电子结合能

合集下载

电子结合能

电子结合能
电子结合能可以简单地定义为一个原子或分子态下两个或更多
电子之间的能量。

它是由电子组成的原子或分子中共享电子对之间形成的联系结构。

电子结合能是实体化学的基础，决定了材料的性质、物质的稳定性，甚至影响着物理和化学反应的速率和机理。

电子结合能的定义
电子结合能是电子从一个原子到另一个原子的能量。

它体现了结合稳定性的大小。

电子结合能可以有空间构型（图1），可以以不同的形式存在，如单纯的电子结合能、氢键能、电子分散能或化学键能。

图1.电子结合能的空间构型
电子结合能的计算
计算电子结合能的方法是通过计算得到电子结构，然后根据结构来估算电子结合能。

现代的计算方法基于量子力学理论，包括静态方法（如Hartree-Fock和密度泛函理论）以及动力学方法（如量子热力学）。

它们通常以结构最低能状态为目标，并反映了结构焓和结合强度。

电子结合能的应用
电子结合能是科学研究和技术开发的基础，在化学、物理、材料等领域都有重要应用。

- 1 -。

Ni的电子结合能

XPS_DatabaseNi的电子结合能：Energy (eV) Element Chemical bonding Ref215 869.6Ni2p1/2 NiNi的电子结合能：Energy (eV) Element Chemical bonding Ref 851.4Ni2p3/2ds le 304 ss avec N2 implanté 218 851.4Ni2p3/2 Ni11 218 851.95Ni2p3/2 AuNi 150 852Ni2p3/2Ni (16 min)/Al2O3/Al 229 852.1Ni2p3/2 Ni 111métallique 118 852.3Ni2p3/2 Ni852.4Ni2p3/2 Ni 215 852.48Ni2p3/2 Ni 150 852.5Ni2p3/2 Ni 247 852.5Ni2p3/2Ni métal ( 10puis-6 torr) 78 852.5Ni2p3/2Ni métal ( 250°C -1h ) 78 852.5Ni2p3/2Ni, Ni foil polishing and Ar+ etching 101 852.6Ni2p3/2 NiS 150 852.6Ni2p3/2Ni, Ni foil polish and Ar+ etching, + O2 at 200°C/1h 101 852.6Ni2p3/2Ni, Ni foil polishing + water immersion/28h 101Ni 229 852.7Ni2p3/2 bulkmetal 13 852.7Ni2p3/2 Ni852.8Ni2p3/2 Ni2Si 150 852.8Ni2p3/2 Ni-21Cr-8Fe 183 852.8Ni2p3/2 Ni 183 852.8Ni2p3/2Ni° in a passive film on SUS316L 65 852.9Ni2p3/2 Ni2P 150 852.9Ni2p3/2 2 min Ni deposit : Ni dispersed on Al2O3 229 852.9Ni2p3/2Ni, Ni foil polishing and Ar+ etching+H2S 400°C/1h 101 853Ni2p3/2 NiB 150 853Ni2p3/2Ni (7 min)/Al2O3/Al annealed to 800K for 30 min 229 853Ni2p3/2Ni metal with a sample immersed in a 60°C solution 11 853Ni2p3/2Ni metal with a sample immersed in a room t° solution 11 853Ni2p3/2NiS/Ni3S2 -Ni foil polish in H2O/28h+H2S 400°C/1h 101 853Ni2p3/2Ni Polish +Ar+,+O2 -200°C/1h+400°C/2h30mn+H2S 400°C/1h 101 853.1Ni2p3/2NiOads ( 10puis-6 torr) 78 853.1Ni2p3/2NiOads ( air 15min ) 78 853.3Ni2p3/2élément naturel (liaison métallique) 147 853.5Ni2p3/2 NiO 111 853.55Ni2p3/2 Al3Ni 150 853.6Ni2p3/2 NiI2 111 853.9Ni2p3/2 Ni(C5H5)2 111 853.9Ni2p3/2 Ni(PPh3)2 111853.9Ni2p3/2abrasé sur dry 600 grit sandpaper qq sec 207 853.9Ni2p3/2 NiO 118 854Ni2p3/2 Ni2S3 111 854Ni2p3/2 NiO 247 854Ni2p3/2NiO (1er pic) ( 800°C - 10min ) 78 854Ni2p3/2NiO ( 1er pic) ( 800°C-air ) 78 854Ni2p3/2NiO (1er pic ) ( 800°C-air+ O2-10min ) 78 854Ni2p3/2Ni (1 min)/Al2O3/Al : NiO 229 854.2Ni2p3/2 NiO 150 854.2Ni2p3/2 Ni(Co)4 150 854.2Ni2p3/2 NiO 157 854.4Ni2p3/2Ni(II) dans NiO 183 854.4Ni2p3/2 (Ni(SCH2CH2S))n 235 854.4Ni2p3/2 Ni(SCH2CH2S)(PMe2Ph)2 235 854.5Ni2p3/2 Ni(Co)4 111 854.5Ni2p3/2Ni (16 min)/Al2O3/Al annealed to 800K for 10 min :NiAl 229 854.5Ni2p3/2Ni oxide with a sample immersed in a room t° solution 11 854.5Ni2p3/2 Ni(SPh)2(CyNC)2 235 854.6Ni2p3/2 Ni-(dimethyl-glyoxime)2 150 854.6Ni2p3/2 NiO 155 854.6Ni2p3/2 NiO 13 854.6Ni2p3/2 Ni(SPh)2(dppe) 235 854.6Ni2p3/2 Ni(SPh)2(PMe2Ph)2 235 854.7Ni2p3/2 Ni(CN)2 111 854.7Ni2p3/2 Ni(SCH2CH2S)(dppe) 235 854.7Ni2p3/2 (Ni(SPh)2)n 235 854.8Ni2p3/2 NiCl2(NBu3)2 111 854.9Ni2p3/2 NiS 111 854.9Ni2p3/2 NiBr2 111 854.9Ni2p3/2 Ni(dimethylglyoxime) 111 854.9Ni2p3/2 NiFe2O4 111 855Ni2p3/2voir spectres dans la publication 102 855Ni2p3/2Ni oxide with a sample immersed in a 60°C solution 11 855.3Ni2p3/2 NiCO3 111 855.3Ni2p3/2 USY-A-6 44 855.3Ni2p3/2 LaHY 44 855.3Ni2p3/2 Ni(Met)2 235 855.4Ni2p3/2 Ni(C24H27N7)(PF6)2 111 855.4Ni2p3/2 K2Ni(CN)4 111 855.4Ni2p3/2 NiFe2O4 247 855.4Ni2p3/2 USY-A-8 44 855.5Ni2p3/2 Ni(acac)2 150 855.5Ni2p3/2 Me4NNiCl3 111 855.5Ni2p3/2NiO Oads ( 800°C-air+ O2-10min ) 78 855.5Ni2p3/2 USY-B-8 44 855.6Ni2p3/2 Ni(OH)2 247855.6Ni2p3/2 Ni(OH)2 118 855.6Ni2p3/2NiOx, Ni foil polishing + water immersion/28h 101 855.7Ni2p3/2 Ni(OH)2 150acethylacetonate 111 855.7Ni2p3/2 Ni855.7Ni2p3/2 Ni2O3 13 855.8Ni2p3/2 Ni2O3 150 855.8Ni2p3/2NiO (2nd pic) ( 800°C - 10min ) 78 855.8Ni2p3/2NiO (2ème pic) ( 800°C-air ) 78 855.8Ni2p3/2NiO ( 2ème pic) ( 800°C-air+ O2-10min ) 78 855.8Ni2p3/2Ni(OH)2 dans Inconnel 600 (Publication riche en El) 246 855.8Ni2p3/2NiOx, Ni foil polish and Ar+ etching, + O2 at 200°C/1h 101 855.9Ni2p3/2Ni2O3 ( 10puis-6 torr) 78 855.9Ni2p3/2Ni2O3 (1er pic) ( air 15min ) 78 855.9Ni2p3/2Ni2O3 ( 800°C-air ) 78 855.9Ni2p3/2Ni2O3 ( 800°C-air+ O2-10min ) 78 855.9Ni2p3/2 USY-B-8H 44 856Ni2p3/2 NiAl2O4 150 856Ni2p3/2 Ni(OH)2 111 856Ni2p3/2 Ni2O3 111 856Ni2p3/2NiOx, Ni foil polish-Ar+etch+O2, 200°C/1h+400°C/2h30mn 101 856.1Ni2p3/2 NiCl2 111 856.1Ni2p3/2Ni2O3 (1er pic) ( 250°C -1h ) 78 856.1Ni2p3/2 USY-2 44cyclohexanebutyrate 111 856.3Ni2p3/2 Ni856.3Ni2p3/2 USY-D 44 856.4Ni2p3/2 (NH4)2NiF4 111 856.4Ni2p3/2 Ni(OH)2 13 856.5Ni2p3/2 NiCl2 150 856.6Ni2p3/2 NiSiO4 150 856.7Ni2p3/2 NiSiO3 150 856.8Ni2p3/2 Ni(NO3)2 111biuret 111 856.8Ni2p3/2 KNitrifluoroacetate 111 856.9Ni2p3/2 Ni856.9Ni2p3/2 LaHY-H2O 44 856.9Ni2p3/2 NiSiO3 155 857Ni2p3/2 NiSO4 111 857.1Ni2p3/2 NiAl2O4 111 857.2Ni2p3/2 NiF2 150 857.2Ni2p3/2 NiWO4 111 857.3Ni2p3/2Metal salt NiCl2 in 316 L alloy 207 857.8Ni2p3/2 NiF2 111 858.5Ni2p3/2Ni métal (10puis-6 torr) 78 858.7Ni2p3/2 NiSiF6 111 860.9Ni2p3/2 K2NiF6 111 861.2Ni2p3/2NiO (3eme pic) ( 800°C - 10min ) 78 861.2Ni2p3/2NiO ( 3ème pic) ( 800°C-air ) 78861.2Ni2p3/2NiO (3ème pic) ( 800°C-air+ O2-10min ) 78 861.4Ni2p3/2Ni2O3 ( 2eme pic) ( air 15min ) 78 861.4Ni2p3/2Ni2O3 ( 2ème pic ) ( 250°C -1h ) 78Ni的电子结合能：Energy (eV) Element Chemical bonding Ref21567.4Ni3p1/2 NiNi的电子结合能：Energy (eV) Element Chemical bonding Ref21565.7Ni3p3/2 Ni247métal66.3Ni3p3/2 Ni24767.3Ni3p3/2 NiO247 68Ni3p3/2 Ni(OH)224768.1Ni3p3/2 NiFe2O4Ni的电子结合能：Energy (eV) Element Chemical bonding Ref215 110.2Ni3s Ni247 110.7Ni3s Ni247 111.8Ni3s NiO247 112.7Ni3s Ni(OH)2247 113Ni3s NiFe2O4。

内层电子的结合能增加

3.2.1、原子势能模型(Atom Potential Model) — 化学位移的定性图象

内层电子一方面受到原子核强烈的库仑作用而具有一定的结合能，另一方面又受到外层电子的屏蔽作用。原子势能模型： EB = Vn + Vv 当外层电子密度减少时，屏蔽作用将减弱，内层电子的结合能增加；反之则结合能将减少。
ad KT EB EB Erelax Erelat Ecorr

这样就和实验测的值符合一致了
弛豫能计算值
原子 He Li Be B C 1s 1.5 3.8 7.0 10.6 13.7 0.0 0.7 1.6 2.4 0.7 1.6 2s 2p 3s 3p 3d 4s
N
结合能的确定

光电子的结合能建立在元素终态构型基础上。
Initial State
Conduction Band Free Electon Level Fermi Level
Final State
Conduction Band
Valence Band 2p 2s 1s
Valence Band
3.1.2、结合能的理论计算
电荷势模型
I为A原子成键的部分离子特征。Pauling建议
XA XB I {1 exp[ 0.25( X A X B ) 2 ]} | XA X B|
XA和XB是A, B原子的电负性。

结果表明，DEB与q之间有较好的线性关系，理论与实验之间相当一致。
电荷势模型
含碳化合物C1s电子结合能位移同原子电荷q的关系
453.8
458.5
〖例〗三氟醋酸乙酯中C1s轨道电子结合能位移.
聚合物中碳C 1s轨道电子结合能大小顺序：

电子结合能是什么

电子结合能是什么电子结合能是指处于一个原子或分子中的电子所具有的能量，在原子或分子结构中扮演着至关重要的角色。

电子结合能的大小直接影响着物质的化学性质、光电性质等，因此，它的研究对于深入了解物质的性质和行为具有重要意义。

电子结合能的概念在一个原子或分子中，电子结合能是指电子在原子核和其他电子之间受到的相互作用力。

这种作用力决定了电子在原子或分子中的位置和运动状态，从而影响着物质的性质。

通过研究电子结合能，可以揭示物质的电子结构、能量分布和分子间相互作用等重要信息。

电子结合能的作用电子结合能在化学反应和物质相互作用中起着至关重要的作用。

在化学反应中，原子或分子间的电子结合能变化会影响到反应的速率和产物的稳定性。

电子结合能还决定了物质的光电性质，如吸收光谱和光电子能量分布等，对于光电子技术和材料科学的发展具有重要意义。

电子结合能的测量电子结合能的测量通常通过光电子能谱和X射线光电子能谱等实验技术来实现。

通过这些技术，可以准确地测定原子或分子中电子的结合能，并进一步分析物质的电子结构和化学性质。

这些实验结果对于理论计算模型的验证和修正具有重要意义，为研究者们提供了丰富的物质信息。

电子结合能的应用电子结合能的研究在材料科学、化学工程、生物医学等领域具有广泛的应用价值。

在材料科学中，通过优化电子结合能可以设计出具有特定性能的材料；在化学工程中，了解电子结合能可帮助优化反应条件和提高反应效率；在生物医学领域，电子结合能的研究可以帮助深入了解生物分子的结构和功能。

