Effects of space charge distribution on ferroelectric hysteresis loops

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AlGaN

AlGaN

第52卷第6期2023年6月人㊀工㊀晶㊀体㊀学㊀报JOURNAL OF SYNTHETIC CRYSTALSVol.52㊀No.6June,2023AlGaN/GaN纳米异质结构中的二维电子气密度研究杨㊀帆1,许并社1,2,3,董海亮1,2,张爱琴1,梁㊀建1,贾志刚1,2(1.太原理工大学新材料界面科学与工程教育部重点实验室,太原㊀030024;2.山西浙大新材料与化工研究院,太原㊀030000;3.陕西科技大学材料原子㊃分子科学研究所,西安㊀710021)摘要:本文设计了纳米线核壳AlGaN/GaN异质结构,研究了势垒层厚度㊁Al组分㊁掺杂浓度对平面和纳米线异质结构中二维电子气(2DEG)浓度的影响规律㊂结果表明,随着势垒层厚度的逐渐增大,两种结构中2DEG浓度增速逐渐减缓,当达到40nm后,由于表面态电子完全发射,2DEG浓度逐渐稳定不变㊂随着Al组分的增加,极化效应逐渐增强,使得两种结构在异质界面处的2DEG浓度都逐渐增加㊂当掺杂浓度逐渐提高时,两者在异质界面处电势差增大,势阱加深,束缚电子能力加强,最终导致2DEG浓度逐渐增加,当掺杂浓度增加到2.0ˑ1018cm-3后,2DEG面密度达到最大值㊂与平面结构相比,纳米线结构可以实现更高的Al组分,在高Al组分之下,2DEG面密度最高可达5.13ˑ1013cm-2,相比于平面结构有较大的提高㊂关键词:AlGaN/GaN;纳米线结构;平面结构;二维电子气浓度;异质结构;能带结构中图分类号:O471;O472㊀㊀文献标志码:A㊀㊀文章编号:1000-985X(2023)06-1136-09Two-Dimensional Electron Gas Density Studies inAlGaN/GaN NanoheterostructuresYANG Fan1,XU Bingshe1,2,3,DONG Hailiang1,2,ZHANG Aiqin1,LIANG Jian1,JIA Zhigang1,2(1.Key Laboratory of Interface Science and Engineering in Advanced Materials Ministry of Education,Taiyuan University of Technology,Taiyuan030024,China;2.Institute of Advanced Materials and Chemical Engineering,Shanxi-Zheda,Taiyuan030000,China;3.Institute of Atomic and Molecular Science,Shaanxi University of Science and Technology,Xi an710021,China)Abstract:In this paper,nanowire core-shell AlGaN/GaN heterostructures were designed and the effects of potential barrier layer thickness,Al component,and doping concentration on the concentration of two-dimensional electron gas(2DEG)in the planar as well as nanowire heterostructures were studied.The results show that,the rise rate of2DEG concentration in both structures slow down as the thickness of potential barrier layer increases,and when the thickness reaches40nm,the2DEG concentration gradually stabilizes due to the complete emission of surface state electrons.With the increase of Al component, the polarization effect is gradually enhanced,which makes the2DEG concentration at the heterogeneous interface of both structures gradually increase.When the doping concentration gradually increases,it can be found that potential difference at the heterogeneous interface increases,the potential well deepening and the ability strengthening for bound electron,which finally lead to the gradual increase of2DEG concentration.The2DEG surface density reaches its maximum value as the doping concentration increases to2.0ˑpared with the planar structure,the nanowire structure can achieve a higher Al component,and the2DEG surface density can reach up to5.13ˑ1013cm-2under the high Al component,which is a large improvement.Key words:AlGaN/GaN;nanowire structure;planar structure;two-dimensional electron gas concentration;heterostructure; band structure㊀㊀收稿日期:2023-01-09㊀㊀基金项目:国家自然科学基金(21972103,61904120,61604104,51672185);山西浙大新材料与化工研究院研发项目(2021SX-AT001, 2021SX-AT002)㊀㊀作者简介:杨㊀帆(1998 ),男,山西省人,硕士研究生㊂E-mail:1532079918@㊀㊀通信作者:贾志刚,博士,讲师㊂E-mail:jiazhigang@㊀第6期杨㊀帆等:AlGaN /GaN 纳米异质结构中的二维电子气密度研究1137㊀0㊀引㊀㊀言GaN 及其三元合金AlGaN 具有禁带宽度大㊁电子漂移速度高㊁击穿电压高㊁热导率高㊁化学性质稳定㊁抗辐照等特点,是制作高电子迁移率晶体管(high electron mobility transistor,HEMT)的理想材料[1-4]㊂纤锌矿结构的AlGaN /GaN 异质结HEMT 存在很强的极化效应(包括压电极化与自发极化效应)[5],极化电场在异质结界面处产生大量的极化电荷,使得AlGaN /GaN HEMT 无须掺杂就具有高浓度的二维电子气(two-dimensional electron gas,2DEG)㊂HEMT 的独特性能是其在异质界面上产生2DEG 的结果,传统HEMT 的制备工艺流程包括缓冲层㊁交替层㊁有源沟道㊁空间层和施主层的生长[6]㊂随着HEMT 体积的逐渐减小,随之出现的各种效应会使其性能变得很不稳定,如温度稳定性差㊁短沟道效应等[7-8]㊂为了解决这些问题,研究人员提出了纳米线沟道HEMT [9-12]㊂然而,刻蚀的纳米线沟道HEMT 会受到声子散射和库仑散射两种散射机制的影响,导致不同的栅极偏置电压㊂为了克服这一问题,本文主要设计了纳米线核壳AlGaN /GaN 异质结构,其可通过外延生长技术来制备,能够避免刻蚀的纳米线在制备过程中产生的位错㊁粗糙等缺陷,可以有效减弱散射效应,提高2DEG 迁移率㊂本文在理论分析的基础上,设计了如图1所示的平面和纳米线异质结构㊂运用nextnano 数值模拟软件分别对平面异质结构和纳米线异质结构中2DEG 浓度进行数值计算,重点对AlGaN /GaN 纳米线异质结构中2DEG 性质进行分析㊂主要包括以下方面:首先分别讨论平面和纳米线AlGaN /GaN 异质结构中势垒层厚度㊁Al 组分㊁势垒层掺杂浓度等参数对2DEG 浓度的影响,然后对平面和纳米线结构中2DEG 浓度进行理论分析,最后进行总结㊂图1㊀异质结构示意图Fig.1㊀Schematic diagram of the heterogeneous structure 1㊀二维电子气浓度仿真计算AlGaN /GaN 异质结构中2DEG 浓度是决定HEMT 器件性能的重要指标㊂异质结构中大的导带偏移和强的极化电场会产生一个窄而深的异质结势阱[13],势阱的形状会直接影响2DEG 的浓度,其对异质结构中势垒层厚度㊁Al 组分㊁掺杂浓度等因素有着较强的依赖关系㊂本节首先对异质界面处电势和电荷的变化进行理论分析,然后对能带结构和2DEG 浓度随各个参数的变化结果进行仿真模拟,之后进一步对能带结构和2DEG 随各参数的变化趋势进行分析与总结㊂1.1㊀AlGaN 势垒层厚度对AlGaN /GaN 异质结构中二维电子气浓度的影响当n 型(窄带隙一侧)和N 型(宽带隙一侧)掺杂的两个晶体接触时,电荷会再分布并产生空间电荷区,为了形成统一的费米能级,电子将从N 区溢出到n 区㊂电荷分布如图2(a)所示,其表达式如式(1)所示㊂ρ(x )=-q (n (x )-N d ),x <0qN D ,0<x <x N {(1)式中:N D ㊁N d 分别为N㊁n 侧的掺杂浓度(本方案中N d 为零);n (x )为接触后空间电荷区的电子气浓度分布函数;x N 为N 侧电荷区的宽度;q 为基本电荷;ρ(x )为空间电荷区中x 处的电荷密度㊂根据高斯定律,Δ㊃(εE )=ρ(其中ε为介电常数,E 为电场强度,Δ为梯度算子,ρ为电荷密度)可知,1138㊀研究论文人工晶体学报㊀㊀㊀㊀㊀㊀第52卷当远离结即n (x )趋近于N d 时,电场分布如图2(b)所示,其表达式如式(2)所示㊂E (x )=-qʏx -ɕ[n (x ∗)]d x ∗/εn ,x <0qN D (x -x N )/εN ,0<x <x N {(2)式中:εN ㊁εn 分别N㊁n 区的介电常数;E (x )为空间电荷区中x 处的电场强度㊂由x =0处电位移矢量的法向分量连续的边界条件,可得电中性条件为[14]:n s =N D x N (3)式中:n s 为2DEG 在n 侧的面密度㊂电荷区的静电势分布ϕ(x )和电场由E (x )=-d ϕ(x )/d(x )相联系,即静电势分布的斜率与电场分布异号,其表达式为:d ϕ(x )d(x )=-E (x )=qʏx -ɕ[n (x ∗)]d x ∗/εn ,x <0qN D (x N -x )/εN ,0<x <x N {(4)图2㊀空间电荷区中的电荷分布和电场分布Fig.2㊀Charge distribution and electric field distribution in the space charge region AlGaN 势垒层的厚度是影响2DEG 浓度的一个重要因素㊂图3和图4给出了平面和纳米线结构随着势垒层厚度增加时的导带图以及2DEG 面密度拟合曲线图㊂图3㊀异质界面处导带随势垒层厚度的变化关系图(其中d 表示AlGaN 势垒层厚度)Fig.3㊀Variation of the conduction band at heterogeneous interface with the thickness of the potential barrier layer (where d denotes the thickness of the AlGaN barrier layer)随着AlGaN 势垒层厚度的增加,传统平面结构和纳米线结构中能够给2DEG 势阱里提供电子的能力增强,从而会使n s 与n (x ∗)增大,由式(3)㊁(4)可知,d ϕ(x )/d(x )逐渐增加,又因为ϕ(x )为增函数,ϕ(x )始终增大的同时增速随着AlGaN 厚度的增加而加快㊂因此,随着势垒层厚度的增加,处于n 与N 两侧同等位置的两点,电势差逐渐增大,从而使传统平面结构和纳米线结构异质界面处势阱深度加大,其束缚电子的能力加强,2DEG 浓度逐渐上升㊂如图3㊁4所示,当其厚度增加到40nm 之后,两者的势阱深度不再发生明显㊀第6期杨㊀帆等:AlGaN /GaN 纳米异质结构中的二维电子气密度研究1139㊀变化,电子浓度增加甚微,此时,平面结构中2DEG 面密度可达1.01ˑ1013cm -2,而在纳米线结构中,2DEG 面密度达到了9.4ˑ1012cm -2,因此,初步估计能够给2DEG 势阱里提供电子的有效势垒厚度为40nm,根据2DEG 来源于表面态的理论[15-16],这可能是由于表面态电子完全发射,2DEG 浓度趋于饱和,其他文献与实验中也证实了这一点[17-18]㊂虽说两者变化趋势相近,但在同一势垒层厚度下,纳米线结构的2DEG 面密度会略低于平面结构㊂1.2㊀Al 组分对AlGaN /GaN 异质结构中二维电子气浓度的影响AlGaN /GaN 异质结构中,决定2DEG 浓度大小的最主要因素是Al 组分㊂未掺杂的AlGaN /GaN 异质结构中2DEG 的形成主要是因为AlGaN 和GaN 中的自发极化效应和压电极化效应,而Al 组分又强烈调制AlGaN 层中的自发极化和压电极化强度,因此对其中载流子浓度和分布具有强烈影响㊂如图5所示为纤锌矿结构的Ga 面AlGaN /GaN 异质结的自发极化和压电极化图解[6],对于纤锌矿结构的GaN 晶体,在没有外应力的情况下,正负电荷中心不重合导致沿极轴方向出现的极化效应叫作自发极化效应[19];AlGaN 材料晶格常数介于AlN 与GaN 之间,当在GaN 衬底上生长AlGaN 时,AlGaN 材料横向将会受到张应力的作用,AlGaN 材料纵向将会受到压缩,使得材料本身不重合的正电中心与负电中心的距离进一步增加,产生了压电极化效应㊂图4㊀2DEG 面密度随AlGaN 势垒层厚度的变化关系图Fig.4㊀Variation of 2DEG surface density with AlGaN potential barrier layerthickness 图5㊀纤锌矿结构Ga 面AlGaN /GaN 异质结的自发极化和压电极化图解Fig.5㊀Illustration of spontaneous polarisation and piezoelectric polarisation of Ga-face AlGaN /GaN heterojunction with wurtzite structure Ga 面的AlGaN /GaN HEMT 器件在异质界面处感生极化电荷,其面密度σ可以表示为:σ=P (top)-P (bottom)=P SP (top)+P PE (top)-P SP (bottom)=P SP (AlGaN)+P PE (AlGaN)-P SP (GaN)(5)式中:P (top)㊁P (bottom)分别为异质界面处上层和下层的极化强度[20];P SP (top)㊁P SP (bottom)分别为异质界面处上层和下层的自发极化强度;P PE (top)为异质界面处上层的压电极化强度;P SP (AlGaN)㊁P SP (GaN)分别为异质界面处AlGaN 层和GaN 层的自发极化强度;P PE (AlGaN)为异质界面处AlGaN 层的压电极化强度㊂其中自发极化强度为[19]:P SP (y )=-(0.052y +0.029)(6)式中:y 为Al 组分含量㊂压电极化强度为[21]:P PE =e 33εz +e 31(εx +εy )(7)式中:e 31㊁e 33为压电系数张量;εz =(c -c 0)/c 0是沿c 轴的应变;εx =εy =(a -a 0)/a 0为x-y 平面内的应变;c ㊁a 和c 0㊁a 0分别是产生应变后的晶格常数和本征晶格常数,两者的关系为[21]:c -c 0c 0=-2C 13C 33a -a 0a 0(8)式中:C 13和C 33是弹性常数,根据以上公式,考虑弛豫度的影响,沿c 轴方向的压电极化大小可表示为[5]:1140㊀研究论文人工晶体学报㊀㊀㊀㊀㊀㊀第52卷P PE =2(1-R )a -a 0a 0e 31-e 33C 13C 33()(9)式中:R 为应变层的弛豫度,各项参数的数值如表1所示㊂当晶格全应变时R =0,完全弛豫时R =1,不存在压电极化㊂对于AlGaN /GaN 异质界面处,AlGaN 薄膜处于张应变状态,即a >a 0,而对于任意Al 组分,都满足(e 31-e 33C 13C 33)<0㊂因此,P PE 为负值,其方向与自发极化方向相同㊂表1㊀纤锌矿结构GaN 、AlN 各项参数Table 1㊀Parameters of GaN and AlN with wurtzite structureParameter GaN AlN Reference a 0/nm 0.31890.3112[22]c 0/nm 0.51850.4982[22]P SP /(C㊃m -2)-0.029-0.081[23]e 33/(C㊃m -2)0.73 1.46[23]e 31/(C㊃m -2)-0.49-0.60[23]C 13/GPa 100127[24]C 33/GPa392382[24]图6和图7分别是室温下平面和纳米线结构的导带图和2DEG 浓度图㊂其中,AlGaN 势垒层的厚度为40nm,Al 组分为0.24㊂在平面结构中,Al 组分的范围一般取0.15~0.40,因为当Al 组分继续增大时,虽然2DEG 浓度有所上升,但其会导致AlGaN 和GaN 之间晶格失配度增大,会使势垒层中缺陷和位错增大,从而导致其界面粗糙度增加,2DEG 迁移率大幅下降,器件性能降低;当Al 组分低于0.15时,AlGaN 和GaN 异质界面处的导带偏移量较小,其对2DEG 限制作用较弱,会导致电子泄漏到AlGaN 和GaN 层,最终使得2DEG 