PMMA对石墨烯转移质量的影响

第44卷第6期2018年6月北京工业大学学报JOURNAL OF BEIJING UNIVERSITY OF TECHNOLOGY Vol.44No.6Jun.2018

PMMA 对石墨烯转移质量的影响

宋雪梅,桂羊羊,孔鑫燚,严 辉

(北京工业大学材料科学与工程学院,北京 100124)

摘 要:在聚甲基丙烯酸甲酯(polymethyl methacrylate,PMMA)辅助法转移化学气相沉积法生长的石墨烯过程中,PMMA 是一种不可或缺的保护材料,为了分析探讨PMMA 的固化条件对石墨烯转移质量的影响,借助拉曼光谱仪二原子力显微镜二紫外可见分光光度计二霍尔效应测试仪等测试设备,对不同PMMA 固化条件下转移所获得的石墨烯的表面形貌以及光电特性进行系统化的测试分析.结果表明:PMMA 的固化对石墨烯的转移质量有着重要的影响,它能够有效地支撑和保护石墨烯,使石墨烯在转移过程中减少褶皱破损二杂质吸附以及晶格结构缺陷,并获得最佳的PMMA 固化温度和时间分别为180?二120s,对应的石墨烯最高平均光学透过率二载流子浓度及迁移率分别达90.6%二6.7?1012cm -2二1500cm 2/(V 四s).

关键词:聚甲基丙烯酸甲酯(PMMA);石墨烯;化学气相沉积法(CVD)中图分类号:U 461;TP 308

文献标志码:A 文章编号:0254-0037(2018)06-0948-05

doi :10.11936/bjutxb2017020034收稿日期:2017-02-27

基金项目:国家自然科学基金资助项目(11574014);北京市科学技术委员会资助项目(Z151100003515003)

作者简介:宋雪梅(1973 ),女,副教授,主要从事化学气相沉积薄膜材料机理以及光电薄膜材料光学特性方面的研究,

E-mail:sxm@https://www.360docs.net/doc/1e4881728.html, Effect of PMMA on the Transfer Quality of Graphene

SONG Xuemei,GUI Yangyang,KONG Xinyi,YAN Hui

(College of Materials Science and Engineering,Beijing University of Technology,Beijing 100124,China)Abstract :Polymethyl methacrylate (PMMA )is an indispensable important protective material in thetransfer process of graphene by PMMA assisted method.In order to analyze the effect of PMMA on the transfer quality of graphene,the surface morphology and photoelectric properties of graphene were systematically analyzed by Raman spectrometer,atomic force microscope (AFM ),UV-Vis spectrophotometer,and Hall effect measurement system.Results show that the curing of PMMA plays an important role in the transfer quality of graphene,since fully cured PMMA can effectively support and protect graphene in order to reduce gravel damage,impurity adsorption and structural defects during the transfer process.In addition,the optimum curing temperature and time of PMMA solution were 180?and 120s,respectively.The corresponding optical transmittance,carrier concentration and mobility of graphene achieved 90%,6.7?1012cm -2,1500cm 2/(V 四s),respectively.Key words :polymethyl methacrylate (PMMA);graphene;chemical vapor deposition (CVD)method

石墨烯是由sp 2杂化的碳原子构成的六角型蜂窝状的二维平面薄膜,自2004年被英国曼彻斯特大学Novoselov 等[1]报道后,由于它具有独特的带隙结构以及高强度二高电迁移率二高热导率二高光透过率

等优异的物理化学特性[2-4],而在电子学二光学二磁学二生物医学二催化二储能和传感器等领域具有广阔

的应用前景[5].目前单层或多层石墨烯的常用制备方法有:机械剥离法二氧化还原法二碳化硅裂解法二化万方数据