综而言之，电子结合能是物质性质中的重要参数，对于理解物质结构、性质和行为具有重要意义。

通过对电子结合能的研究和应用，可以推动材料科学、化学工程、生物医学等领域的发展，为人类社会带来更多的科学技术进步和创新成果。

C的电子结合能

XPS_DatabaseC1s的电子结合能：Energy (eV) Element Chemical bonding Ref 277.1C1s Graphite C (fluoration F2-HF sur fibre Torayca) 117 278.4C1s C-sec (fluoration avec F2-HF sur fibre Torayca) 117 279.2C1s CH4 136 279.6C1s CF (fluoration avec F2-HF sur fibre Torayca) 117 280.7C1s HfC 111150 281.3C1s TiC 281.3C1s C-H SiO2/CaO=2 et N(Al2O3)=0,102 ou 0,25 ap bomb 27197 281.4C1s TiC 281.4C1s TiC(100) using a photon energy between 330 and 380 eV 180 281.4C1s C-H verre SiO2-Al2O3-CaO à1500° C ap bomb ionique 27 281.6C1s C-Ti 43 281.6C1s TiC(100) using a photon energy between 330 and 380 eV 180 281.6C1s HfC 47 281.9C1s carbures 45 282C1s C-Ti in the TiN coatings after erosion 43 282C1s TiC 47 282C1s a single carbide species (C4-) as observed in a-C:H/Al 223 282.1C1s TiC(100) using a photon energy between 330 and 380 eV 180 282.1C1s carbure de titane 199 282.1C1s Carbure de titane (Etching 26 H, décapage 26 H) 152 282.3C1s Al-C 23(SiC) 226 282.4C1s C-Si282.5C1s TaC 47 282.7C1s WC 111 282.7C1s C-O-Al (PET +Al/C=0.8) 88 282.8C1s C-Si dans SiC 226 282.8C1s liaison pi-CO sur Mo et N ou forme carbure 212 282.8C1s C ds WC 198 283C1s C ds PMDA-ODA T=250°C av 1,0 nm de Cr(Cr-carbure) 131 283.2C1s pic attribué au carbure 182 283.2C1s forme carbure attribué au C ds Cr3C2 après bomb 2h 212 283.3C1s BaC2 150 283.3C1s pic intensif (après bomb) 212 283.3C1s pic seul avec 70 at% de Cr 212 283.3C1s Graphite C (fluoration F2-HF sur fibre C320.00A) 117 283.3C1s WC 47 283.5C1s Al-O-C(PET) 56 283.5C1s -(C*H2-CH2)n 245diamant 147 283.5C1s C283.5C1s après adsorp°de C2H4 sur le Pt(111) à 100K (220K) 37 283.6C1s C-O-Al (PET type A) 39 283.6C1s satellite Cr3C2 (surf non bombardée) 212 283.7C1s C6H5X avec X= Anisole (OCH3) 136systeme 219 283.7C1s V6Mo4O25-MoO3-As2O3283.8C1s CH2 + cycle benzénique ( PET) 88 283.8C1s TiO2-As2O5systeme 219 283.9C1s AlN/PPC binder burnout in nitrogen 94 283.93C1s C-H 193 284C1s après adsorp°de C2H2 sur le Pt(111) à 100K (100K) 37graphite 197 284.1C1s C284.1C1s C-C (CB ou graphite) 226 284.1C1s après adsorp°de C2H2 sur le Pt(111) à 100K (650K) 37 284.1C1s après adsorp°de C2H4 sur le Pt(111) à 100K (600K) 37 284.1C1s AlN/PVB binder burnout in nitrogen 94 284.2C1s HOPG + C/F=20 110 284.2C1s après adsorp°de C2H5Cl sur le Pt(111) (300K) 37 284.22C1s HOPG 142graphite 150 284.3C1s C(graphite) 111 284.3C1s C284.3C1s C2,7F-C4,4F Csp2 non-fonct ds couches de graphène 99 284.3C1s après adsorp°de C2H2 sur le Pt(111) à 100K (390K) 37 284.3C1s après adsorp°de C2H2 sur le Pt(111) à 100K (1130K) 37 284.3C1s après adsorp°de C2H4 sur le Pt(111) à 100K (100K) 37 284.3C1s après adsorp°de C2H4 sur le Pt(111) à 100K (320K) 37 284.3C1s après adsorp°de C2H4 sur le Pt(111) à 100K (1130K) 37 284.3C1s graphite 114O2/Ar/NH3 122 284.3C1s plasma:284.3C1s30 mn de traitement plasma oxygène du graphite 122O2/Ar 122 284.3C1s plasma:O2/NH3 122 284.3C1s plasma:Ar/NH3 122 284.3C1s plasma:(GRA) 91 284.36C1s graphite284.4C1s Mn(C5H5)2 111 284.4C1s C ( intercalation : stade 3) 142 284.4C1s carbone amorphe (échantillon bombardé) (i-C*) 91 284.4C1s i-CH1*: carbone amorphe hydrogéné (éch. bombardé) 91 284.4C1s après adsorp°de C2H5Cl sur le Pt(111) (110K) 37 284.4C1s C6H5X avec X= Benzonitrile (CN) 136 284.4C1s C6H5X avec X= Benzaldehyde (CHO) 136 284.4C1s Graphite C (fibre C320.00A) 117 284.4C1s C-sec (fluoration avec F2-HF sur fibre C320.00A) 117 284.4C1s CF2 (fluoration avec F2-HF sur fibre Torayca) 117 284.42C1s C for M-GICs (HOPG, regular ) 143 284.45C1s i-CH2: carbone amorphe hydrogéné 91 284.45C1s i-CH5: carbone amorphe hydrogéné 91 284.45C1s i-CH6: carbone amorphe hydrogéné 91 284.5C1s C graphite (HOPG ) 14 284.5C1s C graphite (HOPG ) 14 284.5C1s SnPh4 111284.5C1s CB dans le graphite 226pur 199 284.5C1s diamantgraphitique 99 284.5C1s C284.5C1s i-CH3: carbone amorphe hydrogéné 91 284.5C1s C6H5X avec X= Fluorobenzene (F) 136 284.5C1s C6H5X avec X= Phenol (OH) 136 284.5C1s C6H5X avec X= Nitrobenzene (NO2) 136 284.5C1s C6H5X avec X= Acetophenone (COCH3) 136 284.5C1s C6H5X avec X= Diphenylether (PhO) 136 284.5C1s C6H5X avec X= Benzophenone (PhCO) 136 284.5C1s C6H5X avec X= Benzoylchloride (COCl) 136 284.5C1s Pic du C élémentaire 152 284.5C1s C-H with a sample immersed in a 60°C solution 11 284.6C1s C-H in pulsed C6H6 and C6H3F3 plasmas 46 284.6C1s CHx in hexafluorobenzene 46 284.6C1s (CH2)n 111 284.6C1s C 175 284.6C1s C=C du Polyimide Kapton 15 284.6C1s C-C ,C-H pollution -pyrite n°1- 163 284.6C1s C-C , C-H pollution -pyrite n°2- 163 284.6C1s HOPG 110pur 45 284.6C1s carboneC-H 104 284.6C1s C-C,C-H 140 284.6C1s C-C, 284.6C1s C-C dans un ester surface: control PET (UWO) 177 284.6C1s C relié à un H ou un C (C-H ou C-C) 232 284.6C1s ds PE-Ar (CH2 ou C=C) 48PE-Ar-TFE 48 284.6C1s ds284.6C1s graphite (échantillon bombardé) (GRA*) 91 284.6C1s graphite 77withbias 77 284.6C1s butanebeam 77 284.6C1s ion284.6C1s C6H5X avec X= Aniline (NH2) 136 284.6C1s Graphite C (fluration avec ClF3 sur fibre C320.00A 117 284.6C1s graphite (publication riche en El) 250 284.6C1s graphite 174Air) 188(plasma: 284.6C1s carbone284.6C1s graphite (plasma faible: O2) 190 284.6C1s traité acide nitrique, nettoyage Ar 190 284.6C1s C-C, décomposition selon le modèle Doniach et Sunjic 95 284.6C1s AlN/PVB binder burnout in air 94 284.6C1s AlN/PPC binder burnout in air 94 284.66C1s C ( intercalation : stade 1) 142 284.66C1s C for M- GICs (stage 1, regular GICs) 143 284.7C1s C6H6 150graphite 147 284.7C1s C284.7C1s C-C ou C-H 182 284.7C1s Graphite C (fluoration avec F2 sur fibre C320.00A) 117 284.7C1s graphite (plasma: O2) 190 284.7C1s C-H with a sample immersed in a room t° solution 11 284.75C1s i-CH1: carbone amorphe hydrogéné 91 284.75C1s i-CH4: carbone amorphe hydrogéné 91 284.79C1s C ( intercalation : stade 3) 142 284.79C1s C for M-GICs (stage 3, regular GICs) 143 284.8C1s C 50 284.8C1s C 56 284.8C1s C-H (PETP film) 56 284.8C1s C-H (PET : 7x10puis15 at d'AL/cm2) 56 284.8C1s plasma polymerised ethane (PPE) 77 284.8C1s C6H5X avec X= Anisole (OCH3) 136 284.8C1s CH2F2 136 284.8C1s Graphite C (fluoration avec F2 sur fibre C320.00A) 117 284.8C1s Graphite C (fluoration avec F2 sur fibre Torayca) 117 284.82C1s C ( intercalation : stade 2) 142 284.82C1s C for M-GICs (stage 2, regular GICs) 143 284.83C1s C-O 193 284.9C1s graphite donneur GIC (K,Rb,Cs) 110 284.9C1s C1,3Fgraphite 99 284.9C1s butane without bias 77 284.9C1s C6H5X avec X= Benzaldehyde (CHO) 136 284.9C1s Graphite C (fibre Torayca) 117 284.9C1s alliphatic carbon atoms 171powder 94 284.9C1s As-receivedAlN284.9C1s polystyrene 179 285C1s C-H dans SiC 226 285C1s C-H dans PVA 226(PTFE) 90 285C1s C-H285C1s C-H 86 285C1s C=C (noy arom) dans ODA T=25°C 131 285C1s carbone amorphe (i-C) 91 285C1s diamond 77 285C1s C,CH 114 285C1s graphite (traité acide nitrique) 190 285C1s graphite (plasma O2, nettoyage Ar) 190 285C1s C-C in the TiN coatings before and after erosion 43 285C1s C-C in MC24 159 285C1s(C*H3-CH2)2-O, C* de Diethyl Ether. 26 285C1s(C*H3)2-C=O, C* d' Acetone. 26 285.1C1s C aromatique non relié à N ou C ds PMDA-ODA 130 285.1C1s R-C*H2-CFR (R:groupes non fluorés) 99 285.1C1s C6H5X avec X= Benzoylchloride (COCl) 136 285.2C1s ds PE-Ar (C-NH2) 48285.2C1s C6H5X avec X= Benzonitrile (CN) 136 285.3C1s MeCH2NH2 111(C-C) 182 285.3C1s hydrocarbone285.3C1s PE après 5 min d'expo au plasma nitrogène 48 285.35C1s diamant (échantillon bombardé) (DIA*) 91 285.4C1s Cr(C6H6)2 111 285.4C1s dsPE-Ar-PFB 48PE-Ar-PFBBr 48 285.4C1s dsPE-Ar(Na+) 48 285.4C1s ds285.4C1s C6H5X avec X= Benzophenone (PhCO) 136 285.4C1s CH2-CO 171 285.4C1s C for M-GICs (stage 3, crumpled regions) 143 285.5C1s Csp2 des cycles arom en pos Béta par rapport à F 99 285.5C1s C6H5X avec X= Acetophenone (COCH3) 136 285.5C1s C-sec (fluoration avec ClF3 sur fibre C320.00A) 117 285.5C1s CF (fluoration avec F2-HF sur fibre C320.00A) 117 285.5C1s CH3-O-C=O-C*H-(CH2-CH2-CO=O-CH3)2, C* de Polymet. Acry 26 285.6C1s C ( intercalation : stade 2) 142 285.6C1s Csp3 aliphatique ds un environnement non-fluoré 100 285.6C1s ds PE-N (C-NH2) 48 285.6C1s dsPE-Ar-TFAA 48 285.6C1s C-sec (fluoration avec F2 sur fibre C320.00A) 117 285.6C1s C for M-GICs (stage 2, crumpled regions) 143 285.7C1s C ( intercalation : stade 1) 142 285.7C1s C-N 104 285.7C1s C-H 216 285.7C1s C-sec (fluoration avec F2 sur fibre C320.00A) 117 285.7C1s C-sec (fluoration avec F2 sur fibre Torayca)) 117 285.7C1s C for M-GICs (stage 1, crumpled regions) 143(PE) 90 285.8C1s C-N 285.8C1s pic intensif ds hydrocarbones (surf non bomb) 212 285.8C1s C6H5X avec X= Benzaldehyde (CHO) 136 285.9C1s MeCH2Cl 111 285.9C1s main carbon for CO/Ni(100) c(2x2) and Cr(CO)6 64 285.9C1s fluorographitides accpteurs GIC (HSO3F) 110 285.9C1s C6H5X avec X= Aniline (NH2) 136 285.9C1s C6H5X avec X= Nitrobenzene (NO2) 136 285.94C1s Napthol (réf:284,3 eV pour C1s) (plasma: air) 189 286C1s C*-CFn in trifluorobenzene 46 286C1s C-O in trifluorobenzene 46 286C1s MeCH2OH 111(SMC) 3 286C1s C(PET) 88 286C1s C-O286C1s C=C (noy arom) dans PMDA T=25°C 131 286C1s C non combiné (bottom phase) 248PE-Ar 48 286C1s ds286C1s COH, COC, CN, CNH2 114 286C1s crumpled zone + intraband plasmon 159 286C1s CH2-NCO 171 286.09C1s Catechol (réf:284,3 eV pour C1s) (plasma: air) 189 286.1C1s C-O 43 286.1C1s C-O (Polyethylene glycol, Polyvinyl alcohol)) 226 286.1C1s C-O dans un ester surface: control PET (UWO) 177 286.1C1s C relié à un O (C-OH) 232 286.1C1s Oxyde 1: groupes alcools et ethers 174 286.1C1s hydroxyle (plasma: O2) 190 286.1C1s hydroxyle (traité acide nitrique) 190 286.2C1s C-O ou C-N du_Polyimide Kapton_ 15(PET) 39 286.2C1s C-O286.2C1s-C-O du C12 ( n ) 98 286.2C1s C-O 104 286.2C1s C aromatique relié à N ou C ds PMDA-ODA 130 286.2C1s C non combiné (top phase) 248 286.2C1s ds PE-Ar (C-OH) 48 286.2C1s C6H5X avec X= Benzonitrile (CN) 136 286.2C1s OHAir) 188(plasma: 286.22C1s Phenol (réf:284,3 eV pour C1s) (plasma: air) 189 286.3C1s C-O in pulsed benzene plasma 46 286.3C1s C-N et C-O (PTFE) 90 286.3C1s C-O- du CH3COCH2COOCH2CH3 97 286.3C1s C6H5X avec X= Benzoylchloride (COCl) 136 286.3C1s Oxyde 1: groupes alcools et ethers 174 286.3C1s Hydroquinone (réf:284,3 eV pour C1s) (plasma: air) 189 286.39C1s C=O 193 286.4C1s MeCH2OEt 111 286.4C1s C du à la molécule chimisorbée CO (50 at% de Cr) 212 286.4C1s dsPE-Ar-PFPH 48PE-Ar-Hg(TFA) 48 286.4C1s ds286.4C1s C-O (fluoration avec F2 sur fibre C320.00A) 117Torayca) 117(fibre286.4C1s C-O286.4C1s C-OH with a sample immersed in a room t° solution 11 286.4C1s poly (ethylene oxide) 179 286.5C1s C-O dans PEG 226 286.5C1s C-O dans PVA 226 286.5C1s CS2 -pyrite n°1- 163 286.5C1s C-O- du CH3CH2OCH2CH3 97 286.5C1s-C-O du C2 98 286.5C1s-C-O du C10 ( n ) 98 286.5C1s-C-O du C16 ( H-D) 98 286.5C1s C-O 45 286.5C1s ds PE-N (C-OH) 48 286.5C1s C6H5X avec X= Fluorobenzene (F) 136286.5C1s C6H5X avec X= Diphenylether (PhO) 136 286.5C1s C-O (fluoration avec ClF3 sur fibre C320.00A) 117 286.5C1s C-O (fluoration avec F2 sur fibre Torayca) 117 286.5C1s C-O in the TiN coatings before erosion 43 286.5C1s C*H3OH, C* de Methanol. 