浓度降低㊂而纳米线结构比平面结构多一个维度释放应力[25],能够容忍更高的应变而不产生位错㊂因此,可以将Al 组分的选择范围扩展到0.15~0.75㊂高Al 组分的纳米线结构会产生更高的2DEG 浓度,从而能够使器件性能得到进一步的提升㊂图6㊀异质界面处导带随Al 组分的变化关系图Fig.6㊀Variation of conduction band at heterogeneous interface with Al component 可以看出,随着Al 组分的增加,P SP (AlGaN)及式(9)中的晶格常数a 随之增大,从而导致极化电荷σ逐渐加强,电场增大,电势差加大,使得平面结构与纳米线结构中的势阱深度随着Al 组分的增大而加深㊂在平面结构中,势阱深度逐渐加深,束缚的电子数增加,从而使最终形成的2DEG 浓度增加,当Al 组分达到0.40时,其2DEG 面密度可达到2.45ˑ1013cm -2;在纳米线结构中,铝组分的增加不仅使势阱深度加深,而且在高铝组分下,势垒层中的自发和压电极化效应增强,导致界面处正极化电荷密度增大,势垒高度增加,使得2DEG 浓度快速提高,当Al 组分达到0.75时,其2DEG 面密度最高可达到5.13ˑ1013cm -2㊂但在同一铝组分下,纳米线结构的2DEG 浓度略低于传统平面结构㊂㊀第6期杨㊀帆等:AlGaN /GaN 纳米异质结构中的二维电子气密度研究1141㊀图7㊀2DEG 面密度随Al 组分的变化关系图Fig.7㊀Plot of 2DEG surface density with Al component 1.3㊀掺杂浓度对AlGaN /GaN 异质结构中二维电子气浓度的影响势垒层掺硅会提供电子,因此掺杂浓度对提高2DEG 浓度有重要作用,如图8㊁图9所示为计算所得平面和纳米线结构的导带和2DEG 面密度随势垒层掺杂浓度的变化关系图㊂图8㊀异质界面处导带随势垒层掺杂浓度的变化关系图(其中n 0表示掺杂浓度)Fig.8㊀Plot of the variation of the conduction band at heterogeneous interface with doping concentration of the potential barrier layer (where n 0indicates the dopingconcentration)图9㊀2DEG 面密度随势垒层掺杂浓度的变化关系图Fig.9㊀Plot of 2DEG surface density with doping concentration of the potential barrier layer 从图8和图9中可以看出,随着掺杂浓度的不断提高,式(4)中的n (x ∗)与n s 逐渐增加,从而导致电势差增强,使得平面和纳米线结构的异质结界面势阱深度都有所加深,导致2DEG 面密度不断提高㊂当掺杂浓度增加到2.0ˑ1018cm -3之后,两结构的势阱深度都保持不变,2DEG 面密度达到最大值㊂平面结构中,2DEG 面密度最大可达到1.07ˑ1013cm -2㊂在纳米线结构中,2DEG 面密度最高达到了1.05ˑ1013cm -2㊂但在同一个掺杂浓度下,纳米线结构的2DEG 面密度都低于平面结构,同时,掺杂浓度在2.0ˑ1017~8.0ˑ1017cm -3时,两者面密度差距较大,随着掺杂浓度的继续增加,平面结构的面密度先达到饱和,之后两者面密度差距逐渐减小,最终都达到饱和㊂1142㊀研究论文人工晶体学报㊀㊀㊀㊀㊀㊀第52卷2㊀二维电子气浓度理论分析如图10所示为AlGaN /GaN 异质结的能带分布图[26],根据对异质结的能带和电荷的半经典静电分析,构建出所需要的2DEG 面密度计算公式[19]:n s (y )=σ(y )e - 0 (y )d e 2[eϕb (y )+ΔE F (y )-ΔE C (y )](10)式中:n s (y )为2DEG 面密度;y 为Al 组分含量;σ(y )为AlGaN /GaN 界面的极化电荷;e 为基本电荷电量; 0为真空介电常数;d 为AlGaN 的势垒层厚度㊂图10㊀AlGaN /GaN 异质结的能带分布图Fig.10㊀Energy band distribution of AlGaN /GaN heterojunction AlGaN 的相对介电常数为: (y )=-0.5y +9.5(11)AlGaN 的肖特基势垒高度为:eϕb (y )=(1.3y +0.84)(eV)(12)AlGaN 的费米能级为[19]:ΔE F (y )=E 0(y )+πħ2m ∗(y )n s (y )(13)式中:ħ=h 2π,h 为普朗克常数;AlGaN 的电子有效质量m ∗(y )=(0.2+0.2y )m 0,m 0为静止电子质量,E 0(y )为:E 0(y )=9πħe 28 0㊀8m ∗(y )n s (y ) (y ){}2/3(14)AlGaN /GaN 界面导带带阶为:ΔE C (y )=0.7[E g (y )-E g (0)](15)其中AlGaN 的禁带宽度为:E g (y )=yE g (AlN)+(1-y )E g (GaN)-y (1-y )(16)式中:E g (AlN)㊁E g (GaN)分别是AlN㊁GaN 的禁带宽度㊂将式(13)㊁(14)代入式(10)中并整理可得: 0 (y )d e 29πħe 28 0 (y )㊀8m ∗(y )[]2/3n s (y )2/3+ 0 (y )d e 2πħ2m ∗(y )+1[]n s (y )=σ(y )e - 0 (y )d e 2[eϕb (y )-ΔE C (y )](17)由式(17)可知,在同一参数下,2DEG 浓度n s (y )与极化电荷σ(y )的变化趋势保持一致㊂在平面结构中,晶格为全应变即R =0,其压电极化大小根据式(9)可表示为:P PE =2a -a 0a 0e 31-e 33C 13C 33()(18)在纳米线结构中,晶格为部分弛豫,其压电极化大小参见式(9)㊂其中,0<R <1㊂两者在同一参数下的自发极化相同,因此,根据式(5)可知,平面结构的极化电荷σ(y )强于纳米线结构㊂由式(17)可得,同一参数下,平面结构的2DEG 浓度强于纳米线结构,此结论与2DEG 浓度仿真计算的结果保持一致㊂3㊀结㊀㊀论采用nextnano 软件对AlGaN /GaN 纳米线异质结构中2DEG 浓度进行研究,通过改变势垒层的不同参数,得到以下结论:1)随着势垒层厚度的增加,异质界面处势阱深度加大,其束缚电子的能力加强,2DEG 浓度逐渐上升㊂初步估计能够给2DEG 阱里提供电子的有效势垒厚度为40nm,此时,平面结构中2DEG 面密度可达1.01ˑ1013cm -2,而在纳米线结构中,2DEG 面密度为9.4ˑ1012cm -2㊂当势垒层厚度继续上升时,2DEG 浓度保持不变㊂2)Al 组分是影响2DEG 浓度最主要的因素,随着Al 组分的逐渐增加,形成的2DEG 面密度逐渐增大㊂㊀第6期杨㊀帆等:AlGaN/GaN纳米异质结构中的二维电子气密度研究1143㊀纳米线结构由于可以形成更高的Al组分,其2DEG面密度可达到5.13ˑ1013cm-2,相比于平面结构,有较大的提高㊂3)势垒层掺杂对提高电子气浓度有重要作用,随着掺杂浓度的不断增加,2DEG面密度不断提高,当掺杂浓度增加到2.0ˑ1018cm-3之后,势阱深度不再变化,2DEG面密度达到饱和以后不再增加,此时,平面结构中2DEG面密度可达1.07ˑ1013cm-2,而纳米线中2DEG面密度为1.05ˑ1013cm-2㊂4)分析了同等参数下,平面结构中2DEG浓度高于纳米线结构的主要原因㊂纳米线中存在部分弛豫现象,其压电极化效应弱于平面结构,从而导致其异质界面处极化电荷较少,最终造成2DEG浓度较低㊂参考文献[1]㊀KHAN M A,BHATTARAI A,KUZNIA J N,et al.High electron mobility transistor based on a GaN-Al x Ga1-x N heterojunction[J].AppliedPhysics Letters,1993,63(9):1214-1215.[2]㊀郝㊀跃,张金凤.AlGaN/GaN界面特性研究进展[J].微纳电子技术,2002,39(10):1-7.HAO Y,ZHANG J F.Progress of AlGaN/GaN interface characteristics research[J].Semiconductor Information,2002,39(10):1-7(in Chinese).[3]㊀MAJEWSKI J A,ZANDLER G,VOGL P.Heterostructure field effect transistors based on nitride interfaces[J].Journal of Physics:CondensedMatter,2002,14(13):3511-3522.[4]㊀张东国,李忠辉,彭大青,等.低温GaN插入层对AlGaN/GaN二维电子气特性的改善[J].人工晶体学报,2013,42(7):1406-1409.ZHANG D G,LI Z H,PENG D Q,et al.Improvement of low tmperature GaN interlayer on the property of the two-dimensional electron gas in AlGaN/GaN heterostructure[J].Journal of Synthetic Crystals,2013,42(7):1406-1409(in Chinese).[5]㊀孔月婵,郑有炓.Ⅲ族氮化物异质结构二维电子气研究进展[J].物理学进展,2006,26(2):127-145.KONG Y C,ZHENG Y D.Progress in two-dimensional electron gas in group-ⅲ-nitride heterostructures[J].Progress in Physics,2006,26(2): 127-145(in Chinese).[6]㊀LENKA T R,PANDA A K.Characteristics study of2DEG transport properties of AlGaN/GaN and AlGaAs/GaAs-based HEMT[J].Semiconductors,2011,45(5):650-656.[7]㊀KEYES R W.Fundamental limits of silicon technology[J].Proceedings of the IEEE,2001,89(3):227-239.[8]㊀CHAU R,DOYLE B,DATTA S,et al.Integrated nanoelectronics for the future[J].Nature Materials,2007,6(11):810-812.[9]㊀HE Y L,WANG C,MI M H,et al.Investigation of enhancement-mode AlGaN/GaN nanowire channel high-electron-mobility transistor withoxygen-containing plasma treatment[J].Applied Physics Express,2017,10(5):056502.[10]㊀HE Y L,MI M H,WANG C,et al.Enhancement-mode AlGaN/GaN nanowire channel high electron mobility transistor with fluorine plasmatreatment by ICP[J].IEEE Electron Device Letters,2017,38(10):1421-1424.[11]㊀LU B,MATIOLI E,PALACIOS T.Tri-gate normally-off GaN power MISFET[J].IEEE Electron Device Letters,2012,33(3):360-362.[12]㊀SON D H,JO Y W,SINDHURI V,et al.Effects of sidewall MOS channel on performance of AlGaN/GaN FinFET[J].MicroelectronicEngineering,2015,147:155-158.[13]㊀薛舫时.AlGaN/GaN二维电子气的特性研究[J].半导体情报,2001,38(6):47-51.XUE F S.Two-dimensional electron gases induced in AlGaN/GaN heterostructures[J].Semiconductor Information,2001,38(6):47-51(in Chinese).[14]㊀庄顺连.光子器件物理[M].贾东方,王肇颖,桑㊀梅,等,译.2版.北京:电子工业出版社,2013:45-46.CHUANG S L.Photonic Device Physics[M].JIA D F,WANG Z Y,SANG M,et al.,Transl.2nd ed.Beijing:Electronic Industry Press, 2013:45-46(in Chinese).[15]㊀IBBETSON J P,FINI P T,NESS K D,et al.Polarization effects,surface states,and the source of electrons in AlGaN/GaN heterostructure fieldeffect transistors[J].Applied Physics Letters,2000,77(2):250-252.[16]㊀KOLEY G,SPENCER M G.Surface potential measurements on GaN and AlGaN/GaN heterostructures by scanning Kelvin probe microscopy[J].Journal of Applied Physics,2001,90(1):337-344.[17]㊀KOLEY G,SPENCER M G.On the origin of the two-dimensional electron gas at the AlGaN∕GaN heterostructure interface[J].Applied PhysicsLetters,2005,86(4):042107.[18]㊀VETURY R,SMORCHKOVA I P,ELSASS C R,et al.Polarization induced2DEG in MBE grown AlGaN/GaN HFETs:on the origin,DC andRF characterization[J].MRS Online Proceedings Library,2000,622(1):251.[19]㊀王朝旭.AlGaN/GaN HEMT器件栅漏区域电学性能的研究[D].成都:电子科技大学,2019:23-25.WANG Z X.The study of the gate drain region of AlGaN/GaN HEMT devices on electrical performance[D].Chengdu:University of Electronic Science and Technology of China,2019:23-25(in Chinese).1144㊀研究论文人工晶体学报㊀㊀㊀㊀㊀㊀第52卷[20]㊀AMBACHER O,FOUTZ B,SMART J,et al.Two dimensional electron gases induced by spontaneous and piezoelectric polarization in undopedand doped AlGaN/GaN heterostructures[J].Journal of Applied Physics,1999,87(1):334-344.[21]㊀AMBACHER O.Growth and applications of group III-nitrides[J].Journal of Physics D:Applied Physics,1998,31(20):2653-2710.[22]㊀STRITE S,LIN M E,MORKOÇH.Progress and prospects for GaN and the III-V nitride semiconductors[J].Thin Solid Films,1993,231(1/2):197-210.[23]㊀BERNARDINI F,FIORENTINI V,VANDERBILT D.Spontaneous polarization and piezoelectric constants of III-V nitrides[J].Physical ReviewB,1997,56(16):R10024-R10027.[24]㊀KIM K,LAMBRECHT W R,SEGALL B.Elastic constants and related properties of tetrahedrally bonded BN,AlN,GaN,and InN[J].PhysicalReview B,Condensed Matter,1996,53(24):16310-16326.[25]㊀ERTEKIN E,GREANEY P A,CHRZAN D C,et al.Equilibrium limits of coherency in strained nanowire heterostructures[J].Journal ofApplied Physics,2005,97(11):114325.[26]㊀郝㊀跃,张金风,张进成.氮化物宽禁带半导体材料与电子器件[M].北京:科学出版社,2013:69.HAO Y,ZHANG J F,ZHANG J C.Nitride wide bandgap semiconductor materials and electronic devices[M].Beijing:Science Press,2013: 69(in Chinese).。

