanced Materials 1995, 1, 43.

[4] Theander, M.; Anderson, M. R.; Inganas, O. Synthetic Metals 1999, 101, 331.

[5] Shi, F. F. Surface and Coating Technology 1996, 82, 1.

[6] Biederman, H.; Slavinska, D. Surface and Coating Technology 2000, 125, 371.

[7] Langeveld-Voss, B. M. W.; Janssen, R. A. J.; Meijer, E. W. Journal of Molecular

Structure 2000, 521, 285.

[8] Kim, H. Y.; Yasuda, H. K. Journal of Vacuum Science and Technology 1997, A15,

1837.

[9] d’Agostino, R. Plasma Deposition, Treatment and Etching of Polymers, Academic

Press, Boston, 1990.

[10] Yang, G. H.; Zhang, Y.; Kang, E. T.; Neoh, K. G.; Huan, A. C. H.; Lai, D. M. Y.

Jounal of Materials Chemistry 2002, 12, 426.参考文献

[1] Granstorm;贝格格伦，M.; Inganas，O.科学1995年，267，1479。

[2]布朗，分析纯;排场，A.;哈特，CM;莱乌马克科学1995年，270，972。

[3] Dyreklev，体育;贝格格伦，M.; Inganas，澳，安德森，MR; Wennerstorm，澳;

Hjertberg，T.高级材料，1995年，1，43。

[4] Theander，M.;安德森，议员; Inganas，澳合成金属1999年，101，331。

[5]施，FF表面和涂层技术1996，82，1。

[6]毕得曼，H.; Slavinska，D.表面和涂层技术2000，125，371。

[7] Langeveld沃斯，宝马，扬森，拉吉;梅哲，EW杂志分子

结构2000年，521，285。

[8]金，HY;安田，港元报“，”真空科学与技术1997年，A15

1837。

[9]达戈斯蒂诺，R.等离子沉积，治疗和聚合物蚀刻，学术

出版社，波士顿，1990。

[10]杨，生长激素;张英才;东部康，梁定邦，幼稚园，ACH还赖，DMY

材料化学2002，12，426 Jounal。

[11] Han, L. M.; Timmons, R. B.; Lee, W. W.; Chen, Y.; Hu, Z. Journal of Applied

Physics 1998, 84, 439.

[12] Han, L. M.; Timmons, R. B.; Lee, W. W. Journal of Vacuum Science and

Technology B 2000, 18, 799.

[13] Budzikiewicz, H.; Djerassi, C.; Williams, H. Mass Spectrometry of Organic Compounds, Holden Day, San Francisco, 1967.

[14] Yasuda, H. Jounal of Polymer Science, Macromol Rev 1981, 16: 199.

[15] Lambert, J. H.; Lightner, D. A.; Shurvell, H. F.; Cooks, R. G. Introduction to

Organic Spectroscopy, Macmillan Publishing, New York, 1987.

[16] Sandrin, L.; Silverstein, M. S.; Sacher, E. Polymer 2001, 42, 3761.

[17] Silverstein, M. S.; Visoly-Fisher, I. Polymer 2002, 43, 11.

[18] Beamson, G.; Briggs, D. High Resolution XPS of Organic Polymers, Wiley, New

York, 1992.

[19] Jobanputra, M. C.; Durstock, M. F.; Clarson, S. J. Journal of Applied Polymer

Science 2003, 87, 523.

[20] Botta, C.; Bosisio, R.; Bongiovanni, G.; Mura, A.; Tubino, R. Synthetic Metals

1997, 84, 535.[11]汉，LM;蒂蒙斯，RB;李，WW;陈英才;胡祯应用杂志

物理1998年，84，439。

[12]汉，LM;蒂蒙斯，RB;李WW真空科学杂志

2000年技术B，18，799。

[13] Budzikiewicz，H.; Djerassi，C.;威廉姆斯，H.有机质谱。

化合物，霍顿日，旧金山，1967年。

[14]安田，H.力学与Macromol冯高分子科学，1981年，16：199。

[15]兰伯特，JH;莱特纳，达; Shurvell，高频;厨师，RG介绍

有机光谱，1987年，纽约，麦克米伦出版。

[16] Sandrin研究;西尔弗斯坦，MS;扎赫尔，E.聚合物2001年，42岁，3761。

[17]西尔弗斯坦，硕士; Visoly - 费希尔，2002年一，聚合物，43，11。

[18] Beamson，G.;布里格斯，D.有机聚合物的高分辨率XPS，威利，新。

纽约，1992年。

[19] Jobanputra，管委会; Durstock，MF; Clarson，SJ高分子学报。

科学2003，87，523。

[20]波塔; Bosisio，R.;波吉瓦尼，G.;村，A.; Tubino，R.合成金属

1997年，84，535。[21] Kim, M. C.; Cho, S.H.; Han, J. G.; Hong, B. Y.; Kim, Y. J.; Yang, S.

H.; Boo, J.-H.

Surface and Coatings Technology 2003, 169 –170, 595.

[22] Sun, R.; Peng, J.; Kobayashi, T.; Ma, Y.; Zhang, H. F.; Liu, S. Y. Japanese

Journal of Applied Physics 1996, 35, L1506.

[23] Seoul, C.; Song, W. J. Journal of Materials Science: Materials in electronics 2001, 12, 51.[21]金，管委会;赵，上海，韩，JG，香港，;金，YJ;阳，上海，驸，J.-H.

表面涂料技术2003，595，169-170。

[22孙，彭，研究;小林，T.;马英才;张，高频，刘，SY日本

应用物理系1996年，35岁，L1506。

[23]首尔，宋，WJ材料科学杂志：电子材料

2001年，12，51。