26 286.5C1s C-OH with a sample immersed in a 60°C solution 11 286.6C1s C-O (PETP film) 56 286.6C1s-O-C- du CH3OH 97 286.6C1s-C-O- du CH3CH2OH 97 286.6C1s C-O- du HCOOCH2CH3 97 286.6C1s C-O- du CH3COOCH2CH3 97 286.6C1s-C-O du C1 98 286.6C1s-C-O du C3 ( i ) 98 286.6C1s-C-O du C4 ( n ) 98 286.6C1s-C-O du C4 ( i ) 98 286.6C1s-C-O du C4 ( t ) 98 286.6C1s-C-O du C18 ( n ) 98 286.6C1s C-O 86 286.6C1s C-H SiO2/CaO=2 et N(Al2O3)=0,102 ou 0,25 ap bomb 27 286.6C1s C,H adsorbé par la pompe à diff d'huile. 212 286.6C1s ds PE-Ar (?) 48 286.6C1s PE-Ar-TFAA (Na+) av spectro DUPONT 650B 48 286.6C1s C6H5X avec X= Phenol (OH) 136 286.6C1s C6H5X avec X= Anisole (OCH3) 136 286.6C1s VALENCE 231 286.6C1s CH3-O-C=O-C*H-(CH2-CH2-CO=O-CH3)2, C* de Polymet. Acry 26 286.6C1s(CH3-C*H2)2-O, C* de Diethyl Ether. 26 286.7C1s MeC*H2OOCMe 111 286.7C1s C-O- du CH3COOCH(CH3)2 97 286.7C1s C-O- du CH3COOCH2CH(CH3)2 97 286.7C1s C6H5X avec X= Acetophenone (COCH3) 136 286.7C1s C-O (fluoration avec F2 sur fibre C320.00A) 117 286.8C1s CS2 111 286.8C1s-C-O du C8 (E-H) 98 286.8C1s C=O 86 286.8C1s C*-CF2 140 286.9C1s C*-CF in hexafluorobenzene (1st possibility of 2) 46 286.9C1s C-O in hexafluorobenzene (2nd possibility of 2) 46(PTFE) 90 287C1s C-CF(PE) 90 287C1s C=N287C1s C2,7F-C4,4F Csp2 couches de graphène relié à F 99 287C1s C6H5X avec X= Benzophenone (PhCO) 136 287C1s hydroxyle (plasma faible: O2) 190 287.1C1s satellite (après bomb) 212 287.2C1s-C=O du CH3COCH2COOCH2CH3 97 287.2C1s satellite 212287.2C1s Ph*-O-(C=O)-O-Ph, C* de Dimetyl Carbonate. 26 287.25C1s carboxyle (traité acide nitrique) 190 287.3C1s CS2 -pyrite n°2- 163 287.3C1s C-F liaison semi-ionique 110 287.3C1s comp. covalents (isolants) 20>C/F>3,6 110 287.3C1s C-O 27 287.3C1s C combiné avec oxygène (top phase) 248 287.3C1s R-CF-R (R:groupes non fluorés) 99 287.4C1s C-N surface Dacron-DaPr 177 287.4C1s PE après traitement par pentafluorobenzaldehyde 48 287.5C1s C relié à F par liais semi- ionique;ratio C/F<20 99 287.6C1s (C*HFCH2)n 111 287.6C1s C=O surface PET-APTES-GA 177 287.6C1s C combiné avec oxygène (bottom phase) 248 287.6C1s-C=O- ou -O-C-O- 232 287.6C1s spectre angular dependent du PE-N 48 287.6C1s CF (fluoration avec F2 sur fibre Torayca) 117 287.6C1s Oxyde 2: groupes carbonyles 174 287.7C1s Me2CO 111 287.7C1s C-N surf:PET-APTES(24H) av red par LiAlH4 177 287.7C1s C-N surf:Dacron-APTES av red par LiAlH4 177 287.7C1s ds PE-N (C=O) 48 287.7C1s ds PE-Ar (C=O) 48 287.7C1s C=O (fluoration avec F2 sur fibre C320.00A) 117 287.7C1s Oxyde 2: groupes carbonyles 174 287.8C1s PE-Ar-TFAA (Na+) av spectro PHI 548 48 287.8C1s(CH3)2-C*=O, C* d' Acetone. 26 287.9C1s C=O in pulsed benzene plasma 46 287.9C1s Fe(CO)5 111 287.9C1s-C=O du CH3COCH3 97 287.9C1s C=O surface PET-APTES-GA-cystéine 177 287.9C1s Csp2 des couches de graphène relié au F 99 287.9C1s carbon atoms in carbonyl bonds 171 288C1s (C*HFCHF)n 111 288C1s C=O 45 288C1s CF (fluoration avec ClF3 sur fibre C320.00A) 117 288C1s CNO, CNN, COO 114 288C1s carboxyle (plasma faible: O2) 190 288C1s(CH3-C*F2-CF2-CF2-CH2O)2-C=O, C* de Polycarbonate Fluo 26 288.1C1s CF in trifluorobenzene 46 288.1C1s CF in C6F6 (1st possib. of 2) (pulse-off times>90ms) 46 288.1C1s C=O in C6F6 (2nd possibility of 2) 46 288.1C1s carbone dans AlOOH boehmite 175 288.1C1s C=O ou C-N 43boehmite 175 288.1C1s AlOOH288.1C1s C=O 104288.11C1s O-C=O 193 288.15C1s C ds LiC6 81 288.2C1s C=O du Polyimide Kapton 15 288.2C1s O=C-N et C=O (PTFE) 90(PE) 90 288.2C1s N-C=O 288.2C1s C=O (fluoration avec F2 sur fibre C320.00A) 117 288.2C1s Carboxyle (plasma: O2) 190 288.25C1s C-N in Kapton(TM), polyether imide film 205 288.3C1s (Nh2)2CO 111 288.3C1s C6F6 111 288.3C1s Al (prior sputter) 175 288.3C1s C=O (PEPT film) 56 288.3C1s CO3- (plasma faible: O2) 190 288.4C1s carboneAl(OH)3 175dansbayerite 175 288.4C1s Al(OH)3288.5C1s C=O surface Dacron-DaPr 177 288.5C1s C non fluoré lié à 3 atomes de C 99 288.5C1s C-O 182 288.5C1s C=O ou C-N in the TiN coatings before erosion 43 288.6C1s MeCOONa 111 288.6C1s CS3(2-) -pyrite n°1- 163(PET) 39 288.6C1s O=C-O288.6C1s C*F-CF2 140 288.6C1s C=O dans un ester surface: control PET (UWO) 177 288.6C1s Li2CO3 ou carbonate alkyl après immersion ds DEC 51 288.6C1s Oxyde 3: groupes carboxyles et ethers 174Air) 188(plasma: 288.6C1s COOH288.6C1s carboxyle (traité acide nitrique) 190 288.7C1s-C=O du C16 ( H- D) 98 288.7C1s C1s enveloppe du ACF fluoré à 20°C 99 288.7C1s CF (fluoration avec F2 sur fibre C320.00A) 117 288.8C1s-C=O du C1 98 288.8C1s-C=O du C3 ( i ) 98 288.8C1s C combiné avec le fluor (top phase) 248 288.8C1s C=O with a sample immersed in a room t° solution 11 288.9C1s carboneAl2O3 175dansalumina 175 288.9C1s Al2O3288.9C1s comp. covalents ( isolants) C/F=4-2,7 110 288.9C1s-C=O du C2 98 288.9C1s-C=O du C4 ( n ) 98 288.9C1s-C=O du C4 ( i ) 98 288.9C1s-C=O du C4 ( t ) 98 288.9C1s-C=O du C18 ( n ) 98 288.9C1s C=O surf:PET-APTES(24H) av red par LiAlH4 177 288.9C1s C combiné avec le fluor (bottom phase) 248 288.9C1s ds PE-Ar (CO2H) 48288.9C1s CH3-O-C=O-C*H-(CH2-CH2-CO=O-CH3)2, C* de Polymet. Acry 26 288.95C1s C ds graphite 81 289C1s MeCOOEt 111 289C1s (C*HFCF2)n 111 289C1s C=O (PET : 1,8x10puis15 at d'AL/cm2) 56 289C1s O-C=O 88 289C1s-C=O du CH3COOCH2CH3 97 289C1s-C=O du C10 ( n ) 98 289C1s-C=O du C12 ( n ) 98 289C1s C=O dans PMDA T=25°C 131 289C1s COOR 232 289C1s ds PE-N (CO2H) 48 289C1s Oxyde 3: groupes carboxyles et ethers 174 289.1C1s CF in hexafluorobenzene 46 289.1C1s MeCOOH 111 289.1C1s-C=O du C8 ( E-H) 98 289.1C1s C tertiaire du groupe CF covalent 99 289.1C1s une forme de C " mal relié " au F 99 289.1C1s CF2 (fluoration avec F2 sur fibre Torayca) 117 289.2C1s Na2CO3 150 289.2C1s-C=O du CH3COOCH(CH3)2 97 289.2C1s-C=O du CH3COOCH2CH(CH3)2 97dsPMDA-ODA 130 289.2C1s carbonyl289.2C1s liais cov C-F ds VGCF(vapor grown carbon fibers) 99 289.3C1s Na2CO3 111 289.3C1s C=O (PET : 7x10puis15 at d'AL/cm2) 56 289.3C1s-C=O du HCOOCH2CH3 97 289.3C1s1er composé ds les fibres fluorés à 100°C 99 289.3C1s satellite (C ds carbonate ou CO) surf non bomb 212 289.4C1s CF (fluoration avec F2 sur fibre C320.00A) 117 289.6C1s carbonate pour surfaces des feuilles de Li métal 51 289.6C1s carbonate après immersion ds DEC(LiPF6) 51 289.6C1s CF2 (fluoration avec ClF3 sur fibre C320.00A) 117 289.6C1s carboxyle (plasma O2, nettoyage Ar) 190 289.8C1s NaHCO3 111 289.8C1s -(C*F2-CH2)-n 245 289.8C1s C ds les fibres fluorés à 200°C 99 289.8C1s C ds CO3(2-) 216 290C1s R-CF3 99 290C1s CO3- (plasma: O2) 190 290C1s CO3- (traité acide nitrique) 190 290.1C1s CF2 (fluoration avec F2 sur fibre C320.00A) 117 290.1C1s interband plasmon in case of NaOxCy 159 290.2C1s Co 111 290.2C1s comp. covalents (isolants) C/F=2 110(PTFE) 90 290.2C1s C-F290.2C1s CO3(2-) 141 290.26C1s C13H28, ionization energy 38 290.27C1s C10H22, ionization energy 38 290.3C1s (C*F2CH2)n 111 290.3C1s cyclo-Hexane 137 290.31C1s C8H18, ionization energy 38 290.33C1s n-Decane 137 290.36C1s C6H14, ionization energy 38 290.4C1s C-F liaison covalente 110 290.4C1s comp. covalents (isolants) C/F=1 110 290.42C1s C5H12, ionization energy 38(DIA) 91 290.45C1s diamant290.45C1s n-Hexane 137 290.48C1s C4H10, ionization energy 38 290.5C1s CF2 in trifluorobenzene 46 290.5C1s -(C*F2-CF2)-n 245 290.5C1s C*F-CF3 140 290.5C1s C-N surface PET-APTES-GA 177 290.51C1s n-Pentane 137 290.57C1s C3H8, ionization energy 38 290.59C1s n-Butane 137 290.6C1s(triple liais CF) ds fluorographites (CF)n ,(C2F)n 99 290.6C1s groupes CF des unités polyalicycliques perfluorés 99 290.6C1s Oxide 4: groupes carbonates 174 290.66C1s Propane 137 290.7C1s Oxide 4: groupes carbonates 174 290.7C1s Ph-O-(C*=O)-O-Ph, C* de Dimetyl Carbonate. 26 290.7C1s(CH3-C*F2-CF2-CF2-CH2O)2-C=O, C* de Polycarbonate Fluo 26 290.71C1s C2H6, ionization energy 38 290.79C1s Ethane 137 290.83C1s CH4, ionization energy 38 290.9C1s Méthane 137 291.1C1s (C*F2CHF)n 111 291.1C1s CF2 (fluoration avec F2 sur fibre C320.00A) 117 291.3C1s CF2 in hexafluorobenzene 46 291.3C1s CF3 (fluoration avec ClF3 sur fibre C320.00A) 117 291.4C1s pi-pi* shake.-up sat. (in C6H6) (pulse-off times>90ms) 46 291.4C1s(CH3-C*F2-CF2-CF2-CH2O)2-C=O, C* de Polycarbonate Fluo 26 291.5C1s(CH3-C*F2-CF2-CF2-CH2O)2-C=O, C* de Polycarbonate Fluo 26 291.5C1s(CH3-C*F2-CF2-CF2-CH2O)2-C=O, C* de Polycarbonate Fluo 26 291.6C1s C-F 248 291.6C1s CF2 ds PTFE non traité 99 291.7C1s CO2 150 291.7C1s CO2 111 291.8C1s (CF2)n 111 291.8C1s CF3 (fluoration avec F2 sur fibre C320.00A) 117291.8C1s interband plasmon in case of MC24 159 291.9C1s C*F3COONa 111 292.2C1s CCl4 150 292.2C1s CCl4 111(PTFE) 90 292.2C1s CF2292.3C1s C*F3COMe 111 292.4C1s CF2CF2 150 292.5C1s C-H pour verre 0,65SiO2-0,09Al2O3-0,26CaO à1400° C 27 292.7C1s C*F3COOEt 111 292.7C1s C-F surface PET-APTES-TFAA 177 292.8C1s CF3 (fluoration avec F2 sur fibre C320.00A) 117 292.9C1s CF3 in trifluorobenzene 46 292.9C1s C-H pour verre 0,65SiO2-0,09Al2O3-0,26CaO à1300° C 27 292.9C1s C-H pour verre 0,65SiO2-0,09Al2O3-0,26CaO à1500° C 27 292.9C1s groupes CF2 et CF3 99 293.1C1s C6H5X avec X= Benzotrifluoride (CF3) 136 293.4C1s CF3 in hexafluorobenzene 46 294.1C1s pi-pi* sh.-up sat. (in C6H3F3) (pulse-off times=990ms) 46 295.3C1s pi-pi* shake.-up sat. (in C6F6) (pulse-off times>90ms) 46。