2009版货代英语unit2的翻译

2009版货代英语unit2的翻译

一、货运代理人的概述及其发展1、早期货运代理人履行的职责英文原文:Originally, a freight forwarder was a commission agent performing on behalf of the exporter/importer routine tasks such as loading/unloading of goods, storage of goods, arranging local transport, obtaining payment for his customer, and so on( 这句话是比较长,一句一段,核心句子:.....a freight forwarder was a commission agent performing on behalf of the exporter/importer routine tasks....)注释:freight forwarder 货运代理人commission agent 委托代理人perform: 履行,执行,完成on behalf of 代表.... routine tasks 日常工作(routine: 日常的,常规的)loading/unloading of goods 装载/卸载货物storage of goods 货物存放,货物存储转自环球网校中文意思:起初,货运代理是作为委托代理人,替进出口商履行一些常规业务,比如装载/卸载货物,货物的存储,安排地方运输,替客户收款等。

2、货运代理人的发展英文原文:However, the expansion of international trade and the development of different modes of transport over the years that followed enlarged the scope of his services.(核心句子:....A and B enlarged the scope of his services.A 是指:expansion of international trade 国际贸易的扩大B 是指:development of different modes of transport 不同运输方式的发展)注释:expansion: 扩大,扩展 development: 发展,改善 modes of transport: 运输方式over the years that followed 在随后的几年里 enlarge: 扩大,增大,扩展中文意思:但是,在随后的几年里,由于国际贸易的扩大和不同运输方式的发展也随之加大了货运代理的服务范围。