S的电子结合能

XPS_DatabaseS的电子结合能：Energy (eV) Element Chemical bonding Ref 2478.5S1s H2S243243 2483.7S1s SO2243 2490.1S1s SF6S的电子结合能：Energy (eV) Element Chemical bonding Ref 161.5S2p NiS, Ni foil polishing and Ar+ etching+H2S 400°C/1h 101 161.6S2p NiS, Ni foil polishing + in H2O/28h+H2S 400°C/1h 101 161.6S2p NiS, Ni foil Polish+Ar+,O2 oxydations/T°C+H2S 400°C/1h 101 161.8S2p(S)2- in Co foil polish- Ar+ etch, +H2S -400°C/2h 101 162.9S2p(S2)2- or SH -Co foil polish- Ar+ etch, +H2S -400°C/2h 101 163S2p(S2)2-, Ni Polish +Ar+O2 oxydations/T°C+H2S 400°C/1h 101 163.1S2p(S2)2-, Ni foil polishing and Ar+ etching+H2S 400°C/1h 101 163.1S2p(S2)2-, Ni foil polish+ in H2o/28h+H2S 400°C/1h 101S的电子结合能：Energy (eV) Element Chemical bonding Ref 107.3S2p3/2 PbS 89 160S2p3/2 sulphides 186-air3'- 89 160.3S2p3/2 PbS160.5S2p3/2 PbS 111 160.55S2p3/2PbS - H2O 19j- 89 160.55S2p3/2 PbS 89 160.7S2p3/2 p-NaSC6H4NO2 111 160.7S2p3/2vieillissement à l'air de la galène pdt 3mn 89 160.9S2p3/2PbS -air 220j- 89 160.95S2p3/2vieillissement à l'eau de la galène pdt 19j 89 161S2p3/2 FeS 111 161.2S2p3/2 KFeS2 111 161.2S2p3/2RSNa ou RSK 245 161.2S2p3/2 S(2-)monosulfide 2343'- 89-air 161.25S2p3/2 CuFeS2161.3S2p3/2 CuFeS2 89 161.3S2p3/2vieillissement à l'air de la galène pdt 220j 89 161.4S2p3/2 Na2SSO3 111 161.4S2p3/2 Ni(SPh)2(dppe) 235 161.5S2p3/2 ZnS 150 161.5S2p3/2 Na2S 111 161.5S2p3/2 CuFeS23j- 89-air 161.5S2p3/2S (ads) / Mo(110) - S strongly bound 103 161.6S2p3/2CuFeS2 - H2O 22j- 89 161.6S2p3/2 Mo(NO)(S2CN(C2H5)2)3 235161.65 S2p3/2 CuFeS2 89161.7 S2p3/2 PhNHCSNHPh 111161.7 S2p3/2 CuFeS2 -air 220j- 89161.7 S2p3/2 Pd(SPh)2(dppe) 235161.8 S2p3/2 WS2 111161.8 S2p3/2 S(-II) 58161.8 S2p3/2 Pt(SPh)2(dppe) 235161.85 S2p3/2 Cu2S 89161.9 S2p3/2 NaS*C(S)NR2 245161.9 S2p3/2 S*SO3(-) 245161.9 S2p3/2 Ni(SCH2CH2S)(dppe) 235161.95 S2p3/2 vieillissement à l'air de la spharelite pdt 3 mn 89162 S2p3/2 Thiourée 195162 S2p3/2 Rh2(O2CH)4(tu)2 195162 S2p3/2 Rh2(O2CCH3)4(tu)2 195162 S2p3/2 PhSCMe3 111162 S2p3/2 gpts (S2SO3)2- 2eme pic 89162 S2p3/2 S2- 245162.05 S2p3/2 vieillissement à l'eau de la spharelite pdt 19j 89162.1 S2p3/2 NiCl2(tu)4 195162.1 S2p3/2 AgCl(tu)2 195162.1 S2p3/2 MoS2 111162.1 S2p3/2 Ph3PS 111162.1 S2p3/2 S2(2-) disulfide 234162.1 S2p3/2 ZnS 89162.1 S2p3/2 Pt(SPh)2(CyNC)2 235162.15 S2p3/2 vieillissement à l'air de la spharelite pdt 220j 89162.2 S2p3/2 Rh2(O2CC6H5)4(tu)2 195162.2 S2p3/2 Fe2S 61162.2 S2p3/2 Fe(S2CN(C2H5)2)2 235162.2 S2p3/2 Fe(NO)I(S2CN(C2H5)2)2 235162.2 S2p3/2 Mo(NO)2(S2CN(C2H5)2)2 235162.25 S2p3/2 Cu2S 89162.3 S2p3/2 Na2 S2O3 (peripheral S) 150162.3 S2p3/2 CuCl(tu)3 195162.4 S2p3/2 CS2 150162.4 S2p3/2 [Pr4N]ReCl5(tu) 195162.4 S2p3/2 CoBr2(tu)2 195162.4 S2p3/2 Co(NCS)2(tu)2 195162.4 S2p3/2 Ni(NO3)2(tu)6 195162.4 S2p3/2 Soufre sur alliage 600 70162.4 S2p3/2 Fe(NO)(S2CN(CH3)2)2 235162.4 S2p3/2 NiWS2 243162.5 S2p3/2 CoCl2(tu)2 195162.5 S2p3/2 Co(NO3)2(tu)4 195162.5S2p3/2 Ni(NCS)2(tu)2 195162.5S2p3/2Na2S2O3 (peripheral S) 111 162.5S2p3/2 CuS 89 162.5S2p3/2FeS2 -air 220j - 89 162.5S2p3/2 sulphides 186 162.5S2p3/2S (élément naturel) 147 162.5S2p3/2 Co(S2CN(CH3)2)3 235 162.5S2p3/2 (Ni(SCH2CH2S))n 235 162.5S2p3/2 Ni(SCH2CH2S)(PMe2Ph)2 235 162.6S2p3/2 NiS 150 162.6S2p3/2 WS2 150 162.6S2p3/2 [Rh(tu)6]Cl(NO3)2 195 162.6S2p3/2 [Cu(BF4)(tu)3]2 195 162.6S2p3/2 NiWS2 111(S)2- 89 162.6S2p3/2 FeS2162.6S2p3/2FeS2 - H2O 22j- 89 162.6S2p3/2FeS2 disulfide (2-) 239 162.6S2p3/2 ((C6H5)4P)(Fe(NO)(S2C2(CN)2)2) 235 162.6S2p3/2 Pt(S2C2(CN)2)(PPh3)2 235 162.6S2p3/2 (NH4)(Fe4S3(NO)7) 235 162.6S2p3/2 WS2 243 162.65S2p3/2FeS2 -air 3'- 89 162.65S2p3/2 CuS 89 162.7S2p3/2 [Rh(tu)5Cl]Cl2 195 162.7S2p3/2 tetrahydrothiophene 111n°1- 163 162.7S2p3/2 FeS2-pyrite 162.7S2p3/2 Pt(S2C2(CN)2)(CNCH3)2 235 162.7S2p3/2 Ni(SPh)2(CyNC)2 235 162.8S2p3/2 RhCl3(tu)3 195 162.8S2p3/2 WS2 111 162.8S2p3/2 NiS 111 162.8S2p3/2FeS2 -air 30j- 89 162.8S2p3/2MoS3 - species S2(II) 103 162.8S2p3/2 (Ni(SPh)2)n 235 162.8S2p3/2 Ni(SPh)2(PMe2Ph)2 235 162.8S2p3/2 Pd(SPh)2(CyNC)2 235 162.9S2p3/2 PhSH 111n°2- 163 162.9S2p3/2 FeS2-pyritepolysulfide 234 162.9S2p3/2 S(2-)n162.9S2p3/2 Methionine 235 162.9S2p3/2 Co(Met)2 235 162.9S2p3/2 Ni(Met)2 235 162.9S2p3/2 Cu(Met)2 235 162.9S2p3/2 Zn(Met)2 235 163S2p3/2 Ph2S 111 163S2p3/2 Mo2O4(S2CN(C2H5)2)2 235 163.1S2p3/2 FeS2 89163.2S2p3/2 Ni(S2C2(C6H5)2)2 235 163.3S2p3/2 (Pd(SPh)2)n 235 163.4S2p3/2 Fe(S2C2(C6H5)2)2 235 163.4S2p3/2 (Pt(SPh)2)n 235 163.4S2p3/2 (Fe(SCH3)(CO)3)2 235 163.4S2p3/2 (Fe(SC2H5)(NO)2)2 235 163.6S2p3/2 CS2 111 163.6S2p3/2 (Ru(CS2)Cl(PPh3)3)Cl 235 163.7S2p3/2 PhSSPh 111 163.7S2p3/2 S8 111 163.7S2p3/2 RSSR 245Sulfur. 26 163.7S2p3/2 S-C,163.8S2p3/2 Sn 111 163.8S2p3/2 RSH 245 163.9S2p3/2 thiophene 111 163.9S2p3/2gpts (S4O6)2- 2eme pic 89 164S2p3/2 S=C=S 245 164S2p3/2 RS*SO3- 245 164.05S2p3/2 S 150 164.1S2p3/2 RS*S(O)R 245 164.1S2p3/2 RS*SO2R 245 164.1S2p3/2 R2NS*NR2 245 164.1S2p3/2 RSCl 245 164.1S2p3/2 Pt(MetH)Cl2 235 164.2S2p3/2 S2N2 111 164.2S2p3/2 S8 245élémentaire 61 164.2S2p3/2 S164.2S2p3/2 S6 186 164.25S2p3/2 S(s) 111thiophen 245 164.3S2p3/2 S164.3S2p3/2 S° 89 165S2p3/2 RSOR 245 165.3S2p3/2 Sn(CH3)2Cl2(dmso)2 195 165.3S2p3/2Sn -pyrite n°1- 163((CH3)2S=O) 195 165.5S2p3/2 DMSO165.5S2p3/2 Me3SI 111 165.5S2p3/2 O2NC6H4SO2Na 111 165.6S2p3/2 CuCl2(dmso)2 195 165.7S2p3/2 Ph2SO 111 165.7S2p3/2 BzMeSO 111 165.9S2p3/2 NiCl2(dmso)3 195 165.9S2p3/2 CoCl2(dmso)3 195 165.9S2p3/2Sn ? -pyrite n°2- 163 166S2p3/2 MnCl2(dmso)3 195 166S2p3/2 CdCl2(dmso) 195 166S2p3/2 [Pd(dmso)4](BF4)2 195166S2p3/2 PhSO2Na 111 166S2p3/2 RSO2- 245 166.1S2p3/2 Co(NH3)4(SO3)(CN) 195 166.1S2p3/2 NH4[Co(NH3)4(SO3)2] 195 166.1S2p3/2 Na2SO3 111 166.1S2p3/2 RS(O)R 245 166.1S2p3/2 RS*(O)SR 245 166.2S2p3/2 SnCl2(dmso)2 195 166.2S2p3/2 FeCl3(dmso)2 195 166.3S2p3/2 ZnCl2(dmso)2 195SO3 150 166.4S2p3/2 Na2166.4S2p3/2 NH4[Co(en)(NH3)2(SO3)2] 195 166.4S2p3/2 PdCl2(dmso)2 195 166.4S2p3/2 SnCl4(dmso)2 195 166.4S2p3/2S oxyde type sulfite 61 166.5S2p3/2 HgCl2(dmso) 195 166.5S2p3/2 PtCl2(dmso)2 195 166.6S2p3/2 AlCl3(dmso)6 195 166.6S2p3/2 Na2SO3 111 166.7S2p3/2 SO3(2-) 245 166.7S2p3/2 Ir(SO2)(CO)Cl(PPh3)2 235 166.8S2p3/2 [Pd(dmso)4](BF4)2 195 166.9S2p3/2NaRh(NH3)4(SO3)2 . H2O 195 166.9S2p3/2 RhCl3(dmso)3 195 167S2p3/2 RS(O)OR 245 167.2S2p3/2 SO2 150 167.2S2p3/2K3Rh(SO3)3 . 2 H2O 195 167.4S2p3/2 Na2SSO3 111 167.4S2p3/2 SO2 111 167.4S2p3/2 SO4(-II) 58 167.5S2p3/2 RSO2R 245 167.5S2p3/2 (-)S*O3S(-) 245 167.7S2p3/2 BzMeSO2 111 167.8S2p3/2 SO2 111 167.9S2p3/2 PhSO3Na 111 168S2p3/2 p-H2NC6H4SO2NH2 111 168S2p3/2 RSO3- 245 168.1S2p3/2 PhSO3Me 111 168.1S2p3/2gpts (S2SO3)2- 1er pic 89 168.1S2p3/2 RS*O2SR 245 168.1S2p3/2 RS*O2NR2 245 168.1S2p3/2 SO2 245 168.1S2p3/2 SOCl2 245 168.2S2p3/2Cu(bipy)SO4 . 2 H2O 195 168.2S2p3/2gpts ( S4O6)2- 1er pic 89 168.3S2p3/2 Na2SO4 111168.3S2p3/2 FeSO4 111 168.4S2p3/2Na2 S2O3 (central S) 150 168.5S2p3/2Cu(en)2SO4 . H2O 195 168.5S2p3/2 RSO2OR 245 168.5S2p3/2 RSO2Cl 245 168.5S2p3/2 sulphates 186 168.6S2p3/2Na2S2O3 (central S) 111(SO4)2- 89 168.7S2p3/2 gpts168.7S2p3/2SO4(2-) -pyrite n°1- 163 168.8S2p3/2 Fe2(SO4)3 111 168.9S2p3/2 CuSO4 150SO4 150 168.9S2p3/2 Na2168.9S2p3/2 (-)SO3SR 245 169S2p3/2 CoSO4 195 169S2p3/2Cu(bipy)3SO4 . 7 H2O 195 169S2p3/2 SO4(2-) 245 169S2p3/2S dans SO4(-II) 183 169.1S2p3/2 CuSO4 111 169.1S2p3/2SO4(2-) -pyrite n°2- 163 169.4S2p3/2Cu(en)SO4 . H2O 195 169.5S2p3/2CuSO4 . 5 H2O 195 169.5S2p3/2 sulphates 186 169.8S2p3/2 RSO2OR 245 170S2p3/2 CS2 243(g) 111170.03S2p3/2 CS2170.2S2p3/2 H2S 111 170.2S2p3/2 RSO2F 245 170.2S2p3/2 H2S 243 170.3S2p3/2 CuSO4 195 170.3S2p3/2satellites -pyrite n°1- 163(g) 111170.44S2p3/2 H2S170.6S2p3/2 Cr2(SO4)3 186 170.8S2p3/2 COS 111 170.8S2p3/2 COS 243 172.2S2p3/2satellite -pyrite n°2- 163 174.2S2p3/2 SF6 150 174.4S2p3/2 SF6 111(g) 111174.8S2p3/2 SO2174.8S2p3/2 SO2 243 180.3S2p3/2 SF6(g) 111 180.4S2p3/2 SF6 243S的电子结合能：Energy (eV) Element Chemical bonding Ref 224.7S2s PbS89 224.7S2s PbS -air 3'- 89224.9S2s PbS -air 220j- 89 225.1S2s vieillissement à l'air de la galène pdt 3mn 89 225.3S2s vieillissement à l'air de la galène pdt 220j 89 225.3S2s vieillissement à l'eau de la galène pdt 19j 89 227.5S2s S -Fe /19Cr /9Ni /2.5Mo- 138 232.4S2s SO4 (2-) -Fe /19Cr /9Ni /2.5Mo- 138。

N的电子结合能

XPS_DatabaseN1s的电子结合能：Energy (eV) Element Chemical bonding Ref 395.7N1s N-C 43 396N1s in the passive film and in the bulk 84 396N1s TiN 47 396.1N1s N-C in the TiN coatings before erosion 43 396.2N1s N bonded in AlN, Energy N2+=75,100,300,1000 eV, IAD 139175cristal 396.3N1s AlN225 396.3N1s Cr-N 396.3N1s N bonded in AlN, Energy N2+=500 eV, IAD 139 396.4N1s CrN225powder 94 396.4N1s As-receivedAlN 396.4N1s AlN/PVB binder burnout in air 94 396.4N1s AlN/PVB binder burnout in nitrogen 94 396.4N1s AlN/PPC binder burnout in air 94 396.4N1s AlN/PPC binder burnout in nitrogen 94194 396.4N1s AlN 396.5N1s N bonded in AlN, Magnetron, N2,N2+ Ar 139150 396.6N1s CrN197 396.6N1s TiN 396.6N1s Cr traité au NaNO3 17 396.6N1s Fe traité au NaNO3 17 396.6N1s N ds Fe13 (nitré) 218 396.7N1s N-Ti 43 396.8N1s N:Ti 31208 396.8N1s N:Ti 396.8N1s N ds CrN 55148W/TiN 396.9N1s Interface396.9N1s Interface TiN/SiO2 (=> TiN) 148 396.9N1s TiN(100) using a photon energy between 440 and 470 eV 180 396.9N1s SS304 traité au NaNO3 17 396.9N1s interface W/TiN après bomb (275 min) 148 396.9N1s interface TiN/SiO2 après bomb (750 min) TiN pur 148 396.9N1s structure W/TiN/Si (Wpur) après bomb (525 min) 148 397N1s Mo traité au NaNO3 17 397N1s904L traité au NaNO3 17 397N1s AL6X traité au NaNO3 17 397N1s Nads 76 397N1s CrN in alloy 24 after sputtering the passive film 116 397N1s CrN in alloy 33 after sputtering the passive film 116O0.17 31 397.1N1s TiN0.54O0.08 31 397.1N1s TiN0.63397.1N1s TiN0.75 31208 397.1N1s TiN0,75397.1N1s N-Ti in the TiN coatings before and after erosion 43O0.44 31 397.2N1s TiN0.31397.2N1s implantation de N dans SS304 225 397.2N1s TiN0,31O0,44208 397.2N1s Nads sur l'acier de type 304 N 92 397.2N1s N ds 304 ss nitré 218 397.2N1s N ds l'acier 304 (nitré) 55 397.3N1s TiN0.09O0.74 31 397.3N1s TiN 10111 397.3N1s WN 397.4N1s Ni traité au NaNO3 17 397.4N1s N ds Cr2N 55 397.4N1s related to the NSi3 environment 213150 397.5N1s Si3N4 397.5N1s K4Fe(CN)6111 397.5N1s TiN(100) using a photon energy between 440 and 470 eV 180 397.5N1s N ds PMDA-ODA T=250°C av 0,16 nm de Cr(faible nrj) 131 397.5N1s N ds PMDA-ODA T=250°C av 1,0 nm de Cr(Cr-nitride) 131225 397.6N1s Cr2N 397.7N1s large pic après bombardement (5 min) 182192 397.7N1s nitride111 397.8N1s NaSCN 397.8N1s nitride 57 397.9N1s C-N, pyridinic N in PVCA treated at 573, 873 and 1173K 42 397.9N1s C-N, pyridinic N in chars (1223K) 149150 397.9N1s BN111 397.9N1s BN240 397.9N1s (a,a'-dipyridyl)Mo(CO)4111 398N1s phthalocyanine 398N1s NHads 76 398N1s ds le 304 ss avec N2 implanté 218 398.1N1s Graphene N (into the conjug. struct. of graphene mlcl) 71111 398.1N1s KCN240 398.1N1s (a,a'-dipyridyl)Mo(CO)3(P(OPh)3)182pic 398.3N1s large 398.3N1sà une profondeur de 0,5 nm 84 398.3N1s-N= in a cyclic structure 158240 398.4N1s (a,a'-dipyridyl)Mo(CO)3(P(O(n-Bu))3) 398.5N1s BN à 1.6ev FWHM 164150 398.6N1s NH3 398.6N1s BuNH2111111 398.6N1s pyridine 398.6N1s amine ou pyridine du Polyimide Kapton 15111 398.7N1s S2N2111 398.7N1s NaN3240 398.7N1s (o-phenanthroline)Mo(CO)4398.8N1s C-N-Cu in [Cu(H2daaen)] 166 398.8N1sà une profondeur de 0,5 nm 84 398.8N1s free N in interstitial sites, Energy N2+= 75 eV, IAD 139 398.9N1s C-N, pyridinic N in initial resin 149 398.9N1s N ds NH2 surf PET-APTES(24H) av red par LiAlH4 177 398.9N1s plasma: NH3 et N2 188188 398.9N1s -C=NH 398.9N1s Plasma: NH3 + N2 / réf: 284,3 eV pour C1s 189111 399N1s PhCN 399N1s AlN (N a été remplacé par O) 175 399N1s N ds PMDA-ODA T=250°C av 0,16 nm de Cr 131131 399N1s Cr-NO2/Ar/NH3122 399N1s plasma:111 399.1N1s tetracyanoquinodimethane188 399.1N1s PhNH2114C-NH-C 399.1N1s R-C=NH;122O2/NH3 399.1N1s plasma:399.1N1s AlN (N-O bond) 194111 399.2N1s PhNH2111 399.2N1s H2N*C6H4NO2 399.2N1s NO- in 316L before sputtering the passive film 116 399.2N1s NO- in 316L after sputtering the passive film 116 399.2N1s NO- in alloy 24 before sputtering the passive film 116 399.2N1s NO- in alloy 33 before sputtering the passive film 116240 399.2N1s (N,N,N',N'-tetramethylethylenediamine)Mo(CO)4111 399.3N1s H2NSO2C6N4NO2114N 399.3N1s Aromatic 399.3N1s Nitrogen in an NH2 state 213 399.4N1s C-N, pyrrolidonic N in PVPO treated at 573K 42 399.4N1s C-N, pyridinic N in PVPI treated at 573, 873 and 1173K 42 399.4N1s N at surface of SS304 225 399.4N1s N For N2/Ni(100) 64111 399.5N1s guanidineHCl104 399.5N1s N-C114 399.5N1s R-NH2 399.5N1s N at surface 84Ar/NH3122 399.5N1s plasma:399.6N1s CN in H4daaen 166 399.6N1s N-O 43 399.6N1s N-C-O177114 399.6N1s R-CN 399.7N1s PhNHCSNHPh111 399.7N1s Ni traité à NH3 17 399.7N1s SS304 traité à NH3 17 399.7N1s phi-NH2114surface 84 399.7N1s en399.7 N1s NH amide group 171399.8 N1s Conjugated N (C=N type, not in graphene molecules) 71399.8 N1s Fe traité à NH3 17399.8 N1s AL6X 17399.8 N1s NH3 sur l'acier de type 304 N 92399.8 N1s NH3 57399.8 N1s O=C-NH-(C,H) 114399.8 N1s -NH2 (-NH) 158399.81 N1s C-N in Kapton(TM), polyether imide film 205399.9 N1s 3ary amine (red° under X-ray beam) in initial resin 149399.9 N1s PhNNPh 111399.9 N1s Co(NH3)8Cl3 111399.9 N1s Mo treated with NH3 17399.9 N1s 317LX treated with à NH3 17400 N1s phthalocyanine 111400 N1s adsorption de N2,NH3, NH3 sur SS304 225400 N1s N2H4ads 76400 N1s N Ox fretted (5V for 5 min) in blood serum 207400 N1s N ds Fe13 (adsorbé) 218400 N1s N-O in the TiN coatings before and after erosion 43400.1 N1s C-N, pyridone in chars (1223K) 149400.1 N1s Na2N2O2 111400.1 N1s ds PE-Ar et PE-N (groupe organique nitrogène) 48400.2 N1s C-N, 2ndary prod. of PVPO treated at 573 and 873K 42400.2 N1s C-N, pyrrolic N in PVPO treated at 1173K 42400.2 N1s N-H ou N-O 192400.3 N1s C-N, pyrrolic N in PVCA treated at 573, 873 and 1173K 42400.3 N1s N Ox, 316 L alloy fretted (30 min) in blood serum 207400.3 N1s Plasma: NH3 + N2 / réf: 284,3 eV pour C1s 189400.4 N1s C-N, pyridonic N in PVPI treated at 573, 873 and 1173K 42400.4 N1s C-N du Polyimide Kapton 15400.4 N1s plasma: NH3 et N2 188400.4 N1s groupe aliphatique 188400.5 N1s N Ox in 316 L alloy dipped in blood serum 1h 207400.5 N1s N Ox"corrosion products" after fretted in blood 207400.7 N1s C-N-H in [Eu(H2daaen)] 166400.7 N1s C-N, quaternary N in PVPI treated at 1173K 42400.7 N1s N ds NH3+ surf PET-APTES(24H) av red par LiAlH4 177400.7 N1s N For N2/Ni(100) 64400.8 N1s C-N-Cu in [CuEu(daaen)] 166400.8 N1s N ds PMDA-ODA 130400.8 N1s PE après 5 min d'expo au plasma nitrogène 48400.9 N1s N incorp. in the condensed struct. units : chars 1223K 149400.9 N1s H3N+CHRCOO- 111400.9 N1s NH4NO3 111401N1s EtNH3Cl 111401N1s NO ( - delta ) ads 76 401.1N1s C-N, quaternary N in PVCA treated at 1173K 42111 401.1N1s Me4NBr 401.1N1s PE-N après protonation avec H2SO4(0,1M) 48 401.1N1s NH4+ in 316L before sputtering the passive film 116 401.1N1s NH4+ in 316L after sputtering the passive film 116 401.1N1s NH4+ in alloy 24 before sputtering the passive film 116 401.1N1s NH4+ in alloy 33 before sputtering the passive film 116 401.2N1s NH4+ in alloy 24 after sputtering the passive film 116 401.2N1s NH4+ in alloy 33 after sputtering the passive film 116 401.3N1s C-N, quaternary N in PVPO treated at 1173K 42PE-Ar-PFB 48 401.3N1s ds401.3N1s dsPE-Ar-TFE 48158 401.3N1s "oxidizedN"111 401.4N1s (NH3OH)+Cl-PE-Ar-PFPH 48 401.4N1s ds150 401.5N1s NH4Cl 401.5N1s amino-sulfate -pyrite n°1- 163114 401.5N1s C-N+111 401.6N1s p-NH3+C6H4SO3-PE-Ar 48 401.6N1s ds401.7N1s N-methyl pyridinium in initial resin 149150 401.7N1s NH4NO3 401.7N1s NH4+ sur l'acier de type 304 N 92111 401.8N1s N2H6SO4 402N1s Pyridine-N-oxyde in chars 149 402N1s chloranil-pyridine111 402N1s amino-sulfate -pyrite n°2- 163192 402N1s NH4+ 402.1N1s Me4NCl111in PVPI treated at 1173K 42 402.4N1s C-N,pyridine-N-oxyde402.7N1s N2 peak, Energy N2+= 75 eV, IAD 139111 402.8N1s Me3NO 402.8N1s plasma: NH3 et N2 188 402.8N1s Plasma: NH3 + N2 / réf: 284,3 eV pour C1s 189111 403N1s NaN3 403N1s AlN (N a été remplacé par O, Air 100°C) 175 403N1s N2 peak, Energy N2+= 1000 eV, IAD 139 403.1N1s Shake-up satellites (pi-pi*) (entrapped NOx) 149111 403.2N1s NaNO2 403.2N1s PE après traitement par pentafluorobenzaldehyde 48 403.6N1s C-N, pyridine-N-oxyde in PVPO treated at 873 and 1173K 42150 403.6N1s NaNO2 403.7N1s N2 peak, Energy N2+= 100,300 eV, IAD 139 403.8N1s N2 peak, Energy N2+= 500 eV, IAD 139 404.1N1s Shake-up satellites (pi-pi*) (entrapped NOx) 149111 404.3N1s AmONO 405N1s Al oxynitride, dans l'air t°>700°C 175 405.5N1s NO2114111 405.7N1s PhNO2 406N1s MeNO2111111 406N1s NH4NO3 406N1s NO ( + delta ) ads 76 406.2N1s NO3- in 316L after sputtering the passive film 116 406.2N1s NO3- in alloy 24 before sputtering the passive film 116 406.2N1s NO3- in alloy 33 before sputtering the passive film 116 406.2N1s NO3- in alloy after sputtering the passive film 116 406.2N1s NO3- in alloy after sputtering the passive film 116150 407.1N1s NaNO3 407.3N1s NaNO3111147 409.9N1s élémentnaturel。

结合能高的原因构象

结合能高的原因构象结合能高的原因，X射线光电子能谱技术是一种检测表面信息的无损检测技术。

可以通过测定电子结合能来分析化学键成键情况和元素价态等化学信息。

XPS能够检测元素的不同化学状态，通常认为当原子失去电子的时候（即元素处于高价状态），轨道上电子的结合能会增加，表现在XPS谱峰上，就是图谱会向高结合能端偏移；相反，当原子得到电子的时候（处于负价态），轨道电子的结合能会降低。

O2-离子是2p轨道完全填满电子的状态，是最稳定的状态，所以当一个电子转移走了之后（即出现了一个空穴，此时O2-应该变成了O-），那么O- 2p的结合能与O2-相比一定是升高的，因为原子核对和外的所有电子的束缚都加强了，包括1s和2s电子。

当然，和O的自由状态（所谓的0价）相比，结合能仍然要低一些，因为此时有一个电子向着O转移过来了，原子核对核外电子的束缚下降了。

故在文献中，我们常常能看到自由氧、氧空位、吸附氧的结合能是依次增加的。

并不是所有的元素都遵循这个准则，我们看看都有哪些元素离经叛道呢？我们从标准手册Ba元素的结合能分布看，Ba的化合物的结合能低于单质的结合能，和我们上述的理论就不一致了，这是为什么呢？这就要从Ba的外层电子排布说起基于Ba的外层电子分布我们可以看到最外层是6s2的两个电子，按照当Ba 的周围电负性的原子或原子团（如S、O、Cl、F或其他酸根、氢氧根）存在的时候，这两个电子就很容易被这些原子或原子团俘获了，特殊情况出现了——这时候的Ba的电子结构反而非常像氙（Xe）元素，最外层是稳定的8个电子，所以内壳层的3d电子的结合能不升反降了。

但是当电负性的基团的电负性过于强烈的时候，还是会导致3d电子的结合能升高的，例如硝酸根和硫酸根等。

查看NIST数据库里面的数据，会发现超过780.6eV（Ba）的那些化合物，基本上都是含有硝酸根（NO3-）、硫酸根（SO42-）、高氯酸根（ClO4-）等，另外过氧化物（BaO2）也是一样。

1、下载文档前请自行甄别文档内容的完整性，平台不提供额外的编辑、内容补充、找答案等附加服务。
2、"仅部分预览"的文档,不可在线预览部分如存在完整性等问题,可反馈申请退款(可完整预览的文档不适用该条件!)。
3、如文档侵犯您的权益，请联系客服反馈,我们会尽快为您处理(人工客服工作时间：9:00-18:30)。