小学上册第13次英语第5单元期末试卷

小学上册第13次英语第5单元期末试卷

小学上册英语第5单元期末试卷英语试题一、综合题(本题有100小题,每小题1分,共100分.每小题不选、错误,均不给分)1.What is 20 4?A. 14B. 15C. 16D. 18C2._____ (phototropism) describes how plants grow towards light.3.What is the longest river in the world?A. AmazonB. NileC. MississippiD. YangtzeA4.The rock cycle can take millions of ______ to complete.5. A ____(data analysis) informs strategy and planning.6.What is the name of the famous explorer who discovered America?A. Marco PoloB. Christopher ColumbusC. Ferdinand MagellanD. Vasco da Gama7.What do we call the process of converting solid into liquid?A. FreezingB. MeltingC. EvaporatingD. CondensingB8.The __________ (历史的深刻) inspires thought.9.I have a dream of becoming a __________ when I grow up. I want to help people by __________. My role model is __________ because he/she is always __________. I believe that I can achieve my dreams if I work hard and stay positive.10. A rabbit is known for its long ______.11. A ______ is a measurement of how much space an object occupies.12.The ________ (人口) of our city is growing.13.The goose honks loudly in the _______ (湖).14.What is the smallest prime number?A. 0B. 1C. 2D. 3C15.This doll has a beautiful ______.16.The atomic number of an element indicates the number of _______ it has.17.The _____ (花卉) are beautiful and fragrant.18.What is the capital of Italy?A. VeniceB. RomeC. MilanD. NaplesB19.The boiling point of a liquid is the temperature at which it changes to ______.20.What is the process of changing from liquid to gas called?A. FreezingB. MeltingC. EvaporationD. CondensationC21.I spotted a _______ (小鹿) in the meadow.22.Many plants have _____ (独特的特征) that help them survive.23.The deer runs through the ______.24.What is 22 7?A. 15B. 16C. 17D. 18A25.I have a ________ (模型车) that I play with on my desk.26.The _____ (袋鼠) carries its baby in a pouch.27.What do you call a baby chicken?A. ChickB. DucklingC. GoslingD. PoultA28.Gardening can be a joyful way to express your ______ and creativity. (园艺可以是表达你的艺术性和创造力的快乐方式。