XPS_DatabaseZn的电子结合能：Energy (eV) Element Chemical bonding Ref 1045Zn2p1/2Cu Zn alpha, béta 178178 1045.1Zn2p1/2 ZnO1045.9Zn2p1/2 ZnI2 621046.2Zn2p1/2 ZnCl2 621046.4Zn2p1/2 ZnBr2 62 Zn的电子结合能：Energy (eV) Element Chemical bonding Ref88.4Zn2p3/2Cu Zn alpha, béta 1781020.7Zn2p3/2 ZnP2 150 1021.2Zn2p3/2 Zn 111 1021.4Zn2p3/2 ZnTe 150 1021.4Zn2p3/2 ZnS 150acethylacetonate 111 1021.4Zn2p3/2 Zn1021.4Zn2p3/2 ZnO 157 1021.5Zn2p3/2 ZnAl2O4 150 1021.6Zn2p3/2 ZnF2 150 1021.6Zn2p3/2 ZnO 111 1021.6Zn2p3/2 ZnTe 111 1021.6Zn2p3/2ZnO ds P2O5 ZnO/P2O5 = 1.2 molar 252 1021.6Zn2p3/2 Zn(Met)2 235 1021.62Zn2p3/2 Zn 150 1021.8Zn2p3/2 ZnSe 150 1021.9Zn2p3/2 ZnO 150 1021.9Zn2p3/2 ZnS 111 1021.9Zn2p3/2 Zn 111 1021.9Zn2p3/2hemimorphite (Zn silicate) 111 1022Zn2p3/2 ZnSe 111 1022Zn2p3/2Cu Zn alpha, béta 178 1022Zn2p3/2élément naturel (liaison métallique) 147 1022.1Zn2p3/2 ZnO 178 1022.2Zn2p3/2 ZnF2 111 1022.2Zn2p3/2 ZnO 111 1022.2Zn2p3/2ZnO ds P2O5 ZnO/P2O5 = 0.4 molar 252 1022.3Zn2p3/2 ZnI2 150 1022.3Zn2p3/2ZnO ds P2O5 ZnO/P2O5 = 1 molar 252 1022.4Zn2p3/2ZnO ds P2O5 ZnO/P2O5 = 1,5 molar 252 1022.4Zn2p3/2ZnO ds P2O5 ZnO/P2O5 = 2 molar 252 1022.8Zn2p3/2 ZnSO4 150 1022.8Zn2p3/2 ZnI2 111 1023Zn2p3/2 ZnBr2 111 1023Zn2p3/2 ZnCl2 621023Zn2p3/2 ZnI2 62 1023.3Zn2p3/2 Zn(C24H27N7)(PF6)2 111 1023.3Zn2p3/2 ZnBr2 62 1023.4Zn2p3/2 ZnBr2 150Zn的电子结合能：Energy (eV) Element Chemical bonding Ref90.7Zn3p1/2Cu Zn alpha, béta 17817890.8Zn3p1/2 ZnOZn的电子结合能：Energy (eV) Element Chemical bonding Ref17888.6Zn3p3/2 ZnOXPS_DatabaseCu2p1/2的电子结合能Energy (eV) Element Chemical bonding Ref 951.2Cu2p1/2Pd50Cu50 alloy with respect to pure components 8 952Cu2p1/2Cu 8 952.3Cu2p1/2Cu2O 178 952.5Cu2p1/2Cu Zn alpha, béta 178 953.3Cu2p1/2NdCuSn 82 953.3Cu2p1/2NdCuGe 82 953.6Cu2p1/2CuO 178 962Cu2p1/2Y0,4 Pr0,6 Ba2 Cu4 O8 204Cu2p3/2的电子结合能Energy (eV) Element Chemical bonding Ref 923.5Cu2p3/2Cu 215 931.2Cu2p3/2Pd50Cu50 alloy with respect to pure components 8 931.6Cu2p3/2CuInSe2 150 931.7Cu2p3/2CuAgSe 150 931.7Cu2p3/2Cu2Se 150 931.8Cu2p3/2CuFeS2 150 931.8Cu2p3/2CuFeS2 89 932Cu2p3/2CuCl 111 932Cu2p3/2Cu2Mo3O10 111 932Cu2p3/2Cu 8 932Cu2p3/2CuS 89 932.1Cu2p3/2CuS 150 932.1Cu2p3/2Cu2O 111 932.2Cu2p3/2CuP2 150 932.2Cu2p3/2Cu2S 150 932.2Cu2p3/2Cu(CN)2 150 932.2Cu2p3/2Cu2O 150 932.2Cu2p3/2CuCl 150 932.2Cu2p3/2Ni90Cu10 215 932.3Cu2p3/2Cu2S 111 932.3Cu2p3/2Cu 111 932.3Cu2p3/2CuAgSe 111 932.3Cu2p3/2Cu2Se 111 932.4Cu2p3/2Cu3O2 125 932.4Cu2p3/2CuSe 111 932.4Cu2p3/2CuCl 111 932.4Cu2p3/2Cu2S 89 932.4Cu2p3/2Cu2O (?) 157 932.4Cu2p3/2Cu metal 13 932.47Cu2p3/2Cu 150 932.5Cu2p3/2CuS 111932.5Cu2p3/2Cu2O 178 932.5Cu2p3/2Cu métal 247 932.5Cu2p3/2Cu2O 247 932.5Cu2p3/2Cu2O 13 932.6Cu2p3/2Cu bulk 125 932.7Cu2p3/2Cu 175 932.7Cu2p3/2Cu 225 932.7Cu2p3/2élément naturel (liaison métallique) 147 932.8Cu2p3/2Cu 111 933.1Cu2p3/2CuCN 111 933.2Cu2p3/2CuC(CN)3 111 933.3Cu2p3/2CuBr2 111 933.3Cu2p3/2NdCuGe 82 933.4Cu2p3/2NdCuSn 82 933.4Cu2p3/2CuO 111 933.5Cu2p3/2Al2Cu 111 933.6Cu2p3/2CuFe2O4 150 933.6Cu2p3/2CuO 150 933.7Cu2p3/2Al2Cu 150 933.7Cu2p3/2CuO 178 933.7Cu2p3/2CuFe2O4 247 933.7Cu2p3/2CuO 155 933.7Cu2p3/2CuO 13 933.8Cu2p3/2Cu2+ in copper-erbium carbonate 181 933.8Cu2p3/2Cu2+ in copper-holmium carbonate 181 933.8Cu2p3/2CuO 125 933.8Cu2p3/2CuO 247 933.9Cu2p3/2CuO 157 934Cu2p3/2CuN in [CuEu(daaen)] 166 934Cu2p3/2Cu(C24H27N7)(PF6)2 111 934.1Cu2p3/2CuN in [Cu(H2daaen)] 166 934.1Cu2p3/2Cu(II)-Dy(III) in Cu2Dy2O5 151 934.2Cu2p3/2Cu(II)-Er(III) in Cu2Er2O5 151 934.2Cu2p3/2CuCl2 150 934.3Cu2p3/2Cu(II)-Gd(III) in CuGd2O4 151 934.4Cu2p3/2Cu(II)-Ho(III) in Cu2Ho2O5 151 934.4Cu2p3/2CuCr2O4 150 934.4Cu2p3/2CuCl2 111 934.4Cu2p3/2Cu(OH)2 247 934.5Cu2p3/2CuAl2O4 150 934.5Cu2p3/2CuMoO4 111 934.7Cu2p3/2CuCO3 111 934.7Cu2p3/2Cu(OH)2 155 934.7Cu2p3/2Cu(OH)2 13 934.7Cu2p3/2Cu(Met)2 235 934.9Cu2p3/2CuSiO3 111934.9Cu2p3/2CuSiO3 155 935.1Cu2p3/2Cu(OH)2 125 935.5Cu2p3/2CuSO4 111 935.5Cu2p3/2Cu(NO3)2 111 935.5Cu2p3/2CuSO4 155 935.9Cu2p3/2CuF2 150 936.7Cu2p3/2CuF2 111 937Cu2p3/2CuF2 111 939.4Cu2p3/2CuN in [Cu(H2daaen)] (satellite) 166 940.4Cu2p3/2CuN in [CuEu(daaen)] (satellite) 166 943.5Cu2p3/2CuN in [CuEu(daaen)] (satellite) 166 944.2Cu2p3/2CuN in [Cu(H2daaen)] (satellite) 166Cu3d的电子结合能Energy (eV) Element Chemical bonding Ref824.1Cu3d PrCuSn4.1Cu3d NdCuGe (1 of 2) 824.2Cu3d NdCuSn (1 of 2) 825.3Cu3d NdCuGe (2 of 2) 826Cu3d NdCuSn (2 of 2) 82Cu3d3/2的电子结合能Energy (eV) Element Chemical bonding Ref82 953.8Cu3d3/2 PrCuSn Cu3d53/2的电子结合能Energy (eV) Element Chemical bonding Ref82 933.6Cu3d5/2 PrCuSn Cu3p1/2的电子结合能Energy (eV) Element Chemical bonding Ref17877.2Cu3p1/2 Cu2O77.3Cu3p1/2Cu Zn alpha, béta 17817878.2Cu3p1/2 CuOCu3p31/2的电子结合能Energy (eV) Element Chemical bonding Ref8974.65Cu3p3/2 CuFeS28974.95Cu3p3/2 CuS75.1Cu3p3/2Cu Zn alpha, béta 17824775.1Cu3p3/2 Cumétal24775.1Cu3p3/2 Cu2O8975.15Cu3p3/2 Cu2S17875.2Cu3p3/2 Cu2O17876.2Cu3p3/2 CuO76.2Cu3p3/2 CuO24724776.4Cu3p3/2 CuFe2O4247 77Cu3p3/2 Cu(OH)2Cu3s的电子结合能Energy (eV) Element Chemical bonding Ref247métal 122.2Cu3s Cu247 122.2Cu3s Cu2O82 122.2Cu3s NdCuGe82 122.4Cu3s NdCuSn82 122.5Cu3s PrCuSn123Cu3s Y0,4 Pr0,6 Ba2 Cu4 O8 204123Cu3s Pr Ba2 Cu O7 204247 123.5Cu3s CuO247 124.1Cu3s Cu(OH)2XPS_DatabaseFe2p1/2的电子结合能：Energy (eV) Element Chemical bonding Ref 720.1Fe2p1/2 Fe° 4720.3Fe2p1/2 Fe2B 4720.4Fe2p1/2 FeB 4Fe2p3/2的电子结合能：Energy (eV) Element Chemical bonding Ref 706.3Fe2p3/2 FeS2 111 706.4Fe2p3/2 Fe° 73 706.5Fe2p3/2 FeS2 150iron 224 706.5Fe2p3/2 metallic706.54Fe2p3/2 Fe 150 706.6Fe2p3/2 Fe2B 111 706.6Fe2p3/2FeS, tail DSJ 234metal 13 706.6Fe2p3/2 Fe706.7Fe2p3/2 Fe 111 706.8Fe2p3/2 FeB 111 706.8Fe2p3/2FeS2 - H2O 22j 89 706.8Fe2p3/2 Fe 183métallique 1 706.8Fe2p3/2 Fe706.8Fe2p3/2ds le 304 ss avec N2 implanté 218 706.8Fe2p3/2N ds l'acier 304 (bulk) 55 706.8Fe2p3/2 Fe° 156 706.8Fe2p3/2 Fe° 2 706.8Fe2p3/2Fe° in a passive film on SUS316L 65 706.9Fe2p3/2 FeP 150 706.9Fe2p3/2 Fe 89n°1- 163-pyrite 706.9Fe2p3/2 FeS2n°2- 163-pyrite 706.9Fe2p3/2 FeS2706.9Fe2p3/2 Fe(m) 84 706.9Fe2p3/2 Fe 89 706.95Fe2p3/2FeS2 - air 11j- 89iron 224 707Fe2p3/2 metallic707Fe2p3/2pic XPS alliage Fe24Cr 124 707Fe2p3/2Fe metal in case of sample immersed in a 60°C solution 11 707Fe2p3/2Fe metal with a sample immersed in a room t° solution 11 707Fe2p3/2 Fe° 4 707.1Fe2p3/2FeS2 - air 3j- 89 707.1Fe2p3/2FeS2 - air 30j- 89 707.1Fe2p3/2FeS2 - air 220j - 89métal 182 707.1Fe2p3/2 pic707.1Fe2p3/2Fe ds 304 ss nitré 218 707.1Fe2p3/2N ds l'acier 304 (nitré) 55707.1Fe2p3/2 Fe(m) 84(pyrite) 89 707.15Fe2p3/2 FeS2707.2Fe2p3/2 FeB 150 707.2Fe2p3/2 Ni-21Cr-8Fe 183 707.2Fe2p3/2élément naturel (liaison métallique) 147 707.2Fe2p3/2 Fe2B 4 707.3Fe2p3/2 Fe3Si 150 707.3Fe2p3/2 FeB 4 707.4Fe2p3/2 FeS2 111 707.45Fe2p3/2 FeS2 89 707.6Fe2p3/2 Fe(C5H5)2 150 707.9Fe2p3/2 Fe3C 150 707.9Fe2p3/2metallic iron strongly interacting with the oxide 224 708.1Fe2p3/2 CuFeS2 89 708.2Fe2p3/2 Fe(C10H8N2)3(PF6)2 111 708.2Fe2p3/2Fe oxide in a passive film on SUS316L 65 708.3Fe2p3/2 Fe2P2S6 111 708.3Fe2p3/2 KFeS2 111 708.3Fe2p3/2 Fe3O4 89 708.5Fe2p3/2 K4Fe(CN)6 111 708.5Fe2p3/2 CuFeS2 89Fe2+ 13 708.5Fe2p3/2 Fe2O3,708.6Fe2p3/2 Fe2+ 73 708.7Fe2p3/2 (Fe(SCH3)(CO)3)2 235 709.1Fe2p3/2 Fe2+ 2 709.1Fe2p3/2 (Fe(SC2H5)(NO)2)2 235 709.2Fe2p3/2Fe(S?) , FeO -pyrite n°1- 163 709.2Fe2p3/2Fe(II) dans Fe3O4 183 709.2Fe2p3/2 Fe2+ 84 709.3Fe2p3/2Fe2+ ds FeO 1 709.4Fe2p3/2 FeO 150 709.4Fe2p3/2pic XPS (Fe2+) alliage Fe24Cr 124 709.5Fe2p3/2 Fe(II) 224 709.5Fe2p3/2Fe(S) , FeO -pyrite n°2- 163 709.5Fe2p3/2 Fe2+ 156 709.5Fe2p3/2 FeO 89 709.5Fe2p3/2 Fe(OH)2 118 709.6Fe2p3/2 Fe2+ 84 709.8Fe2p3/2 FeBr3 111 709.8Fe2p3/2 FeO 13 709.9Fe2p3/2 FeBr2 111 709.9Fe2p3/2 FeCl3 111 709.9Fe2p3/2 FeF2 111 709.9Fe2p3/2 K3Fe(CN)6 111 710Fe2p3/2 FeS 111 710Fe2p3/2 FeO 111710Fe2p3/2Fe2p3/2 (voir spectres dans la publication). 