Two-Dimensional Gas of Massless Dirac Fermions in Graphene

Two-Dimensional Gas of Massless Dirac Fermions in Graphene

Two-Dimensional Gas of Massless Dirac Fermions in Graphene K.S. Novoselov1, A.K. Geim1, S.V. Morozov2, D. Jiang1, M.I. Katsnelson3, I.V. Grigorieva1, S.V. Dubonos2, A.A. Firsov21Manchester Centre for Mesoscience and Nanotechnology, University of Manchester, Manchester, M13 9PL, UK2Institute for Microelectronics Technology, 142432, Chernogolovka, Russia3Institute for Molecules and Materials, Radboud University of Nijmegen, Toernooiveld 1, 6525 ED Nijmegen, the NetherlandsElectronic properties of materials are commonly described by quasiparticles that behave as nonrelativistic electrons with a finite mass and obey the Schrödinger equation. Here we report a condensed matter system where electron transport is essentially governed by the Dirac equation and charge carriers mimic relativistic particles with zero mass and an effective “speed of light” c∗ ≈106m/s. Our studies of graphene – a single atomic layer of carbon – have revealed a variety of unusual phenomena characteristic of two-dimensional (2D) Dirac fermions. In particular, we have observed that a) the integer quantum Hall effect in graphene is anomalous in that it occurs at halfinteger filling factors; b) graphene’s conductivity never falls below a minimum value corresponding to the conductance quantum e2/h, even when carrier concentrations tend to zero; c) the cyclotron mass mc of massless carriers with energy E in graphene is described by equation E =mcc∗2; and d) Shubnikov-de Haas oscillations in graphene exhibit a phase shift of π due to Berry’s phase.Graphene is a monolayer of carbon atoms packed into a dense honeycomb crystal structure that can be viewed as either an individual atomic plane extracted from graphite or unrolled single-wall carbon nanotubes or as a giant flat fullerene molecule. This material was not studied experimentally before and, until recently [1,2], presumed not to exist. To obtain graphene samples, we used the original procedures described in [1], which involve micromechanical cleavage of graphite followed by identification and selection of monolayers using a combination of optical, scanning-electron and atomic-force microscopies. The selected graphene films were further processed into multi-terminal devices such as the one shown in Fig. 1, following standard microfabrication procedures [2]. Despite being only one atom thick and unprotected from the environment, our graphene devices remain stable under ambient conditions and exhibit high mobility of charge carriers. Below we focus on the physics of “ideal” (single-layer) graphene which has a different electronic structure and exhibits properties qualitatively different from those characteristic of either ultra-thin graphite films (which are semimetals and whose material properties were studied recently [2-5]) or even of our other devices consisting of just two layers of graphene (see further). Figure 1 shows the electric field effect [2-4] in graphene. Its conductivity σ increases linearly with increasing gate voltage Vg for both polarities and the Hall effect changes its sign at Vg ≈0. This behaviour shows that substantial concentrations of electrons (holes) are induced by positive (negative) gate voltages. Away from the transition region Vg ≈0, Hall coefficient RH = 1/ne varies as 1/Vg where n is the concentration of electrons or holes and e the electron charge. The linear dependence 1/RH ∝Vg yields n =α·Vg with α ≈7.3·1010cm-2/V, in agreement with the theoretical estimate n/Vg ≈7.2·1010cm-2/V for the surface charge density induced by the field effect (see Fig. 1’s caption). The agreement indicates that all the induced carriers are mobile and there are no trapped charges in graphene. From the linear dependence σ(Vg) we found carrier mobilities µ =σ/ne, whichreached up to 5,000 cm2/Vs for both electrons and holes, were independent of temperature T between 10 and 100K and probably still limited by defects in parent graphite. To characterise graphene further, we studied Shubnikov-de Haas oscillations (SdHO). Figure 2 shows examples of these oscillations for different magnetic fields B, gate voltages and temperatures. Unlike ultra-thin graphite [2], graphene exhibits only one set of SdHO for both electrons and holes. By using standard fan diagrams [2,3], we have determined the fundamental SdHO frequency BF for various Vg. The resulting dependence of BF as a function of n is plotted in Fig. 3a. Both carriers exhibit the same linear dependence BF = β·n with β ≈1.04·10-15 T·m2 (±2%). Theoretically, for any 2D system β is defined only by its degeneracy f so that BF =φ0n/f, where φ0 =4.14·10-15 T·m2 is the flux quantum. Comparison with the experiment yields f =4, in agreement with the double-spin and double-valley degeneracy expected for graphene [6,7] (cf. caption of Fig. 2). Note however an anomalous feature of SdHO in graphene, which is their phase. In contrast to conventional metals, graphene’s longitudinal resistance ρxx(B) exhibits maxima rather than minima at integer values of the Landau filling factor ν (Fig. 2a). Fig. 3b emphasizes this fact by comparing the phase of SdHO in graphene with that in a thin graphite film [2]. The origin of the “odd” phase is explained below. Another unusual feature of 2D transport in graphene clearly reveals itself in the T-dependence of SdHO (Fig. 2b). Indeed, with increasing T the oscillations at high Vg (high n) decay more rapidly. One can see that the last oscillation (Vg ≈100V) becomes practically invisible already at 80K whereas the first one (Vg <10V) clearly survives at 140K and, in fact, remains notable even at room temperature. To quantify this behaviour we measured the T-dependence of SdHO’s amplitude at various gate voltages and magnetic fields. The results could be fitted accurately (Fig. 3c) by the standard expression T/sinh(2π2kBTmc/heB), which yielded mc varying between ≈ 0.02 and 0.07m0 (m0 is the free electron mass). Changes in mc are well described by a square-root dependence mc ∝n1/2 (Fig. 3d). To explain the observed behaviour of mc, we refer to the semiclassical expressions BF = (h/2πe)S(E) and mc =(h2/2π)∂S(E)/∂E where S(E) =πk2 is the area in k-space of the orbits at the Fermi energy E(k) [8]. Combining these expressions with the experimentally-found dependences mc ∝n1/2 and BF =(h/4e)n it is straightforward to show that S must be proportional to E2 which yields E ∝k. Hence, the data in Fig. 3 unambiguously prove the linear dispersion E =hkc∗ for both electrons and holes with a common origin at E =0 [6,7]. Furthermore, the above equations also imply mc =E/c∗2 =(h2n/4πc∗2)1/2 and the best fit to our data yields c∗ ≈1⋅106 m/s, in agreement with band structure calculations [6,7]. The employed semiclassical model is fully justified by a recent theory for graphene [9], which shows that SdHO’s amplitude can indeed be described by the above expression T/sinh(2π2kBTmc/heB) with mc =E/c∗2. Note that, even though the linear spectrum of fermions in graphene (Fig. 3e) implies zero rest mass, their cyclotron mass is not zero. The unusual response of massless fermions to magnetic field is highlighted further by their behaviour in the high-field limit where SdHO evolve into the quantum Hall effect (QHE). Figure 4 shows Hall conductivity σxy of graphene plotted as a function of electron and hole concentrations in a constant field B. Pronounced QHE plateaux are clearly seen but, surprisingly, they do not occur in the expected sequence σxy =(4e2/h)N where N is integer. On the contrary, the plateaux correspond to half-integer ν so that the first plateau occurs at 2e2/h and the sequence is (4e2/h)(N + ½). Note that the transition from the lowest hole (ν =–½) to lowest electron (ν =+½) Landau level (LL) in graphene requires the same number of carriers (∆n =4B/φ0 ≈1.2·1012cm-2) as the transition between other nearest levels (cf. distances between minima in ρxx). This results in a ladder of equidistant steps in σxy which are not interrupted when passing through zero. To emphasize this highly unusual behaviour, Fig. 4 also shows σxy for a graphite film consisting of only two graphene layers where the sequence of plateaux returns to normal and the first plateau is at 4e2/h, as in the conventional QHE. We attribute this qualitative transition between graphene and its two-layer counterpart to the fact that fermions in the latter exhibit a finite mass near n ≈0 (as found experimentally; to be published elsewhere) and can no longer be described as massless Dirac particles. 2The half-integer QHE in graphene has recently been suggested by two theory groups [10,11], stimulated by our work on thin graphite films [2] but unaware of the present experiment. The effect is single-particle and intimately related to subtle properties of massless Dirac fermions, in particular, to the existence of both electron- and hole-like Landau states at exactly zero energy [912]. The latter can be viewed as a direct consequence of the Atiyah-Singer index theorem that plays an important role in quantum field theory and the theory of superstrings [13,14]. For the case of 2D massless Dirac fermions, the theorem guarantees the existence of Landau states at E=0 by relating the difference in the number of such states with opposite chiralities to the total flux through the system (note that magnetic field can also be inhomogeneous). To explain the half-integer QHE qualitatively, we invoke the formal expression [9-12] for the energy of massless relativistic fermions in quantized fields, EN =[2ehc∗2B(N +½ ±½)]1/2. In QED, sign ± describes two spins whereas in the case of graphene it refers to “pseudospins”. The latter have nothing to do with the real spin but are “built in” the Dirac-like spectrum of graphene, and their origin can be traced to the presence of two carbon sublattices. The above formula shows that the lowest LL (N =0) appears at E =0 (in agreement with the index theorem) and accommodates fermions with only one (minus) projection of the pseudospin. All other levels N ≥1 are occupied by fermions with both (±) pseudospins. This implies that for N =0 the degeneracy is half of that for any other N. Alternatively, one can say that all LL have the same “compound” degeneracy but zeroenergy LL is shared equally by electrons and holes. As a result the first Hall plateau occurs at half the normal filling and, oddly, both ν = –½ and +½ correspond to the same LL (N =0). All other levels have normal degeneracy 4B/φ0 and, therefore, remain shifted by the same ½ from the standard sequence. This explains the QHE at ν =N + ½ and, at the same time, the “odd” phase of SdHO (minima in ρxx correspond to plateaux in ρxy and, hence, occur at half-integer ν; see Figs. 2&3), in agreement with theory [9-12]. Note however that from another perspective the phase shift can be viewed as the direct manifestation of Berry’s phase acquired by Dirac fermions moving in magnetic field [15,16]. Finally, we return to zero-field behaviour and discuss another feature related to graphene’s relativistic-like spectrum. The spectrum implies vanishing concentrations of both carriers near the Dirac point E =0 (Fig. 3e), which suggests that low-T resistivity of the zero-gap semiconductor should diverge at Vg ≈0. However, neither of our devices showed such behaviour. On the contrary, in the transition region between holes and electrons graphene’s conductivity never falls below a well-defined value, practically independent of T between 4 and 100K. Fig. 1c plots values of the maximum resistivity ρmax(B =0) found in 15 different devices, which within an experimental error of ≈15% all exhibit ρmax ≈6.5kΩ, independent of their mobility that varies by a factor of 10. Given the quadruple degeneracy f, it is obvious to associate ρmax with h/fe2 =6.45kΩ where h/e2 is the resistance quantum. We emphasize that it is the resistivity (or conductivity) rather than resistance (or conductance), which is quantized in graphene (i.e., resistance R measured experimentally was not quantized but scaled in the usual manner as R =ρL/w with changing length L and width w of our devices). Thus, the effect is completely different from the conductance quantization observed previously in quantum transport experiments. However surprising, the minimum conductivity is an intrinsic property of electronic systems described by the Dirac equation [17-20]. It is due to the fact that, in the presence of disorder, localization effects in such systems are strongly suppressed and emerge only at exponentially large length scales. Assuming the absence of localization, the observed minimum conductivity can be explained qualitatively by invoking Mott’s argument [21] that mean-free-path l of charge carriers in a metal can never be shorter that their wavelength λF. Then, σ =neµ can be re-written as σ = (e2/h)kFl and, hence, σ cannot be smaller than ≈e2/h per each type of carriers. This argument is known to have failed for 2D systems with a parabolic spectrum where disorder leads to localization and eventually to insulating behaviour [17,18]. For the case of 2D Dirac fermions, no localization is expected [17-20] and, accordingly, Mott’s argument can be used. Although there is a broad theoretical consensus [18-23,10,11] that a 2D gas of Dirac fermions should exhibit a minimum 3conductivity of about e2/h, this quantization was not expected to be accurate and most theories suggest a value of ≈e2/πh, in disagreement with the experiment. In conclusion, graphene exhibits electronic properties distinctive for a 2D gas of particles described by the Dirac rather than Schrödinger equation. This 2D system is not only interesting in itself but also allows one to access – in a condensed matter experiment – the subtle and rich physics of quantum electrodynamics [24-27] and provides a bench-top setting for studies of phenomena relevant to cosmology and astrophysics [27,28].1. Novoselov, K.S. et al. PNAS 102, 10451 (2005). 2. Novoselov, K.S. et al. Science 306, 666 (2004); cond-mat/0505319. 3. Zhang, Y., Small, J.P., Amori, M.E.S. & Kim, P. Phys. Rev. Lett. 94, 176803 (2005). 4. Berger, C. et al. J. Phys. Chem. B, 108, 19912 (2004). 5. Bunch, J.S., Yaish, Y., Brink, M., Bolotin, K. & McEuen, P.L. Nanoletters 5, 287 (2005). 6. Dresselhaus, M.S. & Dresselhaus, G. Adv. Phys. 51, 1 (2002). 7. Brandt, N.B., Chudinov, S.M. & Ponomarev, Y.G. Semimetals 1: Graphite and Its Compounds (North-Holland, Amsterdam, 1988). 8. Vonsovsky, S.V. and Katsnelson, M.I. Quantum Solid State Physics (Springer, New York, 1989). 9. Gusynin, V.P. & Sharapov, S.G. Phys. Rev. B 71, 125124 (2005). 10. Gusynin, V.P. & Sharapov, S.G. cond-mat/0506575. 11. Peres, N.M.R., Guinea, F. & Castro Neto, A.H. cond-mat/0506709. 12. Zheng, Y. & Ando, T. Phys. Rev. B 65, 245420 (2002). 13. Kaku, M. Introduction to Superstrings (Springer, New York, 1988). 14. Nakahara, M. Geometry, Topology and Physics (IOP Publishing, Bristol, 1990). 15. Mikitik, G. P. & Sharlai, Yu.V. Phys. Rev. Lett. 82, 2147 (1999). 16. Luk’yanchuk, I.A. & Kopelevich, Y. Phys. Rev. Lett. 93, 166402 (2004). 17. Abrahams, E., Anderson, P.W., Licciardello, D.C. & Ramakrishnan, T.V. Phys. Rev. Lett. 42, 673 (1979). 18. Fradkin, E. Phys. Rev. B 33, 3263 (1986). 19. Lee, P.A. Phys. Rev. Lett. 71, 1887 (1993). 20. Ziegler, K. Phys. Rev. Lett. 80, 3113 (1998). 21. Mott, N.F. & Davis, E.A. Electron Processes in Non-Crystalline Materials (Clarendon Press, Oxford, 1979). 22. Morita, Y. & Hatsugai, Y. Phys. Rev. Lett. 79, 3728 (1997). 23. Nersesyan, A.A., Tsvelik, A.M. & Wenger, F. Phys. Rev. Lett. 72, 2628 (1997). 24. Rose, M.E. Relativistic Electron Theory (John Wiley, New York, 1961). 25. Berestetskii, V.B., Lifshitz, E.M. & Pitaevskii, L.P. Relativistic Quantum Theory (Pergamon Press, Oxford, 1971). 26. Lai, D. Rev. Mod. Phys. 73, 629 (2001). 27. Fradkin, E. Field Theories of Condensed Matter Systems (Westview Press, Oxford, 1997). 28. Volovik, G.E. The Universe in a Helium Droplet (Clarendon Press, Oxford, 2003).Acknowledgements This research was supported by the EPSRC (UK). We are most grateful to L. Glazman, V. Falko, S. Sharapov and A. Castro Netto for helpful discussions. K.S.N. was supported by Leverhulme Trust. S.V.M., S.V.D. and A.A.F. acknowledge support from the Russian Academy of Science and INTAS.43µ (m2/Vs)0.8c4P0.4 22 σ (1/kΩ)10K0 0 1/RH(T/kΩ) 1 2ρmax (h/4e2)1-5010 Vg (V) 50 -10ab 0 -100-500 Vg (V)50100Figure 1. Electric field effect in graphene. a, Scanning electron microscope image of one of our experimental devices (width of the central wire is 0.2µm). False colours are chosen to match real colours as seen in an optical microscope for larger areas of the same materials. Changes in graphene’s conductivity σ (main panel) and Hall coefficient RH (b) as a function of gate voltage Vg. σ and RH were measured in magnetic fields B =0 and 2T, respectively. The induced carrier concentrations n are described by [2] n/Vg =ε0ε/te where ε0 and ε are permittivities of free space and SiO2, respectively, and t ≈300 nm is the thickness of SiO2 on top of the Si wafer used as a substrate. RH = 1/ne is inverted to emphasize the linear dependence n ∝Vg. 1/RH diverges at small n because the Hall effect changes its sign around Vg =0 indicating a transition between electrons and holes. Note that the transition region (RH ≈ 0) was often shifted from zero Vg due to chemical doping [2] but annealing of our devices in vacuum normally allowed us to eliminate the shift. The extrapolation of the linear slopes σ(Vg) for electrons and holes results in their intersection at a value of σ indistinguishable from zero. c, Maximum values of resistivity ρ =1/σ (circles) exhibited by devices with different mobilites µ (left y-axis). The histogram (orange background) shows the number P of devices exhibiting ρmax within 10% intervals around the average value of ≈h/4e2. Several of the devices shown were made from 2 or 3 layers of graphene indicating that the quantized minimum conductivity is a robust effect and does not require “ideal” graphene.ρxx (kΩ)0.60 aVg = -60V4B (T)810K12∆σxx (1/kΩ)0.4 1ν=4 140K 80K B =12T0 b 0 25 50 Vg (V) 7520K100Figure 2. Quantum oscillations in graphene. SdHO at constant gate voltage Vg as a function of magnetic field B (a) and at constant B as a function of Vg (b). Because µ does not change much with Vg, the constant-B measurements (at a constant ωcτ =µB) were found more informative. Panel b illustrates that SdHO in graphene are more sensitive to T at high carrier concentrations. The ∆σxx-curves were obtained by subtracting a smooth (nearly linear) increase in σ with increasing Vg and are shifted for clarity. SdHO periodicity ∆Vg in a constant B is determined by the density of states at each Landau level (α∆Vg = fB/φ0) which for the observed periodicity of ≈15.8V at B =12T yields a quadruple degeneracy. Arrows in a indicate integer ν (e.g., ν =4 corresponds to 10.9T) as found from SdHO frequency BF ≈43.5T. Note the absence of any significant contribution of universal conductance fluctuations (see also Fig. 1) and weak localization magnetoresistance, which are normally intrinsic for 2D materials with so high resistivity.75 BF (T) 500.2 0.11/B (1/T)b5 10 N 1/2025 a 0 0.061dmc /m00.04∆0.02 0c0 0 T (K) 150n =0e-6-3036Figure 3. Dirac fermions of graphene. a, Dependence of BF on carrier concentration n (positive n correspond to electrons; negative to holes). b, Examples of fan diagrams used in our analysis [2] to find BF. N is the number associated with different minima of oscillations. Lower and upper curves are for graphene (sample of Fig. 2a) and a 5-nm-thick film of graphite with a similar value of BF, respectively. Note that the curves extrapolate to different origins; namely, to N = ½ and 0. In graphene, curves for all n extrapolate to N = ½ (cf. [2]). This indicates a phase shift of π with respect to the conventional Landau quantization in metals. The shift is due to Berry’s phase [9,15]. c, Examples of the behaviour of SdHO amplitude ∆ (symbols) as a function of T for mc ≈0.069 and 0.023m0; solid curves are best fits. d, Cyclotron mass mc of electrons and holes as a function of their concentration. Symbols are experimental data, solid curves the best fit to theory. e, Electronic spectrum of graphene, as inferred experimentally and in agreement with theory. This is the spectrum of a zero-gap 2D semiconductor that describes massless Dirac fermions with c∗ 300 times less than the speed of light.n (1012 cm-2)σxy (4e2/h)4 3 2 -2 1 -1 -2 -3 2 44Kn7/ 5/ 3/ 1/2 2 2 210 ρxx (kΩ)-4σxy (4e2/h)0-1/2 -3/2 -5/2514T0-7/2 -4 -2 0 2 4 n (1012 cm-2)Figure 4. Quantum Hall effect for massless Dirac fermions. Hall conductivity σxy and longitudinal resistivity ρxx of graphene as a function of their concentration at B =14T. σxy =(4e2/h)ν is calculated from the measured dependences of ρxy(Vg) and ρxx(Vg) as σxy = ρxy/(ρxy + ρxx)2. The behaviour of 1/ρxy is similar but exhibits a discontinuity at Vg ≈0, which is avoided by plotting σxy. Inset: σxy in “two-layer graphene” where the quantization sequence is normal and occurs at integer ν. The latter shows that the half-integer QHE is exclusive to “ideal” graphene.。