102 710.2Fe2p3/2 FeCl2 111 710.3Fe2p3/2 CoFe2O4 150 710.3Fe2p3/2 Fe(II) 224 710.3Fe2p3/2 Fe3+ 156 710.4Fe2p3/2 NiFeO4 111 710.4Fe2p3/2 Fe3+ 2 710.4Fe2p3/2Fe oxide in a passive film on SUS316L 65oxyde 89 710.5Fe2p3/2 FeS2710.5Fe2p3/2 Fe3+ 84 710.5Fe2p3/2 alpha-Fe2O3 118 710.6Fe2p3/2 Fe2O3 89-air3'- 89 710.6Fe2p3/2 CuFeS2710.6Fe2p3/2 Fe(III) 224 710.6Fe2p3/2Fe(OH)3 -pyrite n°1- 163 710.6Fe2p3/2 Fe3+ 73 710.6Fe2p3/2 Fe2O3 157 710.7Fe2p3/2 Fe2O3 150 710.7Fe2p3/2 FeOOH 111 710.7Fe2p3/2Fe(OH)3 -pyrite n°2- 163Fe3O4 183dans710.7Fe2p3/2 Fe(III)710.7Fe2p3/2pic XPS (Fe3+) alliage Fe24Cr 124 710.8Fe2p3/2pic large attribué principalement à Fe2O3 182 710.8Fe2p3/2pic du Fe2O3 après bombardement (5 min) 182 710.8Fe2p3/2 Fe2O3 13 710.85Fe2p3/2 FeSO4,7H2O 89 710.9Fe2p3/2 Fe2O3 111 710.9Fe2p3/2CuFeS2 -air 3j - 89 710.9Fe2p3/2Fe Ox, 316 L alloy fretted (30 min) in physio serum 207 710.9Fe2p3/2 Fe3+ 84Fe3+ 13 710.9Fe2p3/2 Fe3O4,710.95Fe2p3/2CuFeS2 - H2O 40' - 89 711Fe2p3/2 FeSO4.7H2O 111 711Fe2p3/2CuFeS2 - H2O 3h - 89 711Fe2p3/2CuFeS2 - H2O 8j - 89 711Fe2p3/2CuFeS2 - H2O 16j - 89 711Fe2p3/2Fe3+ ds Fe2O3 1 711Fe2p3/2 Fe3+ 228 711Fe2p3/2Fe2p exposé à l' oxygéne à 600K 173alpha 89 711Fe2p3/2 Fe2O3711Fe2p3/2vieillissement à l'air de la chalcopyrite pdt 3 mn 89 711Fe2p3/2Fe oxide with a sample immersed in a room t° solution 11 711.05Fe2p3/2CuFeS2 - H2O 34j - 89 711.05Fe2p3/2FeS2 - air 3'- 89 711.1Fe2p3/2 Fe3O4 111 711.1Fe2p3/2 Fe2(WO4) 111711.1Fe2p3/2CuFeS2 -air 11j - 89 711.15Fe2p3/2 FeOOH 89 711.2Fe2p3/2 FeF2 150 711.2Fe2p3/2CuFeS2 - H2O 1j - 89 711.2Fe2p3/2CuFeS2 - H2O 4j - 897H2O 89 711.25Fe2p3/2 FeSO4711.3Fe2p3/2 dithiodibutylcarbanate 111 711.35Fe2p3/2vieillissement à l'eau de la chalcopyrite pdt 40mn 89 711.4Fe2p3/2 NaFeO2 111 711.4Fe2p3/2CuFeS2 -air 30j - 89 711.4Fe2p3/2 Fe(III) 224 711.45Fe2p3/2 FeOOH 89 711.45Fe2p3/2vieillissement à l'eau de la chalcopyrite pdt 34j 89 711.5Fe2p3/2 FeWO4 111 711.5Fe2p3/2Fe (2) acethylacetonate 111 711.5Fe2p3/2FeOOH dans Inconel 600 (Publication riche en El) 246 711.5Fe2p3/2 FeO.OH 118 711.5Fe2p3/2Fe oxide in case of sample immersed in a 60°C solution 11 711.55Fe2p3/2CuFeS2 -air 220j - 89 711.6Fe2p3/2 FeOOH 13 711.75Fe2p3/2CuFeS2 - air 400j - 89 711.8Fe2p3/2Fe (3) acethylacetonate 111 711.8Fe2p3/2 KFe3(OH)6(SO4)2 89 712Fe2p3/2 cyclohexanebutyrate 111 712Fe2p3/2SO4(2-) -pyrite n°1- 163 712.1Fe2p3/2Fe2(SO4)3 -pyrite n°2- 163 712.15Fe2p3/2vieillissement à l'air de la chalcopyrite pdt 400j 89 713.1Fe2p3/2 Fe2(SO4)3 89 713.5Fe2p3/2 Fe2(SO4)3 89 713.9Fe2p3/2 FeF3 111 714Fe2p3/2 K3FeF6 111 714Fe2p3/2satellite -pyrite n°1- 163 714Fe2p3/2satellite -pyrite n°2- 163 715Fe2p3/2 satelliteFe(II) 224of 715Fe2p3/2pic XPS alliage Fe24Cr (Fe2+ satellite) 124 715.7Fe2p3/2 Fe2O3/Fe3O4 25satellite 1 715.7Fe2p3/2 Fe2+719.8Fe2p3/2 satelliteFe(III) 224of 720Fe2p3/2pic XPS alliage Fe24Cr (Fe3+ satellite) 124Fe2s的电子结合能：Energy (eV) Element Chemical bonding Ref 641.2Fe2s Fe2B44 641.6Fe2s Fe°4 641.6Fe2s FeBFe3p的电子结合能：Energy (eV) Element Chemical bonding Ref8952.6Fe3p Fe89 53Fe3p Fe53.2Fe3p Fe° 453.2Fe3p Fe2B 453.5Fe3p Fe3O48953.5Fe3p FeB 48953.65Fe3p FeS253.8Fe3p CuFeS2898953.9Fe3p Fe3O454.05Fe3p FeS289163n°1--pyrite54.1Fe3p FeS28954.2Fe3p CuFeS254.5Fe3p FeO89163n°2-54.5Fe3p FeS2-pyrite8954.9Fe3p FeO8955.4Fe3p Fe2O38955.6Fe3p FeSO4,7H2Oalpha8955.8Fe3p Fe2O38955.85Fe3p FeOOH897H2O 56Fe3p FeSO48956.25Fe3p FeOOH56.7Fe3p Fe(OH)3,Fe2(SO4)3 -pyrite n°1- 16357Fe3p Fe2(SO4)3 , FeOOH -pyrite n°2- 1638957.75Fe3p Fe2(SO4)38958.15Fe3p Fe2(SO4)359.4Fe3p satellites -pyrite n°1- 16359.7Fe3p satellite -pyrite n°2- 16362.4Fe3p satellites -pyrite n°1- 16362.5Fe3p satellite -pyrite n°2- 163 Fe3s的电子结合能：Energy (eV) Element Chemical bonding Ref491.3Fe3s Fe°491.7Fe3s FeB491.7Fe3s Fe2BXPS_DatabaseK的电子结合能：Energy (eV) Element Chemical bonding Ref 291.9K2p3/2K3Cr(CN)6 150 292K2p3/2K2MoCl6 111 292.1K2p3/2KF 111 292.1K2p3/2K2SnCl6 111 292.2K2p3/2KN2 111 292.3K2p3/2KCl 111 292.4K2p3/2K2PtCl6 111 292.5K2p3/2K2ReCl6 111 292.6K2p3/2KI 150 292.6K2p3/2KCl 150 292.6K2p3/2KF 150 292.6K2p3/2KBr 111 292.7K2p3/2KCl 111 292.7K2p3/2KNO3 111 292.7K2p3/2K2IrCl6 111 292.7K2p3/2K2TiF6 111 292.8K2p3/2K2OsCl6 150 292.8K2p3/2KBr 111 292.9K2p3/2KBr 150 292.9K2p3/2KNO2 111 292.9K2p3/2K2PtCl4 111 293K2p3/2K2Pt(CN)4 111 293.2K2p3/2KPtCl6 111 293.5K2p3/2KSbF6 150 294.2K2p3/2K in HOPG Intercalation Compounds (st1, vol peak) 143 294.5K2p3/2K 150 294.6K2p3/2élément naturel (liaison métallique) 147 294.6K2p3/2K metal 143 295.4K2p3/2K in HOPG Intercalation Compounds (st2, vol peak) 143 295.4K2p3/2K in HOPG Intercalation Compounds (st3, vol peak) 143 297.5K2p3/2KF 'washed-fume particules' 25 299.4K2p3/2KF 'fume particules' 25 300.7K2p3/2K (g) 111K的电子结合能：Energy (eV) Element Chemical bonding Ref 377.2K2s K2(PdBr4)144144 377.2K2s K2(Pd(CN)4)144 377.4K2s K2(PdCl4)144 377.4K2s K2(Pd(NO2)4)237 384.3K2s KSb2F7237 384.5K2s K2SbF5Li的电子结合能：Energy (eV) Element Chemical bonding Ref51.9Li1s Li métal après bombardement par l'argon 5151.9Li1s Li metal ds DEC(LiPF6) et bomb par argon 5153.3Li1s Li ds Li2O après bombardement par l'argon 5153.3Li1s Li2Oap immersion ds DEC(LiPF6) et bomb par argon 5153.6Li1s LiCO3 ou LiOH ds DEC contenant LiClO4 pdt 240 min 5153.8Li1s Lithium carbide (formed in graphene) 7154.6Li1s Li2CO3 pour surfaces des feuilles de Li métal 5111154.8Li1s Li54.8Li1sélément naturel (liaison métallique) 14711154.9Li1s LiN3150 55Li1s Li2CO3 55Li1s LiPO411111155.1Li1s LiCrO255.2Li1s LiF11115055.5Li1s LiF55.6Li1s Li in graphene, can't be deintercalated 7155.6Li1s LiFaprès immersion ds DEC(LiPF6) 5111155.8Li1s LiCl15055.9Li1s LiCl15056.6Li1s LiBr11156.6Li1s LiBr11156.9Li1s LiCrO457.37Li1s Li ds Li métal 8160.05Li1s Li ds LiC6 81Mn2p3/2的电子结合能：Energy (eV) Element Chemical bonding Ref 638.58Mn2p3/2 Mn 150 638.8Mn2p3/2 MnP 150 638.8Mn2p3/2 Mn 111 639.4Mn2p3/2élément naturel (liaison métallique) 147 639.9Mn2p3/2 MnS 111 640.4Mn2p3/2 MnS 111 640.8Mn2p3/2 Mn(C24H27N7)(PF6)2 111 640.9Mn2p3/2 MnN 150 641Mn2p3/2 MnO 111 641Mn2p3/2 MnO 224 641.1Mn2p3/2 Mn2O3 111 641.2Mn2p3/2 Mn3O4 150 641.4Mn2p3/2 Mn2O3 150 641.5Mn2p3/2 MnCl2 111 641.7Mn2p3/2 MnI2 111 641.7Mn2p3/2 MnBr2 111 641.7Mn2p3/2 K3Mn(CN)6 111 641.8Mn2p3/2 MnCl2 150 641.9Mn2p3/2 MnBr2 150 642Mn2p3/2 MnO2 111 642.1Mn2p3/2 MnSiO3 150 642.1Mn2p3/2 MnF2 111 642.3Mn2p3/2 MnSiO3 111 642.4Mn2p3/2 MnO2 150 642.4Mn2p3/2 MnO2 157 642.8Mn2p3/2 MnCl2 111 645.8Mn2p3/2MnO/MN2O3 'washed-fume particules' 25 646.4Mn2p3/2satellite of satellite of MnO 224 646.8Mn2p3/2 KMnO4 150Na的电子结合能：Energy (eV) Element Chemical bonding Ref 981.4Na1s NaF 'fume particules' 25 1070.3Na1s hydroxysodalite 150 1070.5Na1s hydroxysodalite 111 1070.6Na1s Na2C2O4 150SeO3150 1070.6Na1s Na2111 1070.6Na1s Na2SeO3150 1070.7Na1s NaAsO2MoO4 150 1070.7Na1s Na2111 1070.7Na1s NaAsO2 1070.8Na1s NaOAc 111 1070.8Na1s Na2C2O4 111 1070.8Na1sélément naturel (liaison métallique) 147 1070.8Na1s metal 159150H2PO2 1070.9Na1s NaPO4 150 1070.9Na1s Na3TeO4150 1070.9Na1s Na21070.9Na1s Na2 SnO3, 3 H2O 150150 1070.9Na1s NaOOCH 1070.9Na1s NaOAc 150 1070.9Na1s NaMoO4 111150S2O4 1071Na1s Na2SO4 150 1071Na1s Na21071Na1s Na2CrO4 150thioglycollate 150 1071Na1s Na150 1071Na1s NaF 1071.1Na1s Na2WO4 150150 1071.1Na1s NaBiO3benzene-sulphonate 150 1071.1Na1s Na111 1071.1Na1s Na2S2O4111 1071.1Na1s Na2SO4111 1071.1Na1s NaF111 1071.1Na1s NaTeO4 1071.1Na1s Na2SnO3.H2O 111111 1071.1Na1s Na3PO4 1071.1Na1s NaOAc 111111 1071.1Na1s NaOOCH 1071.2Na1s NaNO3 150 1071.2Na1s Na2SO3 150111 1071.2Na1s Na2CrO4thioglycollate 111 1071.2Na1s Na1071.2Na1s NaH2PO2 111150 1071.3Na1s Na2CO3150ZrF6 1071.3Na1s Na2111 1071.3Na1s Na2CO3 1071.3Na1s NaNO3 111111 1071.3Na1s NaBiO3111 1071.3Na1s NaSCN 1071.3Na1s Na2WO4 111 1071.3Na1s NaHCO3 111benzenesulphonate 111 1071.3Na1s Na1071.4Na1s NaNO2 150PO3 150 1071.4Na1s NaS2O3150 1071.4Na1s Na2150Cr2O7 1071.4Na1s Na2150 1071.4Na1s NaI150 1071.4Na1s NaClTiF6 150 1071.4Na1s Na2111 1071.4Na1s NaCl 1071.4Na1s Na2HPO4 111 1071.4Na1s Na2ZrF6 111111 1071.4Na1s Na2SO3 1071.45Na1s NaA 191 1071.45Na1s NaA 155150 1071.5Na1s NaBr 1071.5Na1s Na zeolite A (Na Al Si O4) 150150 1071.5Na1s NaBF4150 1071.5Na1s Na2GeF6SiF6150 1071.5Na1s Na2 1071.5Na1s Na 111111 1071.5Na1s Na2GeF6111 1071.5Na1s Na2SiF6 1071.6Na1s Na 150PdCl4 150 1071.6Na1s Na2 1071.6Na1s NaI 111 1071.6Na1s NaPO4 111 1071.6Na1s Na zeolite (NaAlsiO4) 111 1071.6Na1s Na2Cr2O7 111111 1071.6Na1s Na2S2O3 1071.6Na1s NaNO2 111 1071.6Na1s NaTiO6111 1071.7Na1s Na2 IrCl6, 6 H2O 150150 1071.7Na1s Na3AlF6111 1071.7Na1s NaBr111 1071.7Na1s Na3AlF6 1071.7Na1s NaPO3 111 1071.7Na1s Na zeolite A (NaAlSiO4) 111 1071.7Na1s metal 1591071.8Na1s Namétal 12 1071.8Na1s Na 111 1071.8Na1s Na2PdCl4 111 1071.9Na1s Na2IrCl6.6H2O 111 1072Na1s Albite (Na Al Si3 O8) 150 1072Na1s NaH2PO4 111 1072.2Na1s Natrolite (Na2 Al2 Si3 O10) 150 1072.2Na1s albite(NaAlSiO8) 111 1072.2Na1s Na in Zeolite 191 1072.2Na1s Na in Zeolite 155 1072.3Na1s Na2O 150(Na2Al2Si3O10.2H2O) 111 1072.4Na1s natrolite1072.5Na1s Na2O 12111 1072.5Na1s NaBF4 1072.5Na1s oxide 159111ox 1072.7Na1s Na159 1073.3Na1s NaOxCyPE-Ar(Na+) 48 1073.6Na1s ds1074Na1s PE-Ar-TFAA (Na+) av spectro PHI 548 48 1075.6Na1s PE-Ar-TFAA (Na+) av spectro DUPONT 650B 48150(g)1078.4Na1s Na(g)111 1078.4Na1s Na 1078.4Na1s NaF 'fume particles' 25Na的电子结合能：Energy (eV) Element Chemical bonding Ref30.5Na2p3/2 metal159métal1230.6Na2p3/2 Na1231.1Na2p3/2 Na2O15931.1Na2p3/2 oxide15931.8Na2p3/2 NaOxCyNa的电子结合能：Energy (eV) Element Chemical bonding Ref23753.4Na2s Na2SbF563Na2s Na in Zeolite 19163Na2s Na in Zeolite 15515963.4Na2s metal1263.55Na2s Namétal19163.55Na2s NaX15563.55Na2s NaX15963.7Na2s metal63.8Na2s Na in Zeolite 19163.8Na2s Na in Zeolite 15512 64Na2s Na2O64Na2s oxide159159 64.71Na2s NaOxCyXPS_DatabaseNi的电子结合能：Energy (eV) Element Chemical bonding Ref215 869.6Ni2p1/2 NiNi的电子结合能：Energy (eV) Element Chemical bonding Ref 851.4Ni2p3/2ds le 304 ss avec N2 implanté 218 851.4Ni2p3/2 Ni11 218 851.95Ni2p3/2 AuNi 150 852Ni2p3/2Ni (16 min)/Al2O3/Al 229 852.1Ni2p3/2 Ni 111métallique 118 852.3Ni2p3/2 Ni852.4Ni2p3/2 Ni 215 852.48Ni2p3/2 Ni 150 852.5Ni2p3/2 Ni 247 852.5Ni2p3/2Ni métal ( 10puis-6 torr) 78 852.5Ni2p3/2Ni métal ( 250°C -1h ) 78 852.5Ni2p3/2Ni, Ni foil polishing and Ar+ etching 101 852.6Ni2p3/2 NiS 150 852.6Ni2p3/2Ni, Ni foil polish and Ar+ etching, + O2 at 200°C/1h 101 852.6Ni2p3/2Ni, Ni foil polishing + water immersion/28h 101Ni 229 852.7Ni2p3/2 bulkmetal 13 852.7Ni2p3/2 Ni852.8Ni2p3/2 Ni2Si 150 852.8Ni2p3/2 Ni-21Cr-8Fe 183 852.8Ni2p3/2 Ni 183 852.8Ni2p3/2Ni° in a passive film on SUS316L 65 852.9Ni2p3/2 Ni2P 150 852.9Ni2p3/2 2 min Ni deposit : Ni dispersed on Al2O3 229 852.9Ni2p3/2Ni, Ni foil polishing and Ar+ etching+H2S 400°C/1h 101 853Ni2p3/2 NiB 150 853Ni2p3/2Ni (7 min)/Al2O3/Al annealed to 800K for 30 min 229 853Ni2p3/2Ni metal with a sample immersed in a 60°C solution 11 853Ni2p3/2Ni metal with a sample immersed in a room t° solution 11 853Ni2p3/2NiS/Ni3S2 -Ni foil polish in H2O/28h+H2S 400°C/1h 101 853Ni2p3/2Ni Polish +Ar+,+O2 -200°C/1h+400°C/2h30mn+H2S 400°C/1h 101 853.1Ni2p3/2NiOads ( 10puis-6 torr) 78 853.1Ni2p3/2NiOads ( air 15min ) 78 853.3Ni2p3/2élément naturel (liaison métallique) 147 853.5Ni2p3/2 NiO 111 853.55Ni2p3/2 Al3Ni 150 853.6Ni2p3/2 NiI2 111 853.9Ni2p3/2 Ni(C5H5)2 111 853.9Ni2p3/2 Ni(PPh3)2 111853.9Ni2p3/2abrasé sur dry 600 grit sandpaper qq sec 207 853.9Ni2p3/2 NiO 118 854Ni2p3/2 Ni2S3 111 854Ni2p3/2 NiO 247 854Ni2p3/2NiO (1er pic) ( 800°C - 10min ) 78 854Ni2p3/2NiO ( 1er pic) ( 800°C-air ) 78 854Ni2p3/2NiO (1er pic ) ( 800°C-air+ O2-10min ) 78 854Ni2p3/2Ni (1 min)/Al2O3/Al : NiO 229 854.2Ni2p3/2 NiO 150 854.2Ni2p3/2 Ni(Co)4 150 854.2Ni2p3/2 NiO 157 854.4Ni2p3/2Ni(II) dans NiO 183 854.4Ni2p3/2 (Ni(SCH2CH2S))n 235 854.4Ni2p3/2 Ni(SCH2CH2S)(PMe2Ph)2 235 854.5Ni2p3/2 Ni(Co)4 111 854.5Ni2p3/2Ni (16 min)/Al2O3/Al annealed to 800K for 10 min :NiAl 229 854.5Ni2p3/2Ni oxide with a sample immersed in a room t° solution 11 854.5Ni2p3/2 Ni(SPh)2(CyNC)2 235 854.6Ni2p3/2 Ni-(dimethyl-glyoxime)2 150 854.6Ni2p3/2 NiO 155 854.6Ni2p3/2 NiO 13 854.6Ni2p3/2 Ni(SPh)2(dppe) 235 854.6Ni2p3/2 Ni(SPh)2(PMe2Ph)2 235 854.7Ni2p3/2 Ni(CN)2 111 854.7Ni2p3/2 Ni(SCH2CH2S)(dppe) 235 854.7Ni2p3/2 (Ni(SPh)2)n 235 854.8Ni2p3/2 NiCl2(NBu3)2 111 854.9Ni2p3/2 NiS 111 854.9Ni2p3/2 NiBr2 111 854.9Ni2p3/2 Ni(dimethylglyoxime) 111 854.9Ni2p3/2 NiFe2O4 111 855Ni2p3/2voir spectres dans la publication 102 855Ni2p3/2Ni oxide with a sample immersed in a 60°C solution 11 855.3Ni2p3/2 NiCO3 111 855.3Ni2p3/2 USY-A-6 44 855.3Ni2p3/2 LaHY 44 855.3Ni2p3/2 Ni(Met)2 235 855.4Ni2p3/2 Ni(C24H27N7)(PF6)2 111 855.4Ni2p3/2 K2Ni(CN)4 111 855.4Ni2p3/2 NiFe2O4 247 855.4Ni2p3/2 USY-A-8 44 855.5Ni2p3/2 Ni(acac)2 150 855.5Ni2p3/2 Me4NNiCl3 111 855.5Ni2p3/2NiO Oads ( 800°C-air+ O2-10min ) 78 855.5Ni2p3/2 USY-B-8 44 855.6Ni2p3/2 Ni(OH)2 247855.6Ni2p3/2 Ni(OH)2 118 855.6Ni2p3/2NiOx, Ni foil polishing + water immersion/28h 101 855.7Ni2p3/2 Ni(OH)2 150acethylacetonate 111 855.7Ni2p3/2 Ni855.7Ni2p3/2 Ni2O3 13 855.8Ni2p3/2 Ni2O3 150 855.8Ni2p3/2NiO (2nd pic) ( 800°C - 10min ) 78 855.8Ni2p3/2NiO (2ème pic) ( 800°C-air ) 78 855.8Ni2p3/2NiO ( 2ème pic) ( 800°C-air+ O2-10min ) 78 855.8Ni2p3/2Ni(OH)2 dans Inconnel 600 (Publication riche en El) 246 855.8Ni2p3/2NiOx, Ni foil polish and Ar+ etching, + O2 at 200°C/1h 101 855.9Ni2p3/2Ni2O3 ( 10puis-6 torr) 78 855.9Ni2p3/2Ni2O3 (1er pic) ( air 15min ) 78 855.9Ni2p3/2Ni2O3 ( 800°C-air ) 78 855.9Ni2p3/2Ni2O3 ( 800°C-air+ O2-10min ) 78 855.9Ni2p3/2 USY-B-8H 44 856Ni2p3/2 NiAl2O4 150 856Ni2p3/2 Ni(OH)2 111 856Ni2p3/2 Ni2O3 111 856Ni2p3/2NiOx, Ni foil polish-Ar+etch+O2, 200°C/1h+400°C/2h30mn 101 856.1Ni2p3/2 NiCl2 111 856.1Ni2p3/2Ni2O3 (1er pic) ( 250°C -1h ) 78 856.1Ni2p3/2 USY-2 44cyclohexanebutyrate 111 856.3Ni2p3/2 Ni856.3Ni2p3/2 USY-D 44 856.4Ni2p3/2 (NH4)2NiF4 111 856.4Ni2p3/2 Ni(OH)2 13 856.5Ni2p3/2 NiCl2 150 856.6Ni2p3/2 NiSiO4 150 856.7Ni2p3/2 NiSiO3 150 856.8Ni2p3/2 Ni(NO3)2 111biuret 111 856.8Ni2p3/2 KNitrifluoroacetate 111 856.9Ni2p3/2 Ni856.9Ni2p3/2 LaHY-H2O 44 856.9Ni2p3/2 NiSiO3 155 857Ni2p3/2 NiSO4 111 857.1Ni2p3/2 NiAl2O4 111 857.2Ni2p3/2 NiF2 150 857.2Ni2p3/2 NiWO4 111 857.3Ni2p3/2Metal salt NiCl2 in 316 L alloy 207 857.8Ni2p3/2 NiF2 111 858.5Ni2p3/2Ni métal (10puis-6 torr) 78 858.7Ni2p3/2 NiSiF6 111 860.9Ni2p3/2 K2NiF6 111 861.2Ni2p3/2NiO (3eme pic) ( 800°C - 10min ) 78 861.2Ni2p3/2NiO ( 3ème pic) ( 800°C-air ) 78861.2Ni2p3/2NiO (3ème pic) ( 800°C-air+ O2-10min ) 78 861.4Ni2p3/2Ni2O3 ( 2eme pic) ( air 15min ) 78 861.4Ni2p3/2Ni2O3 ( 2ème pic ) ( 250°C -1h ) 78Ni的电子结合能：Energy (eV) Element Chemical bonding Ref21567.4Ni3p1/2 NiNi的电子结合能：Energy (eV) Element Chemical bonding Ref21565.7Ni3p3/2 Ni247métal66.3Ni3p3/2 Ni24767.3Ni3p3/2 NiO247 68Ni3p3/2 Ni(OH)224768.1Ni3p3/2 NiFe2O4Ni的电子结合能：Energy (eV) Element Chemical bonding Ref215 110.2Ni3s Ni247 110.7Ni3s Ni247 111.8Ni3s NiO247 112.7Ni3s Ni(OH)2247 113Ni3s NiFe2O4XPS_Database575Cr2p3/2Cr métallique,satellite (20 at% de Cr) 212 575Cr2p3/2Cr2p3/2 (voir spectres dans la publication). 102 575.5Cr2p3/2 CrN 111 575.5Cr2p3/2CrN du SS304 traité au N3- 17 575.5Cr2p3/2 CrN11 218 575.6Cr2p3/2 Cr2O3 186 575.7Cr2p3/2 CrN 225 575.7Cr2p3/2Cr ds CrN 55 575.7Cr2p3/2 Cr2O3 157oxyde 186 575.8Cr2p3/2 Cr(III)575.8Cr2p3/2Cr ds Cr2O3 198 575.9Cr2p3/2 CrO2 111 575.9Cr2p3/2 CrBr3 111 576Cr2p3/2 Cr2O3 186 576Cr2p3/2Cr oxide with a sample immersed in a 60°C solution 11 576Cr2p3/2Cr oxide with a sample immersed in a room t° solution 11 576.04Cr2p3/2élément naturel (liaison métallique) 147 576.1Cr2p3/2 CuCrO2 111 576.1Cr2p3/2 CrO2 186 576.1Cr2p3/2Cr ds Cr2N 55 576.2Cr2p3/2 Cr2O3 186-304SS- 138 576.3Cr2p3/2 Cr2O3576.3Cr2p3/2Cr2O3 -Fe /19Cr /9Ni- 138 576.3Cr2p3/2Cr2O3 in 316L before sputtering the passive film 116 576.3Cr2p3/2Cr2O3 in 316L after sputtering the passive film 116 576.3Cr2p3/2Cr3+ ds Cr2O3 1 576.3Cr2p3/2Cr2O3 in alloy 33 before sputtering the passive film 116 576.3Cr2p3/2Cr2O3 in alloy 24 before sputtering the passive film 116 576.3Cr2p3/2Cr2O3 in alloy 33 after sputtering the passive film 116 576.3Cr2p3/2Cr2O3 in alloy 24 after sputtering the passive film 116 576.4Cr2p3/2 Cr2O3 150 576.4Cr2p3/2Cr3+ ds Cr2O3 73 576.4Cr2p3/2Cr2O3 in a passive film on SUS316L 65 576.5Cr2p3/2 Cr2O3 111 576.5Cr2p3/2 CrI3 111oxyde 186 576.5Cr2p3/2 Cr(III)576.5Cr2p3/2 Cr3+ 216 576.5Cr2p3/2 Cr2O3 118 576.6Cr2p3/2Cr à l'état oxydé 176 576.6Cr2p3/2 CrOx 2 576.6Cr2p3/2 CrOx 84 576.7Cr2p3/2 Cr2O3 186 576.7Cr2p3/2Cr(IV) dans sel de sodium 186 576.7Cr2p3/2Cr3+ ds Cr2O3 156 576.7Cr2p3/2CrOOH in alloy 33 before sputtering the passive film 116 576.7Cr2p3/2CrOOH in alloy 24 before sputtering the passive film 116576.8Cr2p3/2 CrOOH 111 576.8Cr2p3/2 LiCrO2 111 576.8Cr2p3/2 NaCrO2 111 576.8Cr2p3/2 Cr2N 225 576.8Cr2p3/2Cr2O3 in Co-Cr alloy 65 576.8Cr2p3/2 CrOOH 186 576.8Cr2p3/2 CrOx 84 576.9Cr2p3/2Cr(III) dans Cr2O3 183 577Cr2p3/2 CrCl3 111 577Cr2p3/2CrOOH / Cr(OH)3 -304 SS- 138 577Cr2p3/2CrOOH -Fe /19Cr /9Ni- 138 577Cr2p3/2 Cr2O3 186 577Cr2p3/2 CrOOH 186 577Cr2p3/2pic XPS (Cr3+) alliage Fe24Cr 124 577Cr2p3/2Cr3+ ds Cr(OH)3 ou CrOOH 1 577Cr2p3/2 Cr3+ 228 577Cr2p3/2 Cr(OH)3 118 577.1Cr2p3/2Cr2O3 dans Inconel 600 (Publication riche en El) 246 577.1Cr2p3/2Cr hydroxide with a sample immersed in a 60°C solution 11 577.2Cr2p3/2Cr(III) dans Cr2O3 183 577.2Cr2p3/2Cr3+ ds Cr(OH)3 156 577.2Cr2p3/2Cr hydrox with a sample immersed in a room t° solution 11 577.3Cr2p3/2 Cr(OH)3 186 577.4Cr2p3/2hydroxyde de chrome 225 577.4Cr2p3/2Cr-O (20 at% de Cr) surface non bombardée 212 577.5Cr2p3/2Cr(III) hydroxyde et formes hydratées ou Cr(IV) 186 577.6Cr2p3/2 CrCl3 150 577.6Cr2p3/2abrasé sur dry 600 grit sandpaper qq sec 207 577.9Cr2p3/2 CrO3 111 578Cr2p3/2 CrO3* 118 578.1Cr2p3/2CrO3 -304 SS- 138 578.1Cr2p3/2CrO3 -Fe /19Cr /9Ni- 138 578.1Cr2p3/2 CrO3 186 578.1Cr2p3/2CrO3 in 316L before sputtering the passive film 116 578.1Cr2p3/2Cr6+ ds CrO3 1 578.1Cr2p3/2CrO3 in 316L after sputtering the passive film 116 578.1Cr2p3/2CrO3 in alloy 33 before sputtering the passive film 116 578.1Cr2p3/2CrO3 in alloy 24 before sputtering the passive film 116 578.1Cr2p3/2Cr2O3 in alloy 33 after sputtering the passive film 116 578.1Cr2p3/2Cr2O3 in alloy 24 after sputtering the passive film 116 578.2Cr2p3/2Cr et Cr(III) dans Cr2O3 ou Cr(III) dans Cr(OH)3 183 578.2Cr2p3/2Cr Ox in 316 L alloy dipped in physiological serum 207 578.2Cr2p3/2Cr Ox in 316 L pot anod (5V for 5 min) in physio serum 207 578.5Cr2p3/2Cr-Cl with a sample immersed in a room t° solution 11 578.6Cr2p3/2Cr Ox, 316 L alloy fretted (30 min) in physio serum 207 578.6Cr2p3/2Metal salt CrCl3 in 316 L alloy 207。