英文摘要的写法

英文摘要的写法

主要结论
The results indicated that … The results show that … The results demonstrated that … The results reveal that …
由It 引起的that 从句 It was shown that … It can be seen that … It was found that … It was discovered that … It was concluded that … It has been demonstrated that It was clarified that … It was revealed that … It is considered that … It was confirmed that … It is suggested that … It was supposed that … It has become apparent that …
2、过程与方法(How did you do it?) 过程及方法。主要说明作者主要工作过程及所用的方法,也 应包括众多的边界条件,使用的主要设备和仪器。在英文摘要中, 过程与方法的阐述起着承前启后的作用。开头交待了要解决的问 题(What do you want )之后,接着要回答的自然就是如何解决问 题(How did you do),而且,最后的结果和结论也往往与研究过 程及方法是密切相关的。大多数作者在阐述过程与方法时,最常 见的问题是泛泛而谈、空洞无物,只有定性的描述,使读者很难 清楚地了解论文中解决问题的过程和方法。因此,在说明过程与 方法时,应结合(指向)论文中的公式、实验框图等来进行阐述, 这样可以既给读者一个清晰的思路,又给那些看不懂中文(但却可 以看懂公式、图、表等)的英文读者以一种可信的感觉。

含针尖缺陷的XLPE电缆绝缘击穿行为的频率依赖特性研究

含针尖缺陷的XLPE电缆绝缘击穿行为的频率依赖特性研究

绝缘材料2014,47(2)引言交联聚乙烯(XLPE )电力电缆由于其优异的电气性能、力学性能和热性能在电力传输中得到广泛应用。

虽然电缆制造技术近些年得到大幅度提升,但在电缆的运输和敷设过程中仍存在各种缺陷。

研究表明[1-4],缺陷附近的电场会畸变严重,特别由于金属针尖缺陷的存在将注入空间电荷,严重情况下会导致电缆绝缘击穿。

因此,研究缺陷对XLPE 电缆绝缘击穿特性的影响及其机理有特别重要的意义。

XLPE 电缆绝缘的击穿特性与其内部空间电荷的积累及电树枝的产生密切相关[5-6]。

根据Bahder [7]的观点,空间电荷主要是以电子或电离气体分子的形式,被放电流注体注入到聚合物的自由体积网络内。

如果这些自由体积成管状,电荷就会形成分支—————————————收稿日期:2013-7-11修回日期:2013-09-17基金项目:国家自然科学基金(50977071、51177121);特高压工程技术(昆明、广州)国家工程实验室开放课题(NEL201207)作者简介:李欢(1988-),男(汉族),陕西省汉中市人,博士生,研究方向为缺陷结构对XLPE 电缆绝缘介电性能和理化性能的影响。

含针尖缺陷的XLPE 电缆绝缘击穿行为的频率依赖特性研究李欢1,李欣1,李巍巍1,李建英1,王国利2(1.西安交通大学电力设备电气绝缘国家重点实验室,西安710049;2.特高压工程技术(昆明、广州)国家工程实验室,广州510045)摘要:研究了在20~300Hz 频率范围内含针尖缺陷的电缆绝缘试样在变频电压和阻尼振荡波电压作用下的击穿特性,变频击穿采用连续升压和逐级升压两种方式。

结果表明:连续升压下的变频击穿电压、逐级升压下的变频击穿电压和阻尼振荡波击穿电压分别在240Hz 、80Hz 和170Hz 附近出现最大值。

电压形式和电场频率对含针尖缺陷电缆绝缘击穿特性的影响来源于空间电荷的注入及分布特性的差别,这种差别不仅导致击穿电压的不同,还导致击穿的微观路径产生显著变化。

气候变化对地球的影响英文作文

气候变化对地球的影响英文作文

气候变化对地球的影响英文作文英文回答:Climate change, driven by increasing levels of greenhouse gases in the atmosphere, is having a profound impact on our planet. The effects are far-reaching and include rising temperatures, more frequent and severe weather events, changes in precipitation patterns, altered ecosystems, and rising sea levels.Rising temperatures are causing a variety of problems. They are leading to the melting of glaciers and ice caps, resulting in sea level rise, which threatens coastal communities and infrastructure. Extreme heat events, such as heat waves and droughts, are becoming more frequent and intense, leading to heat-related illnesses and deaths.Changes in precipitation patterns are also affecting the distribution of water resources. Some areas are experiencing increased rainfall, leading to flooding andlandslides, while others are seeing decreased rainfall, resulting in droughts. These changes have implications for water supply, agriculture, and ecosystems.Climate change is also altering ecosystems. As temperatures increase, some species are being forced to migrate to cooler areas, while others are becoming extinct. Changes in rainfall patterns are affecting the growth and distribution of plants, leading to changes in biodiversity and habitat loss.Sea level rise is a major threat to coastal communities. As the oceans warm, sea levels rise, causing erosion, flooding, and the salinization of freshwater sources. Thisis threatening coastal infrastructure, homes, and businesses, and is forcing many people to relocate.The effects of climate change are being felt around the world, and they are likely to become more severe in the future. Scientists agree that urgent action is needed to reduce greenhouse gas emissions and mitigate the impacts of climate change. This will require a global effort,including changes in energy production and consumption,land use practices, and transportation systems.中文回答:气候变化是由大气中温室气体浓度增加推动的,对地球产生了深远的影响。

Punch-through currents in P+NP+ and N+PN+ sandwich structures—I Introduction and basic calculations

Punch-through currents in P+NP+ and N+PN+ sandwich structures—I Introduction and basic calculations
Solid-State Electronics. Vol. 24, No. 9, pp. 805-814, 1981 Printed in Great Britain.
OO38-llOl/RIMwecH-lo#n.(Rl/O PergaRRENTS IN P’NP’ AND N’PN’ SANDWICH STRUCTURES-I
1. INTRODUCTION The punch-through effect was originally regarded as a harmful effect in bipolar transistors, due to a too strongly reverse biased base-collector junction causing excessive emitter-collector currents which are no longer controlled by the base-emitter voltage [ l-61. Later the harmful effect of punch-through was recognized as a break-down mechanism between the gates in double gate JFETs[7] and as a break-down mechanism between source and drain in short-channel MOS transistors[8]. However, when carefully designed, the punch-through current in short-channel MOS transistors is strongly modulated by the gate voltage and can therefore be used as an extra advantageous (shunt) current to increase the transconductance of the transistor [9-121. Further an increasing interest is being shown in the application of the punch-through effect in a lot of devices, such as a reset mechanism in JFET optical detectors[l3,14], as a reset mechanism in JFET dynamic memories[U-181, as a current mechanism in small vertical ROM cells[19], as a load device in fast RAM cells[20,21], as a voltage reference device in MOS circuitsI221, as an isolation phenomenon in dynamic RAM cells [23], as a clamp device in ignition circuits [24], as a dc-current bias in punch-through BARITT microwave devices [25,26], as a space-charge limited resistor in high ohmic substrates 1271,and as a modulated current flow in IGFET tetrodes [28]. To understand and to design accurately all these different devices, a fundamental knowledge of the punch-through effect is necessary. The standard texts[2-6] derive a punch-through voltage at which a punch-through current starts to flow, but do not derive the current/voltage relation. An onset to an analytical current/voltage relation is given in[29,22]. In MOS transistors the punch-through effect is highly three dimensional, which makes an analytical calculation of the punch-through current impossible. Some numerical approaches to this problem have been presented [lO-121, but they give a different physical insight compared with analytical expressions.
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Effects of space charge distribution on ferroelectric hysteresis loops considering the inhomogeneous built-in electric field: A phase field simulationX. L. Wang, B. Li, X. L. Zhong, Y. Zhang, J. B. Wang et al.Citation: J. Appl. Phys. 112, 114103 (2012); doi: 10.1063/1.4767702View online: /10.1063/1.4767702View Table of Contents: /resource/1/JAPIAU/v112/i11Published by the American Institute of Physics.Additional information on J. Appl. Phys.Journal Homepage: /Journal Information: /about/about_the_journalTop downloads: /features/most_downloadedInformation for Authors: /authorsDownloaded 16 Jun 2013 to 221.212.116.50. This article is copyrighted as indicated in the abstract. Reuse of AIP content is subject to the terms at: /about/rights_and_permissionsEffects of space charge distribution on ferroelectric hysteresis loops considering the inhomogeneous built-in electric field:A phase field simulationX.L.Wang,1,2B.Li,2X.L.Zhong,1,a)Y .Zhang,1J.B.Wang,2,a)and Y .C.Zhou 11Key Laboratory of Low Dimensional Materials and Application Technology of Ministry of Education,Xiangtan University,Xiangtan 411105,Hunan,China 2Faculty of Materials,Optoelectronics and Physics,Xiangtan University,Xiangtan 411105,China(Received 17February 2012;accepted 31October 2012;published online 3December 2012)A phase field model based on the time-dependent Ginsburg-Landau equation is developed to investigate the space charge distribution effects on the ferroelectric hysteresis characteristics of the ferroelectric thin film,in which the inhomogeneity of the built-in electric field (E i b )distribution along the vertical direction of ferroelectric thin film and the corresponding effect on the domain kinetics are taken into account.The hysteresis loops of the ferroelectric thin films with different space charge distributions are calculated by using this model.The results indicate that symmetrically (including homogeneously)distributed space charges lead to the hysteresis loop constriction because the E i b weakens the total electric field to make the ferroelectric film form a stable monodomain structure or the 180 strip domain.However,asymmetrically distributed space charges cause not only the shift but also the distortion of the hysteresis loop which is pinched in one head and loses its centrosymmetry.This is attributed to that the negative E i b changes the totalelectric field and activates domain nucleation at the interface.VC 2012American Institute of Physics .[/10.1063/1.4767702]I.INTRODUCTIONFerroelectric thin films have been extensively studied for their enormous potential in nonvolatile memory devices application.1–3It is reported that large amounts of charged defects such as ion impurities,oxygen vacancies,and dislo-cations may be produced during the manufacturing pro-cess.4–6As a result,a built-in electric field (E i b )along the film thickness is formed due to space charge distribution in ferroelectric thin films.The E i b in some regions of the film,especially at the interfaces,can be so large that it is even comparable to the external applied read/write voltage of the memory cells.This will lead to the enhancement of the power consumption and the write/read error rate for ferro-electric memory device.Several models have been developed to study the effects of space charges on hysteresis loops in ferroelectric film and superlattice.7–12In most of the above-mentioned models,however,researchers only consider the homogeneous distri-bution of space charge,and the E i b induced by space charges is artificially taken to be constant along the film thickness.7–11In fact,the distribution of space charges is a function of the position of ferroelectric thin film,which will lead to an inho-mogeneous E i b .Generally,the E i b at the interfaces of the ferroelectric thin film is much larger than that in the center of the ferroelectric film.13Recently,Misirlioglu et al.investigate the effect of inhomogeneous E i b due to asymmetric space charges on hysteresis loop of ferroelectric thin film by a non-linear thermodynamic method and reveal the hysteresischaracteristics can be altered dramatically under asymmetric space charges.12As we know,the prepared ferroelectric thin film is multi-domain structure usually and its domain kinetics should be focused.12However,the effect of E i b on domain kinetics is not considered for the limit of method in previous works.7–12Moreover,experiment results show that the space charge distribution is time-dependent after the application of an electric field.14Therefore,a kinetics model is desired to describe the effect of space charge on the evolution of ferro-electric domain and related properties.The phase field method is one of the useful tools to study the domain kinetics of ferro-electric.15,16Artemev et al.apply the phase field method to investigate the domain structure evolution and hysteresis loop in ferroelectric films with deadlayers,17which provides some guidance for our work from the view of the domain kinetics.In order to study the effect of space charges on the domain kinetics and the ferroelectric characteristics of ferroelectric film and its corresponding mechanism,in this work,a phase field model incorporating the inhomogeneous E i b due to the inhomogeneous space charges is developed.It is expected that this model will be useful to study the mechanism of the space charge effects and improve the electrical properties of ferroelectric films.II.THEORY AND METHODOLOGYThe phase field method is applied to describe the polar-ization evolution in the ferroelectric thin film under an exter-nal electric field and the E i b induced by space charges.The spontaneous polarization vector,P ¼(P 1,P 2,P 3),is taken as the order parameter.The time-dependent Ginsburg-Landau (TDGL )equationa)Authors to whom correspondence should be addressed.Electronic addresses:xlzhong@ and jbwang@.0021-8979/2012/112(11)/114103/6/$30.00VC 2012American Institute of Physics 112,114103-1JOURNAL OF APPLIED PHYSICS 112,114103(2012)@P iðr;tÞ@t ¼ÀLd Fd P iðr;tÞði¼1;2;3Þ(1)is employed to describe the temporal evolution of the sponta-neous polarizationfield,where L is the kinetic coefficient,F is the total free energy,t is the time,r¼(x,y,z)is the spatial vector,and d F/d P i(r,t)represents the thermodynamic driv-ing force.We consider the total free energy of thefilm asF¼ðV½f LðP iÞþf GðP i;jÞþf EðP i;e ijÞþf eleðP i;E iÞ dV;(2)where V,f L,f G,f E,and f ele are thefilm volume,the bulk free energy density,the gradient energy density,the elastic energy density,and the electrostatic energy density,ing the Landau phase transformation theory,the bulk free energy density in a given grain is expanded into terms of polarization components as follows:F LðP iÞ¼a1ðP21þP22þP23Þþa11ðP41þP42þP43Þþa12ðP21P22þP22P23þP23P21Þþa111ðP61þP62þP63Þþa112½P21ðP42þP43ÞþP22ðP43þP41ÞþP23ðP41þP42Þþa123P21P22P23;(3)where a1,a11,a12,a111,a112,and a123are the phenomenolog-ical Landau expansion coefficients.In the Ginzburg-Landau theory,the total free energy also depends on the gradient of the order parameter.For simplicity,we use the lowest order of the gradient energy,i.e.,F GðP i;jÞ¼12G11ðP21;xþP22;yþP23;zÞþG12ðP1;x P2;yþP2;y P3;zþP3;z P1;xÞþ12G44½ðP1;yþP2;xÞ2þðP2;zþP3;yÞ2þðP3;xþP1;zÞ2 þ12G044½ðP1;yÀP2;xÞ2þðP2;zÀP3;yÞ2þðP3;xÀP1;zÞ2 ;(4)where G ij is the gradient energy coefficients and P i,j denotes the spatial differentiation of the polarization components. The third term on the right hand of Eq.(1)is the elastic energy density,which is determined to beF elasðe ijÞ¼12C11ðe211þe222þe233ÞþC12ðe11e22þe22e33þe33e11Þþ2C44ðe212þe223þe213Þ;(5)where C ij is the second order elastic stiffness tensor,and e ij is the elastic strain,which is calculated bye ij¼e t ijÀe0ij;(6) where e t ij represents the total strain.The spontaneous straine0 ij ,which is also called eigenstrains,is associated with thespontaneous polarizations through the electrostrictive coeffi-cient Q ijkl,e0ij¼Q ijkl P k P l;(7)where the repeated subscripts imply the Einstein summa-tion.18The total strain is composed of the inhomogeneousand homogeneous strains.In ferroelectric materials,the in-homogeneous strain arises from the macroscopic deforma-tions in bulk material.For the case of ferroelectric thinfilm,the total strain is attributed mainly to the homogeneous straindue to the thickness of the ferroelectric thinfilm,which isseveral grades smaller than that of the substrate.19The valid-ity of neglecting the inhomogeneous strains in ferroelectricthinfilm has been demonstrated.19,20Thus,we can neglectthe inhomogeneous part of the total strain,and the total straine tijis considered equal to the homogeneous strain e ij,which isset to bee11¼ e22¼l m; e12¼ e13¼ e23¼0; e33¼À21Àl m;(8)where and l m are the Poisson ratio and the in-plane misfitstrain caused by the lattice mismatch,respectively.The elec-trostatic energy density is strongly depended on the spacecharge distribution.It can be expressed asF ele¼ÀE a iþ12E d iþE b iP i;(9)where E i a is the applied electricfield,E i d is the depolariza-tionfield,and E i b is the built-in electricfield.Then,we cancalculate the depolarizationfield asE d i¼ÀP iÀ P ie;(10)where e is the dielectric constant of the ferroelectric thinfilm.In Baudry’s model,the electrostatic interactions areestablished through the built-in polarization due to the spacecharges and the spontaneous polarization.10This modelassumes the ferroelectric thinfilm to be composed of“sections”or“layers”with different polarization valueswhen a constant space charge is discretely inserted at a givenposition.In this article,the space charges are position-dependent and continuously distributed along the thicknessof thefilm,and hence the space charge density in the ferro-electric thinfilm is solely the function of the position.Fora better understanding of the space charge effects in ferro-electric thinfilms,we consider four kinds of space chargedistributions,i.e.,homogeneous distribution,asymmetric dis-tribution with the space charge density exponentially decay-ing to zero from the top interface,asymmetric distributionwith the space charge density exponentially decaying to zerofrom the bottom interface,and symmetric distribution withthe space charge density exponentially decaying to zero atthe center of thefilm from the both interfaces.For the caseof homogeneous space charge distribution,the space chargedensity in the wholefilm is q sc(z)¼C,which means that thespace charge density is a constant value in the monolithic ferroelectricfilm.However,for the case of asymmetric space charge distribution,the space charge density in the ferroelec-tricfilm is taken to be q sc(z)¼q maxÁj z or q sc(z)¼q maxÁj d-z, where j is the base of the exponential function and d is the thickness of the ferroelectric thinfilm.For the case of sym-metric space charge distribution,q sc(z)¼q maxÁj z(0<z<d/2) and q sc(z)¼q maxÁj d-z(d/2<z<d).The E i b is taken to be a two-dimensional(2D)distribution instead of an average value.The corresponding electric potential is calculated by solving Poisson’s equation@2uðzÞ@z ¼Àq scðzÞe;(11)where q sc(z)and u(z)are the space charge density and corre-sponding electric potential at coordinate point z,respec-tively.Then the E i b at coordinate point z is obtained byE scðzÞ¼Àr/ðzÞ;(12) where r denotes the gradient operator.The lead titanate(PbTiO3)ferroelectric thinfilm is cho-sen as an example in the present simulations.The magnitude of the spontaneous polarization at room temperature P0is set to be0.757C/m2,the reference value of the gradient energy coefficients G110¼1.73Â10À10m4N/C2,and the value of a0¼a1,25 C¼(25–479)Â3.8Â105m2N/C2.21The sponta-neous polarization component P2and the electricfield com-ponent E2are treated to be zero.We employ64Â16discrete grid points to represent an infinitely large value of the width-to-thickness ratio of the ferroelectric region.The grid spac-ing is chosen to be D x*¼D z*¼1nm,and the time step is set as D t*¼0.02.The normalized external electricfield E*is first decreased from3.1to0,then continually brought down toÀ3.1,andfinally increased to3.1again.The whole pro-cess consists of126steps,with the change in the electric field linearly and homogenously.To ensure a stable electric domain state,a relaxation of20D t*is adopted at each step of different external electric level.All the electricfield compo-nents along the x direction are neglected,and the averaged polarization along the z direction is recorded as the total rem-nant polarization.For convenience,the set of dimensionless variables described in Ref.22are employed here to solve Eq.(1)PüP=P0;rüffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffiffij a0j=G110pr;tüj a0j Lt;aÃ1¼a1=j a0j;aÃ11¼a11P20=j a0j;aÃ12¼a12P20=j a0j;aÃ111¼a111P40=j a0j;aÃ112¼a112P40=j a0j;aÃ123¼a123P40=j a0j; QÃ11¼Q11P20;QÃ12¼Q12P20;QÃ44¼Q44P20;GÃ11¼G11=G110;GÃ12¼G12=G110;GÃ44¼G44=G110; G0Ã44¼G044=G110;EüE=ðj a0j P0Þ;eÃ0¼e0j a0j(13) where the superscript asterisk*denotes the normalized variables.The values of this dimensionless parameters used in the simulation are listed in Table I.Periodic boundary condition for the polarization is applied along the x axis.Extrapolative polarization boundary condition along the z axis is given by dP/dn¼ÀP/d,19where n refers to a unit length in the outward normal direction of the surface,and d is the extrapolation length and is taken to be8nm in this sim-ulation.23For convenience,the space charge density varia-tion along the x axis is neglected and the Diriclet electric potential boundary conditions along the z axis are adopted in order to introduce the effect of the external bias u(0)¼V ext, u(z)¼0.To ensure c-domain with either positive or negative polarization along the out-of-plane axis in the whole simula-tion region,the misfit strain l m is taken asÀ0.012.24III.RESULTS AND DISCUSSIONFigs.1(a)–4(a)illustrate the schematic diagrams of the ferroelectricfilm sandwich structure with various space charge distributions,i.e.,homogeneous distribution,symmet-ric distribution with the space charge density exponentially decaying to zero at the center of thefilm from the both inter-faces,asymmetric distribution with the space charge density exponentially decaying to zero from the top interface,and asymmetric distribution with the space charge density expo-nentially decaying to zero from the bottom interface.The color change of ferroelectric layer in the schematic diagrams represents the variation of space charge density,and deeper color means higher space charge concentration.For the case of homogeneous space charge distribution,we consider four different space charge density q¼0.01,0.03,0.05,and 0.075C/m2as shown in Fig.1(b).For the case of inhomoge-neous space charge distribution,three different maximum space charge densities(q max),i.e.,0.05,0.075,and0.1C/m2 are adopted as shown in Figs.2(b),3(b),and4(b).The corre-sponding E i b distributions and ferroelectric hysteresis loops under four above-mentioned cases are shown in Figs.1(c)–Fig.4(c)and Figs.1(d)–4(d),respectively.From Fig.1(d),it can be seen clearly that the hysteresis loops show restriction effects when space charges are present in thefilms,and the restriction extent remarkably increases with the increment of space charge density from0.01to 0.075C/m2.Similar results have been reported by other researchers’works.9,10When the space charge density reaches0.075C/m2,polarization changes almost linearly with the applied electricfield.To investigate the origins of this strong constriction effect on the hysteresis loop,we try to analyze the domain evolution process within an entire period of the hysteresis loop.And180 strip domain(see Fig.5(a))is observed when the space charge density is 0.075C/m2,which can be explained as follows.The E i b pro-duced by the homogeneous space charges is linearly distrib-uted as illustrated in Fig.1(c),so it has considerable magnitudes even in the body of the ferroelectricfilm.In TABLE I.Dimensionless parameters used in the simulation.aÃ1aÃ11aÃ12aÃ111aÃ112GÃ11GÃ12À1À0.24 2.50.49 1.220 GÃ44G0Ã44QÃ11QÃ12QÃ44l m 110.05À0.0152À0.0120.3consequence,the total electric field in the ferroelectric film is not sufficient to saturate the polarization and form a stable monodomain structure,thus forming the 180 strip domain.19As a result,the total remnant polarization is dramatically decreased and the hysteresis loop is greatly constricted.For the symmetric but inhomogeneous distribution of space charge,the hysteresis loops are slightly constricted as shown in Fig.2(d).The restriction extent increases with the increase of q max from 0.05to 0.1C/m 2,but it is much less severe than that in the case of homogeneous space charge distribution shown in Fig.1(d).This is because that significant internal electric field is produced only at the inter-faces while the E i b in the film decreases rapidly.The total electric field is so large that it is sufficient to form stable monodomain as shown Fig.5(b).Thus only slight constric-tions happen in the hysteresis loops.For the case of asymmetric space charge distribution illustrated in Figs.3and 4,strong E i b are generated at the top and bottom interfaces,respectively.As shown in Figs.3(d)and 4(d),the hysteresis loops exhibit not only a horizontal shift but also a severe distortion,which are pinched in one head and lose their centrosymmetry.The restriction extent increases with the increase of q max from 0.05to 0.1C/m 2.This distorted phenomenon is also observed in thepreviousFIG.1.(a)Schematic diagram,(b)space charge distributions,(c)built-in electric field distributions,and (d)hysteresis loops of the ferroelectric film with homo-geneous space chargedistribution.FIG.2.(a)Schematic diagram,(b)space charge distributions,(c)built-in electric field distributions,and (d)hysteresis loops of the ferroelectric film with the space charge density exponentially decaying to zero at the center of the film from the both interfaces.experiments.25,26In order to explore the distortion mechanism of the hysteresis loops due to the inhomogeneous distribution of space charge,the time-dependent domain structures under different densities of inhomogeneous space charge are simu-lated and analyzed.The hysteresis loop and domain structures in ferroelectric thin film with the asymmetrically space charge density q max ¼0.1C/m 2are taken as an example,as shown in Fig.6.From Fig.3(c),it can be seen that a large negative E i b is induced by the asymmetrically distribution space charges at the top interface area of the film,while the E i b at the bottom interface closes to zero.When a positive electrical field is applied to the film,the negative E i b decreases the magnitudeof the external electric field,which leads to left shift of the loops in the ferroelectric film and the polarization becomes unsaturated,as shown in the right part of Fig.6.This is because the negative E i b activates the opposite domain nucle-ation at the top interface,as shown in the insets (a)and (b)of Fig.6.On the other hand,when a negative electrical field is applied to the film,the negative E i b increases the magnitude of the external electrical field,which leads to the left shift of loops and the increase of polarization for complete domain switching (the insets (c)and (d)of Fig.6).The above results reveal that the E i b due to the inhomo-geneous space charge can strongly affect the domainkinetics,FIG.3.(a)Schematic diagram,(b)space charge distributions,(c)built-in electric field distributions,and (d)hysteresis loops of the ferroelectric film with the space charge density exponentially decaying to zero from the topinterface.FIG.4.(a)Schematic diagram,(b)space charge distributions,(c)built-in electric field distributions,and (d)hysteresis loops of the ferroelectric film with the space charge density exponentially decaying to zero from the top interface.thus altering the hysteresis loop of ferroelectric film.This indicates that it is meaningful to take the inhomogeneity of the E i b into consideration in our model.In addition,this model can also study the promoting and hindering effect of the ferroelectric domain nucleation and domain wall motion caused by the space charges accumulated at the ferroelectric interface,which can provide us a theoretical reference on the analysis of ferroelectric memory failure.IV.CONCLUSIONA phase field model considering in the inhomogeneity of the built-in electric field is developed to investigate the effects of different space charge distributions along the thin film thickness on the ferroelectric hysteresis loop.The resultsindicate that symmetrically (including homogeneously)dis-tributed space charges lead to hysteresis loop constriction,while asymmetrically distributed space charges cause not only shift but also distort of the hysteresis loop.These ferro-electric hysteresis loop anomalies are attributed to the effect of built-in electric field due to space charges on domain kinetics in ferroelectric thin film.This model is useful to study the mechanism of the space charge effects and improve the electrical properties of ferroelectric films.ACKNOWLEDGMENTSThis work was supported by the National Natural Science Foundation of China (Nos.11072208and 11032010)and the Hunan Provincial Natural Science Foundation of China (No.12JJ1007).1J.F.Scott and C.A.Paz de Araujo,Science 246,1400(1989).2L.Liao,H.J.Fan,B.Yan,Z.Zhang,L.L.Chen,B.S.Li,G.Z.Xing,Z.X.Shen,T.Wu,X.W.Sun,J.Wang,and T.Yu,ACS Nano 3,700(2009).3E.B.Song,B.Lian,S.M.Kim,S.Lee,T.K.Chung,M.Wang,C.Zeng,G.Xu,K.Wong,Y.Zhou,H.I.Rasool,D.H.Seo,H.J.Chung,J.Heo,S.Seo,and K.L.Wang,Appl.Phys.Lett.99,042109(2011).4K.T.Lia and V.C.Lo,J.Appl.Phys.97,034107(2005).5Y.T.Pu,J.L.Zhu,X.H.Zhu,Y.S.Luo,M.S.Wang,X.H.Li,J.Liu,J.G.Zhu,and D.Q.Xiao,J.Appl.Phys.109,044102(2011).6V.Koval,M.J.Reece,and A.J.Bushby,J.Appl.Phys.101,024113(2007).7C.K.Wong and F.G.Shin,J.Appl.Phys.96,6648(2004).8Y.Zhou,H.K.Chan,m,and F.G.Shin,J.Appl.Phys.98,024111(2005).9P.Zubko,D.J.Jung,and J.F.Scott,J.Appl.Phys.100,114112(2006).10L.Baudry,J.Appl.Phys.86,1096(1999).11C.J.Brennan,Mater.Res.Soc.Symp.Proc.243,141(1992).12I.B.Misirlioglu,M.B.Okatan,and S.P.Alpay,J.Appl.Phys.108,034105(2010).13A.K.Tagantsev and G.Gerra,J.Appl.Phys.100,051607(2006).14A.N.Morozovska and E.A.Eliseev,J.Phys.:Condens.Matter.16,8937(2004).15J.Slutsker,A.Artemev,and A.Royturd,Phys.Rev.Lett.100,087602(2008).16B.Li,J.B.Wang,X.L.Zhong,F.Wang,and Y.C.Zhou,J.Appl.Phys.107,014109(2010).17A.Artemev,Philos.Mag.90,7(2010).18L.Q.Chen,J.Am.Ceram.Soc.91,1835(2008).19L.Hong,A.K.Soh,Y.C.Song,and L.C.Lim,Acta Mater.56,2966(2008).20G.B.Stephenson and K.R.Elder.J.Appl.Phys.100,051601(2006).21J.Wang and T.Y.Zhang,Phys.Rev.B 73,144107(2006).22J.Wang,Y.L.Li,L.Q.Chen,and T.Y.Zhang,Acta Mater.53,2495(2005).23K.Ishikawa and T.Uemori,Phys.Rev.B 60,11841(1999).24Y.L.Li,S.Y.Hu,Z.K.Liu,and L.Q.Chen,Acta Mater.50,395(2002).25F.Chen,X.L.Tan,Z.Huang,X.F.Xuan,and W.B.Wu,Appl.Phys.Lett.96,262902(2010).26Y.Lin,B.R.Zhao,H.B.Peng,Z.Hao,B.Xu et al .,J.Appl.Phys.86,4467(1999).FIG.5.The domain structures of ferroelectric thin film with (a)homogene-ous space charge distribution and (b)symmetric but inhomogeneous distri-bution of space charge when the space charge density is 0.075C/m 2.FIG.6.The hysteresis loop of ferroelectric thin film with the asymmetrically space charge density q max ¼0.1C/m 2.The insets are the corresponding do-main structures.。

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